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Effective Drive Current in CMOS Inverters for Sub-45nm Technologies

Jenny Hu*, Jae-Eun Park†, Greg Freeman† , Richard Wachnik† , H.-S. Philip Wong*
* Department of Electrical Engineering, Stanford University, CA, USA jennyhu@stanford.edu

IBM, East Fishkill, NY, USA

ABSTRACT 1.0
PMOS Current
IH
We propose a new model for the effective drive 0.8 NMOS Current

Ids / Idsat 
current (Ieff) of CMOS inverters, where the maximum FET
current obtained during inverter switching (IPEAK) is a key 0.6 0.5 (I H + I L)
parameter. Ieff is commonly defined as the average between
IH and IL, where IH=Ids(Vgs=VDD, Vds=0.5VDD) and IL =
Ids(Vgs=0.5VDD, Vds=VDD). In the past, this Ieff definition 0.4
has been accurate in modeling the inverter delay. However,
we find that as devices are scaled further into the nanoscale 0.2 IL
regime, the maximum transient current can deviate severely
from IH, in which case, another metric should be used. The 0.0
deviation of IPEAK from IH is found to increase as delay 0 0.2 0.4 0.6 0.8 1
decreases or as device overdrive voltage increases. We
define Ieff = (IPEAK+IM+IL)/ 3, where IM = Ids(Vgs=0.75VDD,
Vds / Vdd
Vds=0.75VDD). We evaluate our model against others by Figure 1. Pull-down switching trajectory of low VTH
comparing the analytical and HSPICE extracted Ieff ratios device, with bias points plotted in equal time intervals.
across devices of varying threshold voltages, VTH. Our Arrow indicates assumed trajectory in the two-point Ieff.
model is shown to better capture changes in VTH/VDD,
which are important since VDD and VTH will be key 1.2
parameters for optimizing device performances for target PMOS Current
applications (low power or high performance) in sub-45nm 1.0 NMOS Current
technologies.
NMOS current
Ids / Idsat

0.8
Keywords: CMOS, inverter, delay, performance 0.6

1. INTRODUCTION 0.4
0.2 PMOS current
As we continue to scale CMOS devices further into
the nanoscale regime, performance metrics valid for older 0.0
technologies need to be re-evaluated for their suitable 0 0.2 0.4 0.6 0.8 1
application with the current technology. FET performance
is typically measured through the CMOS inverter delay τ = Vds / Vdd
CV/I, where C is the load capacitance, V is the power Figure 2. Pull-down switching trajectory of 250 nm
supply VDD, and I is the saturation on-current ION= Ids( Vgs= technology, where IPEAK occurs closer to IH.
Vds= VDD). In recent years, the concept of an effective
drive current has been proposed as a better representation 2. TRANSIENT CURRENT TRAJECTORY
for calculating the inverter delay, due to the fact that ION is
never reached during switching [ 1 – 4 ]. However, as
In determining a suitable method to evaluate the
devices are scaled, current-voltage characteristics continue
inverter delay, it is important to first examine the transient
to deviate from the predicted behavior of ideally scaled
current trajectory to better understand approximations used
MOSFET due to minimal scaling of VTH and VDD, and non-
in I eff. Fig. 1 illustrates the transient inverter current
idealities such as parasitic series resistances, velocity
trajectory of a pull-down transition plotted over the DC
saturation, and DIBL. To more accurately assess the
current characteristics of an NMOS, with current
performance of sub-45nm CMOS, a more representative
normalized to ION. It is noted that the peak current (IPEAK)
effective drive current is needed.
obtained during switching falls far below I H, and even

NSTI-Nanotech 2008, www.nsti.org, ISBN 978-1-4200-8505-1 Vol. 3 829


1.0
PMOS Current IPEAK
NMOS Current
IH
0.8
Ids / Idsat

VPEAK

Voltage
0.6

Current
0.5 (I H + I L)

0.4
τn
0.2
IL PMOS
NMOS
0.0 Vin
Vout
0 0.2 0.4 0.6 0.8 1
Vds / Vdd Time
Figure 3. Pull-down switching trajectory of a higher VTH Figure 4. Transient response of both a pull-up and pull-
device, showing a larger VPEAK than in Figure 1, but IPEAK down transition, showing VPEAK < Vdd and the
is still far from IH. dependence upon delay.

