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COXEM Education Cecoltec Agosto 20221
COXEM Education Cecoltec Agosto 20221
COXEM Education
Cecoltec Sales Division
SEM
Scanning
Electron
Microscope
01 What is the SEM
Introduce
VS
LOM SEM
Light Optical Microscope Scanning Electron Microscope
SEM
10-3 nm
LOM
103 nm
•E-gun
Emission
•CL lens
Condense
•Specimen
Signal
•Detector
Detect
•Computer Image
Get Image
: Wavelength
- electron : 1pm / visible light : 1um
n : Refractive index
: Angle
Topography
The surface features of an object or “how to looks”,
its texture: direct relation between these features
and materials properties.
Morphology
Composition
The elements and compounds that the object is composed of
and the relative amounts of them;
direct relationship between composition and materials properties.
Crystallography
How the atoms are arranged in the object;
relation between these arrangements and material properties.
Temp
Up
* Tungsten Filament
Cartridge
- Heat electrons are generated by heating about 2,700K
Filament - Used for Thermionic guns.
<Advantage>
<Disadvantage>
W-hairpin
LaB6 Field Emission Gun
Emission Current
- The current emitted from the filament is returned
to a high voltage supply, direct by anode.
Beam Current
- The amount of current that through the Anode’s hole
Probe Current
- The amount of current that finally reaches the sample
while passing through CL, aperture, and OL.
Spherical aberration
Chromatic aberration
astigmatism
Cause by ??
- Lens making Technique of Asymmetricity
- Apertures
- Contamination
How to solve ??
- Adjust astigmator
astigmatism
Adjust the eight electromagnet astigmator called Octupole.
Find Focus
Astig X
Astig y
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01-03 Aberration
astigmatism
On Astigmatism
Min Fine Max
Off Astigmatism
Min Fine Max
SE & BSE
Column
EDS detector
SE detector
BSE detector
Electron beam
Specimen
- The specimen that is struck by an electron beam is imaged with the signals of
SE, BSE signal
01-04 Electron Beam
EDS
Secondary Electrons
Auger Electrons
4-50 Å
Backscattered Electrons >Atomic No. 3
Electron
Characteristic X-rays
Atomic No. 4 EDX
Sample Surface
Volume of
Primary
Excitation
<1 - 3 mm
Characteristic X-ray(EDS)
01-04 Electron Beam
Probe
KV
Current
Aperture Working
Size Distance 1. Acceleration Voltage
- Control the beam acceleration.
- Control the beam current
4. Working Distance
- Control the depth of field.
01-04 Condition for Image
Acceleration Voltage
High
High Resolution Unclear surface structure
More edge effect
More charge effect
More heating damage
Acceleration
Voltage
Low
01-04 Condition for Image
Acceleration Voltage
Acc : 10kV Acc : 20kV Acc : 30kV
- As the acceleration voltage increases, the resolution of the image increases as well
01-04 Condition for Image
Acceleration Voltage
Acc : 20kV
x10k x50k
Acc : 5kV
x10k x50k
The area of the electron beam penetrating the specimen varies depending on the acceleration
voltage. so the signal of the secondary electron also shows a different aspect.
01-04 Condition for Image
Acceleration Voltage
x5k x10k
x5k x10k
Acceleration Voltage
How to reduce
- Use low acceleration voltage
- Use small scanning area
- Use coating thick surface
- Use short scanning time
Acceleration Voltage
Acceleration Voltage
Acceleration Voltage
Probe Current
High
Smooth image Deteriorated resolution
More damage
Large Current(for BSE, EDS)
Probe
Current
Low
Probe Current
Probe Current
Spot Size: 7 Spot Size : 10 Spot Size : 13
Probe Current
When observing medium magnification, the proper size of beam is advantageous for improving
image quality and resolution.
Probe Current
Spot Size: 7 Spot Size : 10 Spot Size : 13
The first consideration when observing low magnification is to improve image quality.
In other words, the larger the electron beam, the greater the amount of secondary electrons,
which is advantageous for improving the image quality.
Probe Current
In other words, it is important to select the optimal electronic beam size based on magnification.
High Magnification : The purpose of improving resolution by selecting a small electron beam size
Medium Magnification : The purpose of improving resolution and quality by selecting an appropriate size for
electron beam size
Low Magnification : The purpose of improving image quality by selecting a large electronic beam size
Aperture Size
High
Large Current(for BSE, EDS) Low resolution
Small depth of field(Out focusing)
Aperture
Size
Low
Aperture Size
Working Distance
Aperture size : 100um Aperture size : 50um Aperture size : 30um
WD : 5mm
WD : 20mm
WD : 30mm
Aperture Size
Working Distance
Working
Distance
Working Distance
Aperture size : 100um Aperture size : 50um Aperture size : 30um
WD : 5mm
WD : 20mm
WD : 30mm
Working Distance
WD : 5mm WD : 20mm WD : 30um
In other words, the depth depends on the aperture and the working distance.
- The smaller the size of the aperture, the smaller the angle of convergence,
which increases the depth.
- The longer the working distance, the greater the depth.
Image distortion can occur depending on scan speed when charging effects occur.
2. Operator = Kwon
3. Sample preparation
Au Pt
Target
Sample R.P
Surface of cathode
e- Ion (or Atom)
Atom or Ion
In the vacuum,
1 4
2 3
0 mA 10 ~ 990 sec
Mineral
SE BSE-COMP BSE-TOPO
03 SEM Image
SE BSE
Parts of Vehicle
Ceramic
03 SEM Image
SE BSE
Parts of Vehicle
Ceramic
03 SEM Image
BSE SE SE+BSE
Ceramic
Electronic
Component
03 SEM Image
BSE SE SE+BSE
Spring
Alloy
03 SEM Image
Paper
Ant
03 SEM Image
Semi-
Conductor
Flower
03 SEM Image
Epidermis
of Onion
Petal
03 SEM Image
Mineral Semiconductor
(x1,000, 72 Stitched) (x1,000, 1440 stitched)
03 SEM Image
0° Angle
x20k x20k
45 ° Angle
x20k x20k
03 SEM Image
x5k x10k
x20k x30k
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Thank you.