Zhadnov - EGAS50 Poster Lowering Thermal Noise of Ultrastable Cavities To 1e 17 Level of Fractional Frequency Instability

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Lowering thermal noise of ultrastable cavities to −17

10 level
of fractional frequency instability
N. Zhadnov a,b, K. Kudeyarov a,b, I. Semerikov a,b, D. Kruchkov a,b, K. Khabarova a,b, N. Kolachevsky a,b
a P.N. Lebedev Physical Institute, 119991 Moscow, Leninsky prospekt 53, Russia
b Russian Quantum Center, 143025 ul. Novaya 100, Skolkovo, Moscow region, Russia

Applications of ultrastable lasers Progress over time PDH locking scheme


PDH
error
signal ∆𝜔(∆𝜔+𝑖𝛿𝜔/2)
𝑟𝐹𝑃 ∆𝜔 = − 2 2 , Δ𝜔 ≪ ∆𝜔𝐹𝑆𝑅
(𝛿𝜔/2) +Δ𝜔

Optical clocks
► Probing narrow clock transition ≈ order of magnitude increase in 10 years
► Providing stability on times <100 sec
► 𝜎𝑦2 𝜏
1 ∞ 𝑔𝑚 2 𝐿𝐴𝑆𝐸𝑅 𝑚
= σ𝑚=1 2 𝑆𝑦 ( ) Thermal noise
𝜏 𝑔0 𝑇𝑐
σ ∞ 2𝜋𝑖𝑚𝑡/𝑇𝑐
𝑔 𝑡 = 𝑚=1 𝑔𝑚 ∙ 𝑒
Silicon cryogenic cavities
Sources of noise Monocrystalline silicon (for spacer & substrate)
Thermally induced ► Transparent at λ > 1200 nm
𝜹𝒇 𝜹𝑳෨ f – optical mode frequency vibrations of the ► High Young’s modulus (3x for Quarts)
=− ► High thermal conductivity (100x for glass)
𝒇 𝑳෨ 𝑳෨ – generalized cavity length surface lead to
fluctuations of ► Zero CTE point at 124 K
Insensitive resonator ► Very low mechanical losses (φ≈10-8)
length and eigen
Vibrations Alternatives: ULE glass, sapphire, zerodur,
mount frequency fused silica, GaAs (?).
Temperature Stabilizing temperature Mirror coatings:
Multilayer Bragg reflectors made from
instability at zero CTE point SiO2/Ta2O5 (dielectric) or AlGaAs/GaAs
Real setup:
► vacuum 10-9 mbar
(crystalline). Both have excellent optical
Thermal High-Q materials (Silicon properties, but crystalline mirrors are more
► 3 mK temperature stab.
Simplified formula for 𝑇 ∙ 𝜑𝑐𝑜𝑎𝑡 ► Autonomous LN2
noise substrates, GaAs mirrors) promising due to higher resistance to thermal
estimation of thermal 𝜎𝑦 ~ 5/4 1/2 1/2 noise. They also demonstrate birefringence.
generator
noise floor: 𝐿 ∙λ ∙𝐸
Lower temperatures (up
to 4 K with Silicon) Spacer/ Mirror Contribution of Contribution 𝝈𝒚
substrate substrate, % of coating, % ∙ 𝟏𝟎−𝟏𝟕
ULE/SiO2 (77.5 mm) SiO2/Ta2O5 1 97 49
Longer cavities
Si/Si (77.5 mm) SiO2/Ta2O5 <1 99 22
Si/Si (77.5 mm) AlGaAs 3 97 5 GaAs/AlGaAs
ULE/SiO2 (480 mm) AlGaAs 1 88 7 multilayer Bragg
SiO2/Ta2O5 reflectors
Finesse≈580000
FEA to find optimal support strategy and vibrational sensitivity
77,5 mm

Horizontal cavity mount Symmetric


boundary
48 cm long monolithic conditions to
ULE cavity speed up
calculations
AlGaAs/GaAs
Finesse≈250000

Horizontal and vertical cavities


∆𝐿෨
ത 𝑠ҧ = 𝑠 𝑇 + 𝑠 𝑅
= 𝑠ҧ ∙ 𝑎,
Sitall glass «bed» 𝐿෨
Vibration Vertical Horizontal
sensitivit cavity, 1/g cavity, 1/g
y
𝒔𝑹
𝑿 2×10−8 2×10−10

𝒔𝑻𝑿 2×10−8 1×10−10

𝒔𝑹
𝒀 2×10−8 4×10−11
Finding Airy points 𝒔𝑻𝒀 2×10−8 4×10−11
l = 98.68 mm, d = 74.46 mm 𝒔𝑹 8×10−12 2×10−10
𝒁

References 𝒔𝑻𝒁 1×10−10 3×10−10

Models of vacuum chambers


[1] D. Matei et al. Phys. Rev. Lett. 118, 263202 (2017)
[2] S. Häfner et al. Opt. Lett., 40(9), 2112 (2015)
[3] N. Zhadnov et al. Quantum Electronics, 48 (5), 425 (2018)
480 mm

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