Title:

Deposition and Characterization of Diamond Coatings on WC-Co Cutting

Tools with W/Al Interlayer
Authors:
Y.Tang, Y.s.Li, Q.Yang, A.Hirose
Details:
Y.Tang, Y.s.Li, Q.Yang, A.Hirose. Deposition and Characterization of
Diamond Coatings on WC-Co Cutting Tools with W/Al Interlayer. Diamond
and Related Materials 19(5):496-499.
DOI:
10.1016/j.diamond.2009.12.019
URL:
https://www.sciencedirect.com/science/article/abs/pii/S0925963510000087
Summary:
In the present work Y.S.Li et al. have worked on providing a double interlayer
of W/Al for diamond coatings on the WC-Co cutting tools because Al helps in
reducing the catalytic reactivity of the transitioning metal to form graphite and
a layer of W helps in enhancing the diamond nucleation. There were two steps
that the authors used to create the interlayer. Firstly the sample were cleaned
with help of acetone and methanol for interlayer deposition using an ion beam
assisted sputtering system for Al and W interlayers. Then a 2.45GHz
Microwave plasma chemical vapor deposition (CVD) was used for diamond
coating deposition. After deposition of diamond they were characterized by X-
Ray diffraction (XRD), micro-Raman spectroscopy, scanning electron
microscopy (SEM). A load of 1470N was used to examine the adhesion of
diamond coatings by Rockwell C indentation. The results from XRD showed
diamond peaks in each pattern and the highest intensity was observed in
sample with W/Al. The results obtained from the Raman spectra showed that
Dia/W/Al/WC-Co_has largest full width at half maximum (FWHM) of 14cm -
1
and have the smallest grain size. The results obtained from SEM revealed that
the continuous diamond coating with an average size of approximately 1µm
was formed on sample with double interlayer of W/Al and the results also
showed that the W/Al has the best adhesion to diamond coatings compared to
Dia/Al/WC-Co or Dia/W/WC-Co. The double interlayer were of 50-65nm
which had negligible effect on mechanical properties and sharpness of cutting
edge tool. The researchers were successful to show that the W/Al interlayer has
high nucleation density and better adhesion compared to single interlayer of
both elements or without any interlayer.
Words:
275

Tabular Data:
Workpiece WC-Co Cutting Tools
Working Pressure in Interlayer Deposition 30 Torr
Wavelength of Raman spectrometer 514.5nm
Indentation Load 1475N
FWHM 14cm-1
Thickness of W/Al Interlayer 50-65nm