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EE312 Experiment 5 Report Talal Aloushan 441102306
EE312 Experiment 5 Report Talal Aloushan 441102306
Talal Aloushan
441102306
: CIRCUIT DIAGRAMS
VGS = Vt = 3.33 v
PROCEDURE B :
Post-Lab
a)
b)
ro = vds/id = 1/1.53m = 0.65kohm , ro = 3/3.54m = 0.84kohm
c)
rds = vds/id = 0/1 = 0 , rds = 0.05/2.29m = 0.02kohm
d)
ro and rds have a positive relationship
Observations :
I observed that whenever we increase the threshold voltage the VDS increases also by a lot , also
observed that if VGS is less than Vt then the NMOS is said to be cutoff , but if VGS is more then
Vt then the device is said to be either in triode or in saturation
Discussion of Observations :
VDS increase with Vt because they have a positive relationship they varies eachother , it is said
to be cutoff because the NMOS is operating in the positive side and the Vt should be Positive ,
that explains why is it in triode and saturation mode also .
Conclusion :
Findings :
I understood the relationship between the gate , drain and source , how the NMOS works , which
region or operation the nmos in , how the vgs controls the current flowing in the drain , how to
obtain the Vt and what does it mean and do , how to get additonal data from an obtained data.
Meeting the objectives :
To be get acquainted with the basic principles of operation of the enhancement n-channel
MOS transistor :
I understood ho the cutoff , triode , saturation operations works .
To experimentally obtain the necessary measurements to plot the iD-vDS characteristics
for a sample n-channel MOS transistor :
I did it in procedure A when i measured the Vt .
To learn how to calculate important parameters from the experimentally-obtained data :
I met this objective at procedure B when calculated VRD and ID .