Professional Documents
Culture Documents
Low-Temperature Purification of Silicon by Dissolution and Solution Growth in Sodium Solvent
Low-Temperature Purification of Silicon by Dissolution and Solution Growth in Sodium Solvent
DOI 10.1007/s12633-011-9105-8
ORIGINAL PAPER
Received: 9 August 2011 / Accepted: 29 November 2011 / Published online: 1 March 2012
# Springer Science+Business Media B.V. 2011
Abstract Efficient low-cost processes for solar-grade Si by hydrogen reduction of SiHCl3 at high temperature [1], i.e.
production are needed to overcome the deficiency in the the Siemens method. In addition to this method, some
supply of Si. We have demonstrated a new method for the other chemical methods have been investigated; the zinc re-
purification of Si crystal. Low-purity Si powder was dissolved duction method, the fluidized bed reactor method and the tube
in a Na melt (solvent), and Si grains were crystallized by Na furnace method [1]. These are relatively high-cost processes
evaporation from the Na-Si solution at 1173 K. Glow because large amounts of electrical energy are consumed and
discharge mass spectrometry analysis revealed that the the production yield is not enough. Alternative and efficient
concentrations of impurity elements, except Na and B, low-cost processes for the solar-grade Si (6–7 N) production
were decreased in the crystallized Si grain. In particular, are needed to overcome the deficiency in the Si supply.
the concentration of Fe which was mainly included in the Si The solidification method has been studied for the puri-
powder decreased from 3200 ppm by mass to 1.5 ppm by fication of Si [1, 2]. This is a representative metallurgical
mass in a refined Si grain. Iron disilicide was crystallized from refining method based on the difference between impurity-
the solution before the crystallization of Si. It was suggested element solubilities in the solid phase and the melt phase of
that impurities were reduced not only by crystallization from Si. In a Cu-Si alloying method [3], Si was alloyed with Cu
the Na-Si melt but also by the dissolution of Si into the melt. to trap impurities and the purified Si was recovered by
Na contaminating the refined Si grain was eliminated down to grinding and gravity separation [3]. A low-temperature pu-
0.055 mass ppm by heating at 1723 K under vacuum. rification method using an aluminum melt (melting point of
Al, 933 K) has been studied [4]. In this work, the impurities
Keywords Silicon . Sodium . Purification . Solution growth of Si were efficiently removed because the solubilities of
impurities in the Si crystals decrease with decreasing temper-
ature [5]. However, after crystallization of Si from a Si-Al
1 Introduction solution, Al should be dissolved in an acid solution in order to
separate the Si, and about 500–600 ppm by mass of Al is
The recent demand for Si for use in solar batteries has greatly included in the Si crystals [4].
expanded and surpassed the supply of Si from the semicon- Recently, Morito et al. proposed a Na-Si binary phase
ductor industries. Semiconductor-grade Si (purity: 11 N) has diagram showing that Si dissolves into a Na melt by about
been produced by trichlorosilane (SiHCl3) distillation followed 55 at% at 1173 K [6]. Poly- and single-crystalline Si were
prepared by vaporizing Na from Na-Si solutions at 1073–
H. Morito (*) : T. Karahashi : M. Uchikoshi : M. Isshiki : 1173 K [6, 7]. The Na solvent can be removed completely
H. Yamane by evaporation due to the high vapor pressure of Na at a
Institute of Multidisciplinary Research for Advanced Materials, high temperature. In the present study, the concentrations
Tohoku University,
of impurity elements were reduced by dissolving low
2-1-1 Katahira, Aoba-ku,
Sendai 980-8577, Japan purity Si into the Na melt and by crystallizing Si from
e-mail: morito@tagen.tohoku.ac.jp the solution.
122 Silicon (2012) 4:121–125
Ti: 170 → 0.016 ppm, Cr: 520 → 1.6 ppm, Mn: 260 → 1173 K, and most carbon contained in the refined Si grain
0.49 ppm, and Ni: 61→0.18 ppm. (70 ppm) presumably exists as inclusions.
