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609

Optical Properties of Wide Bandgap 111-V Nitride Semiconductors


(Invited)

k.M. Kolbas, I. K. Shmagin, J. F. Muth


Department of Electrical and Computer Engineering
NC State University, Raleigh N C 27695-791 1
9 19-5 15-7350; 919-5 15-5523(f); kolbas@eos.ncsu.edu

Abstract edge is at 369 nm and has a 10 nm width, which is


Applications of 111-V nitride materials, such as comparable to 60 pm thick high quality epitaxial
GaN. AIN. InN and their allow include blue-ereen films grown on sapphire substrates. The small
light'emitting devices, solar -blind photodetectors, absorption coefficient and narrow width of the
and high power/frequency electronics. A number absorption band edge imply that the bulk GaN
of unique and potentially useful optical single crystals have a very high optical quality and
phenomena have been observed in high quality a low optical defect density. SIMS analysis
thin f i l m and heterostructures of AIGaN, GaN, indicated that the sample had I-, 2-, 5x10'' cm
and InGaN. These include: 1) persistent optical concentrations of [Si],[C], [HI, and 3x10'' cm' of
effects such as optical metastability in bulk GaN [O], respectively.
single crystals; 2) tunable emission from InGaN
multiple quantum wells, (MQW) and; 3) 1.g
reconfigurable optical properties in InGaN/GaN
heterostructures.

Photoinduced Metastable Defects


Persistent optical effects have been studied in wide
band-gap semiconductors by several research
groups. [l] Deep levels are responsible for
persistent photoconductivity in n- and p- type
GaN. In this case an impurity associated lattice
relaxation mechanism has been suggested to be
causing the persistent photoconductivity in the p-
and n-type GaN. Optical memory effects have
been seen and associated with oxygen impurities
in epitaxially grown GaN and A1N epitaxial thin
films that have distinct morphological features. In 600 550 500 450 400 350
general persistence lasts much longer than in other
semiconductors due to the large binding energies WAVELENGTH (nm)
in these wide band gap materials.
Fig. I Room temperature transmission spectrum through
Optical Metastability in a bulk GaN single crystal (=0.25 mm). The absorption
Bulk GaN Single Crystals coefficient was calculated to be 50 cm-' at 500 nm.
Optical metastability in high quality bulk GaN
single crystals (grown by sublimation of cold Photoluminescence from a bulk GaN crystal at
pressed GaN pellets in flowing ammonia) has been 77K is shown in Figure 2. The band edge
observed at both room and cryogenic emission peak is centered at 359.0 nm and has a
temperatures. Details of the growth by Professors full width at half maximum (FWHM) of 5 nm (48
Sitar and Davis can be found elsewhere. [ 2 ] The meV). The edge is.red-shifted approximately 10
crystals are well faceted hexagonally shaped rods nm relative to thin epitaxial GaN films grown on
(0.2-0.3 mm wide and 0.7-1.0 mm long) with the sapphire (due to selective absorption or lack of
e-axis along the length of the crystal. The crystals strain relative to thin films). The initial emission
are colorless and transparent to the naked eye and spectrum (Figure 2a) was centered on the band
have excellent room temperature transmission edge and appeared colorless to the naked eye (no
curves as shown in Figure 1. The absorption band yellow or blue).

0-7803-4306-9/98/$10.001998 IEEE
610

After 10 minutes the spectrum exhibits another in intensity throughout the tuning range. The
peak at 378.0 nm and the color gradually changes sample used was grown by atmospheric pressure
to bright blue. After 27 minutes of excitation the MOCVD in the group of Prof. S . P. DenBaars,
blue emission band is centered at 388.0 nm and University of California, Santa Barbara. The
consists of at least one LO-phonon (90 meV) sample consisted of 5 InGaN quantum wells
assisted replica of the zero-phonon (378.0 nm) deposited on top of a 2.4 mm GaN layer (Si
line. The large FWHM of the blue emission (249 doped). The InGaN quantum wells and
meV) implies a strong lattice interaction. No Inoo5Gq95Nbarriers were 2.5 and 7 nm thick,
decrease in the total output emission intensity was respectively. The structure was completed with a
detected at 77 K, while the ratio of blue (388.0 50 nm thick GaN capping layer. Details of the
nrn) to UV (359.0 nm) output intensities increased growth process can be found elsewhere. [4]
by a factor of 10 during 27 minutes of exposure.
Similar new peaks were observed at room The power density dependent room temperature
temperature but the integrated intensity of the spectra representative of photoluminescence
peaks decreased by a factor of 20. [3] measurements from the sample are shown in
Figure 3. The power density for the presented
data was changed by defocusing the excitation
I ' . . .meV
B u l k G a N . ' . . ' 85 '.. ' beam from 0.11 mm (6.32 KW/cm3) to 1.6 mm
T= 77 K (0.63 KW/cm3). As shown in Figure 3 (a), a single
short wavelength emission peak centered at 475
nm with a FWHM of 28 nm corresponded to the
highest input power density.