further from ION. This deviates greatly from previous which IPEAK occurs. This can be equivalently interpreted as
technologies, where IPEAK approached IH as shown in Fig.2 the current trajectory following a lower Vgs curve.
for a 250nm technology. With the inverter delay defined as This change in current trajectories suggests that
the time between VIN=VDD/2 to VOUT=VDD/2 during evaluating IH at the same bias regardless of the device
switching, the pull-down delay can be viewed as the overdrive is not sufficient. Also, the simplification of the
integration of CV/I , where I ideally is the trajectory current. parabolic current trajectory as a linear path from IL to IH [1]
From Na et al. [2]: is no longer a good approximation if the peak current is far
below IH. In previous technologies, larger τ allowed IPEAK ≈
VDS VDD / 2 C LOAD IH and VPEAK ≈ VDD, but this is changing as devices and
 PD   dVDS (1)
I DS VDS , VGS 
power supplies are scaled. We propose an Ieff model that
VGS VDD / 2
includes more than two points of current and takes into
account of IPEAK.
From the equation it is apparent that the more closely the
Ieff equation follows the current trajectory path, the more
accurately it will reflect the device performance. The
current trajectory has a parabolic shape, so a minimum of
3. EFFECTIVE DRIVE CURRENT MODEL
three points would be needed to more precisely capture the
trends in current. Na et al. [1] defined the effective drive current by a
In addition to examining the current trajectory across two-point model, Ieff = (IH + IL)/2, where IL = Ids(Vgs=0.5
technology nodes, we examine the changes in the trajectory VDD, Vds= VDD) and IH = Ids( Vgs= VDD, Vds=0.5 VDD). This
as we scale the threshold voltage VTH of devices in a given effectively approximates the current trajectory as a linear
technology. Designing devices for a variety of applications, path between IH and IL. Deng et al. [2] introduced a three-
whether low power or high performance, results in devices point model of Ieff = (IH + IM + IL)/3, where IM =
with a wide range of VTH , thus making it important to study Ids(Vgs=0.75 VDD, Vds=0.75 VDD). A four-point model was
the effect of scaling VTH/VDD on Ieff. The current trajectory also proposed, where current through the device that should
of a higher V TH device is plotted in Fig. 3. When be off is accounted for. The four-point model was tested,
comparing Fig. 1 and 3, it is significant to note the however, we did not find significant benefit over the three-
differences in the current trajectory paths taken by the point model in a complexity and accuracy tradeoff.
devices with two separate V TH. As the VTH of a device We propose another three-point model of Ieff = (IPEAK
decreases, the peak current in the trajectory occurs at a + IM + IL )/3, where IPEAK is used to replaced IH. Including
lower Vgs, further away from IH. This behavior can be IPEAK will allow Ieff to include the effects of changes in
explained by Fig. 4, which illustrates the transient response switching trajectories between devices.
of a ring oscillator. For a given VDD, as VTH decreases, the To analyze these Ieff models, the analytical Ieff is
current overdrive is greater, thus decreasing the delay. compared to the simulated Ieff extracted from HSPICE
With a shorter delay, the output falls from VDD to VDD /2 simulations of a nine-stage ring oscillator using IBM’s
faster than the input can rise to VDD, causing IPEAK to occur 45nm bulk and SOI models for several devices designed for
at a Vgs much lower than VDD. Therefore, a decrease in a range of VTH. These models take into account critical
delay also decreases VPEAK, defined as the gate voltage at doping changes between the various VTH devices.

830 NSTI-Nanotech 2008, www.nsti.org, ISBN 978-1-4200-8505-1 Vol. 3


1.0 Vds + Vtsat
C=0fF
C=4fF IH 1.1 Vds + Vtlin

Analytical Ieff Ratio


0.8 C=8fF Vds + (Vtsat + Vtlin)/2
Vds + Vt,gm
Ids / Idsat

IPEAK “on” Actual Vpeak


0.6 current 0.9
0.4 : slope = 0.860
“off” : slope = 0.854
0.2 current 0.7
: slope = 0.865
: slope = 0.829
0.0
: slope = 0.923
0 0.2 0.4 0.6 0.8 1 0.5
Vds / Vdd 0.5 0.7 0.9 1.1
Figure 5. Dependence of IPEAK on the load capacitance. A
smaller load capacitance has a smaller IPEAK and greater
HSPICE Ieff Ratio
short circuit current in the device that is turning off. Figure 8. Evaluation of the correlation between analytical
and HSPICE Ieff ratios for several definitions of VPEAK.
1.2 Maximum slope is for VPEAK =0.5Vdd + (VTSAT+VTLIN)/2
Vout Vin
1.0
C=8fF
Voltage / Vdd