Removal of P by solidification of Si from the Si melt is The Si purification process proposed in the present study
unattainable due to the high segregation coefficient of P is schematically presented in Fig. 5. According to the Na-Si
(0.35) between the solid phase and melt phase of silicon binary phase diagram [6], the composition of the liquidus
[5]. Yoshikawa and Morita demonstrated that P was effi- line at 1173 K is estimated to be at a molar ratio Na:Si04:6.
ciently removed to 0.72 ppm from Si by solidification of Si Thus, all of the Si powder in the upper crucible was
from a Si-Al solution at around 1323 K [4]. In the present dissolved in the Na melt and formed a solution with a
study, P was also decreased from 73 ppm in the raw Si composition of 40 mol% Si. As described above, the pre-
powder to 3.4 ppm in the refined Si grain. cipitates of impurities were observed between the Si grains
According to Newman and Wakefield, the solubility of C and on the bottom of the crucible. This suggests that some
in solid silicon is 3×1018 atoms/cm3 (about 30 ppm) at amounts of impurities could not be dissolved into the Na
1675 K [8]. The C solubility should be much lower at melt during the dissolution of Si (selective dissolution). The
Fig. 3 EDX spectrum of the precipitates observed on the lower surface Fig. 4 XRD pattern of the deposit scraped off the bottom of the BN
of the Si grain shown in Fig. 2 (d) crucible
124 Silicon (2012) 4:121–125
Table 1 Results of GDMS analysis for the Si powder and the Si grain must be greater than the density of the Na-Si melt (the
Element Impurity concentration (mass ppm) density of solid NaSi is 1.74 Mg/m3).
According to the liquidus line of the Na-Si binary phase
Raw Si powder Refined Si grain diagram [6], the crystallization of Si began in addition to the
precipitation of impurities when the Na composition in the
Surface Inside
melt decreased to 40 mol% or lower by Na evaporation. The
Li 0.22 0.036 0.012 polycrystalline Si crusts observed around the Si grains were
B 9.1 490 120 formed at the last stage. The evaporation rate of Na at this
C 330 8700 70 stage was presumably faster than that before this stage due
O 2300 9800 150 to the small volume of the melt and the increase of the
Na 2.6 480 85 specific surface area.
Mg 12 12 0.13 Since the melting point of the ternary compound NaAlSi
Al 510 2400 6.0
is at around 1150 K, the Na-Al-Si melt coexists with the Na-
P 73 34 3.4
Si melt at 1173 K. Si and Al can also be crystallized by
Ca 96 82 1.7
evaporation of Na from the Na-Al-Si melt. The concentra-
tion of Al at the refined Si grain surface was higher than that
Sc 0.35 1.1 0.001
in the raw Si powder, suggesting that the Na-Al-Si melt
Ti 170 2.3 0.016
remains until the Na evaporates completely.
V 7.9 0.24 0.005
The concentration of B which affects electric properties of
Cr 520 31 1.6
Si was 120 ppm in the refined Si grain, higher than that in the
Mn 260 44 0.49
raw Si powder (9.1 ppm). This was presumably introduced
Fe 3200 170 1.5
into the melt from the BN crucible during heating of the
Co 1.7 0.11 0.002
sample. It would be possible to avoid B contamination by
Ni 61 7.6 0.18
using a crucible made of other materials, e.g. SiC.
The concentration of Na was increased from 2.6 ppm in
crystallization of transition metal silicides, such as FeSi2 and the raw Si powder to 85 ppm in the refined Si grain. In the
CrSi2, from the melt started before the crystallization of Si production of solar cells, Si is melted to form ingots or
because these crystalline phases were also observed between plates. It was expected that Na could be removed from Si
the bottom of the crucible and the undersurface of the by melting under vacuum because of the high vapor pres-
refined Si grain (Fig. 2(d)). The densities of FeSi2 and CrSi2 sure of Na at high temperature. The Si grains obtained by
are 4.85 Mg/m3 and 4.98 Mg/m3, respectively, [9, 10] which crystallization in the present study were placed in a BN
crucible, heated at 1723 K for 8 h, and then cooled to room
temperature in a vacuum furnace. The Na concentration
decreased from 85 ppm to 0.055 ppm, which was smaller than
that in the raw Si powder (1.5 ppm). Furthermore, after
heating, the concentration of volatile elements, Mg, P, and
Ca, were decreased down to 0.023, 0.40, and 0.12 ppm,
respectively. Yuge has reported that P, having a high vapor
pressure, can be removed by electron-beam melting in a
vacuum atmosphere [2]. The results of the present study
indicate that melting and heating at 1723 K under vacuum is
effective for the removal of Na and other volatile elements
from highly Na-contaminated Si grains.
After heating the container to 1173 K, the Na metal was
not contained in the upper crucible. The vaporized Na
reacted with the Si powder in the lower crucible heated at
1123 K (ΔT050) and was recycled in NaSi formed by
cooling. NaSi can be used as the source of the next purifi-
cation process by crystallization of Si from the Na-Si melt.
The impurity level in the refined Si grain obtained in
Fig. 5 Schematic illustration of the process for the dissolution of low-
the present study was insufficient for solar-grade Si. The
purity Si powder, recrystallization of a Si grain, and segregation of impurities could be decreased by repeating the crystalli-
impurities zation process. Although Na is a reactive metal and must
Silicon (2012) 4:121–125 125