Streamlining SEM

Imaging and Microanalysis

ZEISS SmartEDX
The ZEISS EDS Solution Dedicated to Your Routine
SEM Microanalysis Applications

zeiss.com/microscopy
 The ZEISS EDS Solution Dedicated to Your Routine
SEM Microanalysis Applications
› In Brief
If SEM imaging alone isn’t enough to gain a complete under-
standing of parts or samples, investigators will turn to Energy
› The Advantages
Dispersive Spectroscopy (EDS) to acquire spatially resolved ele-
› The Applications mental information from these surfaces.
› Technology and Details
ZEISS SmartEDX is the dedicated microanalysis solution designed specifically
for analytical routine applications performed on the ZEISS EVO Family and
Sigma 300.

ZEISS SmartEDX (fixed version): Peltier-cooled, ultra-compact

SmartEDX is one of the ZEISS’ workflow-guided solutions, which are developed design

to improve both ease of use and workflow repeatability in multi-user environ-

ments.

ZEISS SmartEDX is ideal for customers with a vested interest in streamlining their
number of analytical equipment suppliers. And because SmartEDX is supported
entirely by ZEISS, you can trust your EVO or Sigma 300 equipped with SmartEDX
to your ZEISS service engineer, who will take care of the entire system, both
imaging and microanalysis alike. Familiarity through consistency: Intuitive, workflow-guided
graphical user interface

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 Simpler. More Intelligent. More Integrated.
Workflow-guided Graphical User
› In Brief
Interface
› The Advantages
Like other ZEISS workflow-guided software
› The Applications
solutions, such as SmartSEM Touch, ZEN core,
› Technology and Details or Shuttle & Find for EVO and Sigma 300, the
SmartEDX software is easy to learn, intuitive
to use, and helps ensure repeatable execution
of analytical tasks on the SEM, particularly in
environments where more than one operator
will be using the system.
ZEISS SmartEDX user interface
Resolution and throughput that are Total system support
optimized for routine microanalysis
applications SmartEDX is supported like any other ZEISS
Not every SEM is alike, and the same is true for component. All installation, preventive mainte-
EDS solutions; thus, SEM and EDS have to be nance, warranty, diagnostics and repair, spare
paired with careful consideration. SmartEDX part logistics, and inclusion in total system service
provides highest (output count rate) throughput contracts are fully handled by ZEISS, making
at 129 eV energy resolution and 1-5 nA probe support of your analytical SEM solution easy.
current, which is the typical analytical operating
condition for both ZEISS EVO and Sigma 300
Scanning Electron Microscopes. This makes
SmartEDX a smart match to both our conventional
and field emission analytical SEM workhorses.
ZEISS EVO Scanning Electron Microscope with high vacuum and SmartEDX is supported entirely by ZEISS.
30 kV beam acceleration capabilities
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 SmartEDX at Work: Quantitative Microanalysis

To acquire reproducible and accurate spatially resolved elemental chemistry requires careful consideration
› In Brief
of both SEM and EDS operation conditions. Together, SmartEDX on either EVO or Sigma 300 is ideally suited
› The Advantages for routine microanalysis applications, particularly for customers with high standards for data reproducibility.

› The Applications
SEM operating conditions
1 2

H He
› Technology and Details The SEM must have the ability to create a high 3 4 5 6 7 8 9 10
180 K
Li Be B C N O F Ne
vacuum environment in the specimen chamber 11 12 6.40 7.06 13 14 15 16 17 18
160 K
Na Mg Al Si P S Cl Ar 140 K
25 26 27
to avoid scattering of the primary electron beam.
Mn Fe Co
19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36

K Ca Sc Ti V Cr Mn Fe Co Ni Cu Zn Ga Ge As Se Br Kr 120 K
Beam scatter compromises the spatial resolution 37

Rb Sr
38 39

Y
40 41 42 43 44 45

Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te
46 47 48 49 50 51 52 53

I
54

Xe 100 K
55 56 72 73 74 75 76 77 78
0.70 0.72
79 80 81 82 83 84 85 86 80 K
of the elemental chemistry data. Furthermore, Cs Ba Hf Ta W Re Os Ir Pt Au Hg Tl Pb Bi Po At Rn
60 K
87 88 104 105 106 107 108 109 110 111