0.8 C=4fF 4. PEAK CURRENT


C=0fF
0.6
From the ring oscillator simulations, we found the
0.4 dependence IPEAK has on the load capacitance. As
illustrated in Fig. 5, in the pull-down case, as the load
0.2
capacitance decreases, IPEAK of the NMOS also decreases.
0.0 This can be explained by Fig. 4, due to a decrease in the
delay with reduced load capacitance. More notable is the
-0.2 increase in the short circuit current of the device that is
Time
Figure 6. A smaller load capacitance has a larger short turning off, or off-current, which is the PMOS during a
circuit current in the device that is shutting off is due to pull-down transition. The origin of this off-current is
greater overlap of voltage range that both Vgs and Vds are further elaborated in Fig. 6. Consider the waveform of Vin
significant. A large load capacitance is used to accentuate and Vout. We note that for smaller load capacitances, the
the effect for illustration purposes. slope of the voltages is sharper, resulting in greater overlap
of voltages in the range where both the NMOS and PMOS
1.1 2 pt [1] are on, thus a larger off current. Although we illustrated the
3pt [2] dependence on the load capacitance, the underlying reason
Analytical Ieff Ratio

2pt, Ipk [this work] is a shorter delay, so this same dependence would appear in
3pt, Ipk [this work] any situation where the delay is sufficiently short. In cases
0.9 where this current approaches IPEAK through smaller load
capacitance or more advanced technologies, it will be
critical to employ a four-point model to account for this off
: slope = 0.841 current. However, in the 45nm technology evaluated in this
0.7 : slope = 0.869 work, for the reasonable load capacitances considered, a
: slope = 0.862 three-point model is found to be adequate.
: slope = 0.923
0.5 5. RESULTS
0.5 0.7 0.9 1.1 Our model is shown to better capture changes in
HSPICE Ieff Ratio VTH/ VDD. Fig. 7 summarizes the evaluation of several Ieff
Figure 7. Evaluation of the relation between analytical and definitions across four devices of varying VTH. The ratios
HSPICE Ieff ratios for several definitions of Ieff. Ratios are of both the analytical and simulated Ieff are taken with
taken relative to the Ieff of the device with the lowest VTH. respect to the device with the corresponding largest Ieff, or
For each definition of Ieff, the slope of the best fit line is lowest VTH. For each definition of Ieff, the slope of the best
compared, with a slope of 1 being ideal. The maximum fit line for the four VTH devices is compared, with a slope of
slope occurs in the three-point definition using IPEAK. 1 being ideal. It is noted that regardless of IH or IPEAK,

NSTI-Nanotech 2008, www.nsti.org, ISBN 978-1-4200-8505-1 Vol. 3 831


when the two-point definition is replaced with the three- ACKNOWLEDGEMENTS
point, there is an improvement in the correlation. Ieff =
(IPEAK + IM + IL )/3 results in the best correlation between the This work is supported in part by the Focus Center
analytical and HSPICE extracted Ieff , with a slope of 0.923 Research Program (FCRP) (C2S2) and NSF (ECS-
compared to the 0.841 slope of the two-point Ieff definition. 0501096). J. Hu is additionally supported by the Stanford
In each case where IH is replaced with IPEAK, there is Graduate Fellowship and the National Defense Science and
a noted improvement in correlation, with an overall 7.2% Engineering Graduate (NDSEG) Fellowship. This work
improvement from the two-point Ieff. was also performed in part at IBM.
However, evaluation of IPEAK becomes useful only
when the value can be predicted from DC current
characteristics. We propose using a simple estimate of
IPEAK, disregarding the effects of the load capacitance REFERENCES
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832 NSTI-Nanotech 2008, www.nsti.org, ISBN 978-1-4200-8505-1 Vol. 3

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