480 440 400 360 320


WAVELENGTH (nm)
Fig. 2 77K photoluminescence spectra from a bulk GaN
single crystal. The ratio of blue to UV emission increased
by a factor of 10 during the 27 minutes exposure. 650 600 550 500 450 400 350;
WAVELENGTH (nm)
No physical damage was done to the surface of the
sample as observed under an optical microscope. Fig. 3 Room temperature photoluminescence spectra
To verify that the changes in the optical properties .from the 5-quantum well InGaN sample at various power
were indeed metastable, the room temperature densities. The wavelength shifts more than 90 nm at
emission spectrum was taken from the sample two room temperature.
weeks after the room temperature results were
obtained. The integrated output emission was The peak wavelength and EWHM of 'the output
restored to its original intensity, but the blue emission spectra from the InGaN/GaN MQWs at
emission band was still clearly observed. Such a 77 K are plotted as a .function of input power
long recovery time indicates that the photoinduced density in Figure 4 (a) and (b), respectively. Note
levels have a large thermal activation energy or that the output emission spectra shift toward
that the process is not reversible. shorter wavelengths and narrower FWHM at higher
pump densities. This is opposite to what would be
Tunable Emission from expected if the sample were heating. Even though
InGaN Multiple Quantum Wells these results were obtained under pulsed excitation
Tunable visible emission from InGaN/GaN similar power dependent results were observed
quantum wells from blue (470 nm) to yellow (560 using CW excitation (Ar-ion laser, 305 nrn).
. .
nm) was achieved by varying the pump. power
density. The output emission was nearly constant
61 1

The shift in emission wavelength with excitation layer grown on 1.5 p m of GaN on a c-
In,, 14Ga,l.X6N
power density could be due to tunneling-assisted plane sapphire substrate. [5] The frequency
donor to acceptor transitions, a change in binding tripled pulsed output of a TiSapphire laser (250 fs
energies of impurities due to quantum size effects, pulse at 280 nm) was used for both reading and
bandfilling effects, and piezoelectric field induced writing information.
energy shifts. However, none of these effects
alone appear to be sufficient to explain the large The 300K CW photoluminescence peak was
observed shift. Additional work, including the centered at 403 nm (14% Indium composition)
analysis of "V" shaped defects observed in TEM with a (FWHM) of 19 nm. Pulsed
cross sections, need to be considered. photoluminescence taken at 77 K with a frequency
tripled TiSapphire laser had a FWHM of 18 nm
(Fig. 5(a)) and narrowed under increased pump
levels to 3 nm as shown in Fig. 5(b) The line
narrowing and rapid increase in intensity is a
strong indicator of high quality of this sample and
is indicative of the onset of stimulated emission.

%
z
2~~~~

470

65
60
g
W
55 5 (a)
c
4
50 rl
a
Y
45
450 420 390 360 450 420 390 360
40 WAVELENGTH (nm) WAVELENGTH (nm)
35
Fig. 5 77 K pulsed photoluminescence spectra from the
-_
Rn InGaN/Gah' single heterostructure at power densities of
0 1 2 3 4 5 6 7
approximately 4 and 8 MW cnY2. The output emission
INPUT POWER DENSITY (KW cm' 2, line width narrows from 18 nm to 3 nm with increased
Fig. 4 Peak wavelength (a) and FWHM (b) of the output power density, as shown in (a) and (b) respectively.
emission from the Swell InGaN quantum well sample as
a function of pump power density at 77K. In "read" conditions the sample is broadly
illuminated at low power density (0.4 W cm.?
Data Storage in InGaN Heterostructures average power; peak power of 0.01 MW cm").
InGaN heterostructures may have potential The grainy appearance in the photographs of
applications in optically encoded information Figure 6 is the result of scattered light from the
storage and other photonic devices such as spatial unpolished side of the sapphire substrate and not
light modulators. Specifically, it was found that the epitaxial film which is smooth. To the naked
high density, high contrast patterns could be eye under these conditions the sample appeared
written on InGaN/GaN heterostructures with purple-violet.
ultraviolet light at room and cryogenic (77K)
temperatures. After the written pattern is erased Writing the vertical lines on the sample shown in
new information can be written on the same spot Figure 6 was accomplished by focusing the
without degradation in efficiency or retention frequency tripled output of the TiSapphire laser
time. These effects last more than 4 hours at room (280 nm) to a spot size of approximately 200 pm.
temperature and have a much longer retention The average power density in "write" condition was
time at 77 K. approximately 160 W cnY2 (peak power of 4 MW
The sample used in this study was grown in the cm.'). To write a pattern the focused beam was
laboratory of Professor R. Dupuis at the University manually translated across the surface of the
of Texas at Austin by low pressure MOCVD. It sample using the X and Y micrometer screws on
consisted of a 60 nm unintentionally doped the focusing lens mount. Translating the lens
612