Fr Ra Rf Db Sg Bh Hs Mt Ds Rg
the SEM must be able to adjust the primary beam 43 44 45 40 K

Tc Ru Rh
20 K
acceleration energy to sufficiently high values –
57 58 59 60 61 62 63 64 65 66 67 68 69 70 71

La Ce Pr Nd Pm Sm Eu Gd Tb Dy Ho Er Tm Yb Lu
0K
0.0
89 90 91 92 93 94 95 96 97 98 99 100 101 102 103

1.7 3.4 5.1 6.8 8.5 10.2

up to 30 kV – for optimal signal to noise ratio of Ac Th Pa U Np Pu Am Cm Bk Cf Es Fm Md No Lr

the peaks in the X-ray spectrum. ZEISS EVO and
Sigma 300 solutions meet these requirements for
delivery of the reproducible and accurate EDS data
you require in your daily decision making.
Assess your choice of kV up to 30 kV from a periodic table with Bulk spectrum from a mild steel component with a two-layer
K and L-line energy values cosmetic coating, used for a quick assessment of the elements
present in the sample

EDS operating conditions

Element Weight % Atomic % Net Int. Error % Kratio Z A F
SmartEDX has the versatility to provide 129 eV
intensity peak (energy) resolution, as well as opti- CK 10.97 29.41 443.27 9.22 0.0257 1.2026 0.1946 1.0000

mized detection of low energy X-rays from light OK 7.89 15.87 895.76 8.46 0.0240 1.1611 0.2621 1.0000

elements thanks to superior transmissivity of the SiK 8.00 9.17 2282.76 6.70 0.0366 1.0737 0.4245 1.0028
silicon nitride window on its X-ray detector.
CaK 2.39 1.92 782.66 2.52 0.0228 1.0250 0.9014 1.0351

FeK 61.18 35.26 13093.09 1.13 0.5725 0.9243 0.9998 1.0125

NiK 2.56 1.41 410.54 3.31 0.0217 0.9374 0.8921 1.0125

CuK 3.69 1.87 510.97 2.99 0.0305 0.8921 0.9125 1.0142

Smart quant results

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 SmartEDX at Work: Fast, Drift corrected, Elemental Mapping

All the capability you need to acquire

› In Brief
elemental maps quickly and accurately
› The Advantages Elemental maps, line scans, and spectra can
be displayed, interpreted, and quantified,
› The Applications
based either on the widely used CPS map, or
› Technology and Details on advanced quantification algorithms, which 20 µm
20 µm
of course include state of the art real-time ZAF
corrections. The optimal balance between speed
and energy resolution is just a mouse click away.

Drift correction is a standard SmartEDX feature,

available for every collection mode. Fully auto-
matic setting of all relevant parameters makes
the usage of drift correction as intuitive as an
eyeblink. 20 µm 20 µm

All this is complemented by Multipoint Analysis, Dissimilar joint between low alloy steel and nickel alloy. Sample courtesy of TWI Ltd

which beside the possibility of a survey for quick

and easy point sampling, allows saving and
recalling of multipoint scan lists, for automated,
reproducible, and consistent data collection.

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 The Technology that Drives Your Insights

Detector size tailored to routine

› In Brief
microanalysis requirements Input counts,
› The Advantages As practical throughput is controlled primarily by no resolution
pulse processing, we’ve implemented a detector
› The Applications
size that delivers optimum throughput at the
› Technology and Details probe current range required for the SEM system
to perform at its best. Speed >150 eV

Counts per Second (CPS)

In conjunction with a solid-state backscattered
electron detector, such as EVO or Sigma 300 HD-
BSD, the practical probe current range is typically
1-5 nA. It is in this range where the 30 mm2
detector of the SmartEDX system achieves the
best compromise between highest input count Middle
rate and lowest possible dead time to deliver 135 – 140 eV
the highest throughput (output count rate) at
129 eV energy resolution. Throughput can be
further enhanced, up to 300,000 output counts
per second, by selecting one of two faster pulse
processing settings, albeit at compromised energy Resolution
resolution. <129 eV

Probe current (nA)

Output count rate versus probe current for three pulse processor settings

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 The Technology that Drives Your Insights

Silicon nitride window for light element detection Elemental and phase quantification
› In Brief
The detector of the SmartEDX solution is fitted with an ultra-thin silicon nitride window, which allows SmartEDX utilizes the industry-standard ZAF
› The Advantages superior detection of low energy X-ray pulses from light elements such as carbon, nitrogen or oxygen. corrective algorithm for the interference effects
Detector energy resolution, specified at 129 eV for manganese K-alpha, extrapolates to approximately 60 eV of atomic number (Z), absorption (A) and
› The Applications
for carbon, which ensures excellent separation of light element peaks in the spectrum. fluorescence (F), in combination with predeter-
› Technology and Details mined X-ray intensity values for the different X-ray
energies from elemental standards (referred to
as standardless analysis).

