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Fujikawa Et Al - 1978 - Diffusion of Silicon in Aluminum
Fujikawa Et Al - 1978 - Diffusion of Silicon in Aluminum
Y
O.O
E
~ ~ _ m2/s.
The Kirkendall marker movement toward the Si-
rich side was observed, indicating that the Si atom
[4]
10-'z
F
~ K
7
3
8
~ 853K
6
823 0
lo ~\823K(Buckle) 823K vxe 40 808K 753 K
20
10-13["--",
0 0.1
, "---
773 .'~.> ' - . 774K(Mehl)
0.2 0.3 0.4 0.5 0.6
]
24
I
6
Time1/2(102s1/2)
8
i 1
10 II
Si (at. pet) Fig. 3--Relationship between the Kirkendall marker shift and
Fig. 2--Concentration dependence of the interdiffusion coef- square root of diffusion time for the interdiffusion on A1-Si
ficients in A1-Si alloys. alloy/A1 couple.
Table IV. Diffusion Parameters for Diffusion of Si and AI in AI 4.2. A p p l i c a t i o n of the E l e c t r o s t a t i c T h e o r y to the
D i f f u si o n of Si in A1, and the V a c a n c y - S i A t o m
Diffusing D0, Q, Temp. Range,
Atom ]O-4 m2/s k J real. "J K Method Worker
Binding E n e r g y
AQ = Qimp - Qself