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Gate Gate Gate GA: Electronic Devices and Circuits
Gate Gate Gate GA: Electronic Devices and Circuits
ELECTRO E ONIC DEVIC AND CI CE IRCUITS-T THEORY Introduct tion: *Semicon nductor Itsamater rialwhosecon nductivityisinbetweenm metalandinsu ulator.Germa anium (Ge)ands silicon(Si)are emostcomm monlyusedsemiconductorinVLSItechn nology Orbitalstr ructureofSi2,8,4so othereare4e electronsino outermostbandandready ytoformbonding. ForGeorbitalstructurewillbe2,8, ,18,4andthu uselectronsaretheretofo ormbonding. eraturemoreandmoreele ectronsgetfr ree.Soinotherwordmate erial Asweincreasetempe Becomem moreandmoreconductive e;but R Henceastemperatureincreases{T T,}, Resistancedecreases( (R,} on Applicatio Allwafers sonwhichcir rcuitsareinfa abricatedare emadeupofs siliconanothe erreasonofu usingsiliconis thatitisa abundantinn nature
si
1 onductivity co
current?( (neglect temp perature effe ect) n = 700cm 2 / vs ,q= 0 =1.6x 10 (a)1.5m mA (b)1.3m mA (c)1. .12mA (d A d)1
2
19
m 2) If mob bility due to impurity scat ttering is 1cm / v s and due to lattic 2cm / v s .what is d ce resultant scattering in material. n Mobilit ty
(a) 2cm / v s
2
(b) 1cm / v s )
2
5 (c) 0.5cm / v s
2
cm (d) 0.67c / v s
2
Mobilit ty
(a) 10 cm / v s
2
(b)100 cm / v s (
2
(c) )1000 cm / v s
2
(d)10000 cm / v s
2 16 3
cm and acce 4) A hypo othetical sem miconductor h having donor concentrati r ion( N d ) equ to 10 / c ual eptor
concentra ation ( N a ) 2 10 / cm .what is new electron and hole concen w d ntration.
16 3
IntrinsicandE ExtrinsicSilico on
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700 = 11.2
R=
L
A
= 8928.57 7
I=
V = 1.12 2mA R
+ ..... + 1 =
n
1
Here n=2
1 1 = + = 1.5 1 2
= 0.67cm2 / v s m
106 = = 1000cm2 / v s 3 10
4) SOLU UTION: (b)
Na > Nd
n0 = N a N d = 1016 / cm3
n0 p0 = ni 2
n0 = 104 / cm3
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