In addition, SmartEDX enables the acquisition

and storage of reference spectra. Spectra from
unknown materials then can be matched against
reference spectra from the library – a method
referred to as spectrum matching – to aid in
identification. This method is particularly useful
for microanalysis applications where a relatively
limited number of materials are utilized, as is
often the case in manufacturing and assembly
environments.

0.040 0.105 0.170 0.235 0.300 0.365 0.430 0.495 0.560 0.625

EDS Spectrum from a carbon-coated Boron-Nitride sample, showing excellent separation and peak to noise background for the light elements
Boron, Carbon and Nitrogen

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 The Technology that Drives Your Insights
Fixed version for powerful analytical
› In Brief
capability in a compact package:
› The Advantages Ease of use and fast results with optimum price
performance ratio.
› The Applications
› Technology and Details
SmartEDX features a 30 mm2 chip, adequate for
all levels of analysis and high throughput for
industrial applications. The detector excellent
energy resolution is matched to an advanced low-
noise electronics, for best in class performance
and throughput.
The robust silicon nitride (Si3N4) window provided
as standard on SmartEDX, allows larger transmis-
sivity for low energy X-rays, a must for light
element analysis, while at the same time ensures
resistance to shock and corrosion, and full com-
patibility with plasma cleaning.
Retractable version to optimize detector 200000
position for your application: Optimized position 2 nA
180000
Increase the input count rate by moving the
160000
detector closer to the sample.
Output Counts per Second (OCPS)
140000
120000
Optimized position 1 nA
100000
Fixed position 2 nA
80000
60000
Fixed position 1 nA
40000
20000
Speed >150 eV Middle 135 – 140 eV Resolution <129 eV
Energy Resolution
Based on the same hardware as the fixed version The retractable version enables to keep low beam
of SmartEDX, this version can be retracted from current and small spot size, without sacrificing the
its analysis position to a safe position where the X-rays count rate. The input count rates collected
detector is hard to hit by e.g. a large sample. in the optimized position are more than twice
the counts of the fixed version of SmartEDX.
Movability helps if your samples are sensitive to
the electron beam and cannot withstand long
dwell times but a decent EDX is required, or if you
like to perform higher resolution imaging. In both
cases it is necessary to keep the spot size / probe
current small and to maximize the input count
rate.
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 The Technology that Drives Your Insights

› In Brief Detector
Type Silicon Drift
› The Advantages Cooling Peltier (LN-free)
Active Area 30 mm2
› The Applications
Window Silicon Nitride (Si3N4)

› Technology and Details Mount Fixed or Slide (optional, recommended for particle analysis)
Detection Range Be (4) to Am (95)

Pulse Processor
Amplification Time Three settings: Resolution, Middle and Speed
Best Energy Resolution 129 eV for Mn Ka
Input Count Rate (ICPS) Up to 1.000.000 CPS
Output Count Rate (OCPS) Up to 300.000 CPS (Speed amp time)
Up to 40.000 CPS (Resolution amp time)

Key Features
Peak Deconvolution Included
Quantitative Analysis Standardless, ZAF corrected. Spectrum Matching
Multipoint Analysis Included
Elemental Linescan Intensities (CPS) or Quant
Elemental Mapping Intensities (CPS) or Quant
Drift Correction Standard
Spectrum Matching Optional

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07745 Jena, Germany
microscopy@zeiss.com
www.zeiss.com/microscopy
Carl Zeiss Microscopy GmbH

Not for therapeutic use, treatment or medical diagnostic evidence. Not all products are available in every country. Contact your local ZEISS representative for more information.
EN_42_011_270 | Version 1.1 | CZ 08/2020 | Design, scope of delivery, and technical progress subject to change without notice. | © Carl Zeiss Microscopy GmbH