slowly resulted in a bright high contrast line while


translating quickly resulted in a low contrast line. InGaN MQWs were also evaluated and found to
The breaks in the line are due to the human have longer retention times than the single
operator not moving the micrometer smoothly and heterostructure. [7] The image is persistent for
are not due to the material. These results suggest more that five days for a 12 MQW sample and
that the writing process is fluence dependent. more than several months for a 20 MQW sample.
The effect can be applied to optical data storage
The set of parallel vertical lines shown in Fig. 6 technology and other photonic devices such as
were written at room temperature. The sample was spatial light modulators used in optical correlators
left under room lights at room temperature and and optical interconnects.
photographs were taken under "read" conditions
after two, three, and four hours as shown in Figure Conclusions
6 . Note that the visible contrast between the The ability to write, store and read information
written pattern and the unexposed area diminished with ultra-violet light on an InGaN/GaN
with time. The ability to repeat the writing and heterostructure or quantum well heterostructure
reading process on the same location of the have been demonstrated. The effect is quite
sample without loss of contrast was confirmed strong and persists at room temperature from a
several times. [6] few hours to several days. Understanding and
InG."aU Single tletern\trurture. Kl enhancing these effects could lead to a new high
density optical storage medium as well as other
photonic devices such as spatial light modulators
used in optical correlators and optical
interconnects. A more complete understanding of
these mechanisms should also help in the growth
and design of 111-V nitride-based optoelectronic
devices such as laser diodes, light-emitting diodes
and detectors.

References
t=t,. It- Z hr 1. See references 4 through 13 in reference 3 below
2. C. M. Balkas, Z. Sitar, T. Zheleva, L. Bergman, I. K.
Shmagin, J. F. Muth, R. M. Kolbas, R. Nemanich, and
R. F. Davis, Materials Research Society Symp. Proc.
Vol. 499,Ill-VNitrides, pp. 41-46(1997).
3. I. K. Shmagin, J. F. Muth, J. H. Lee, R. M. Kolbas,
C. M. Balkas, Z. Sitar and R. F. Davis, Applied Physics
Letters Vol. 71,No. 4,pp. 455-457(28July 1997).
4. S. Keller, B. P. Keller, D. Kapolnek, U. K. Mishra,
S . P. DenBaars, I. K. Shrnagin, R. M. Kolbas and S .
At= 3 hr. &=-I tir. Krishnankutty, J. Crystal Growth Vol. 170, 349-352
Fig. 6 An optical pattern consisting of a set of parallel (1997).
lines was written on the InGaNlGaN single heterostructure 5. P. A. Grudowski, C. J. Eiting, J. Park, B. S . Shelton
by high-density W light at room temperature. The and D. J. H. Lambert, and R. D. Dupuis, submitted to
photoinduced pattern is clearly observed in low intensity Appl. Phys. Lett, Manuscript number L-1773.
UV light. Note the diminishing contrast between the 6. I. K. Shmagin, J. F. Muth, R. M. Kolbas, R. D.
written pattern and the unexposed areas with time. Dupuis, P. A. Grudowski, C. J. Eiting, J. Park, B. S .
Shelton and D. J. H. Lambert, Applied Physics Letters
No damage or change in the surface of the sample Vol. 71,No. 18,pp. 2572-2574(3 November 1997).
due to the writing process was observed. ' The area 7. I. K. Shmagin, J. F. Muth, R. M. Kolbas, M. P.
on which information was written was examined Mack, A. c. Abare, s. Keller, L. A. ColdEn, U. K.
under an optical hefore and after Mishra and S. P. DenBaam, Applied Physics Letters Vol.
immersion in HC1 (20 min.). No Or 71,No. 11, pp. 1455-1457(15September 1997).
residual pattern was observed before or after the
HCI immersion. After the HCI immersion the
optical pattern w a still visible under "read"
conditions.

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