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ELIONIX Inc.Nanotechnology ror the Next Generation,
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Key features
~ Superior large field writing :
Uniform 10nm lines in entire 600 um field
Small beam diameter at high beam current :
2nm beam diameter at InAUltra High Precision Electron Beam Lithography System
Best Pattern Writing Capability
5 ce
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7
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‘Sam Lines in fine pitch
Key features
+ Line width of Snm or less is guaranteed at 125kV *
+ 1.7nm beam diameter & minimum proximity effect at 125kV 15m Rings
User-friendly Interface
(CAD and SEM interfaces on Windows]
- Easy patter design function
- Easy control of beam condition
CAD Interface
ee
2jum thick pattern for SAW device
5Onm Squares
‘SOrm TrianglesSPECIFICATIONS
Tinooraphy | {rmine meted Vectr scon Pr 4 mW) x3 mD) X25 mf) or larger
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= [ Glecton beam shape } Sct beam (Gaussian) EM [Power Sinele chase A200 V, GVA. 50/60 He NF)
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optics [Acceleration voltage } 125 KV (Maximur) &
system | (Beamelameter] 1.7 nm Dy aivogen | Pressure: 02. 1.0 MPa
Pn oF na tox 60 Ue
Comecton: 68 nmin ube
By] ren 08- 1.008
Litoeaphy | {Oxencurnt] BA 1000 Feomoressed | Mesum fw: 60min
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Specifications subject to change without notice
ELIONIX Inc.
3:78 Motoekayama Hach. Tox, Jaan
Tel +8)-0428260811
Wed ste esd/awlereeaie
Snore :WONG'S KONG KING Singapore) PTE LTD.
41 Gentng Lane, Singapore 39556.
Woo ete ts/r.wcncor
15-1F,Na37, SEC2, San Nin Ra Panehiao, Taal, Talwan
TTabwan: Great Domain Enterprise Co. Lt
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care Kaneol Scone Co. i Wee ste nt great oman com tw
kyweram Bde. Noa02 163-16,
USA: SEITech Salutons Ine.
Seongrae ong, Kanedone,
Seoul, 194.092, Keres
Tet +82(0;2473.9567
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