Download as pdf or txt
Download as pdf or txt
You are on page 1of 1

High energy

ball milling
MECHANICAL METHODS
Ball milling

OPTICAL LITHOGRAPHY

TOPDOWN APPROACH BULKMATERIALS->POWDER->NANO PARTICLES PHYSICAL PROCESSING METHODS

ELECTRON BEAM LITHOGRAPHY

Lithography is a physical process involving image


LITHOGRAPHIC TECHNIQUE
transfer or patterning into various types of media
X-RAY LITHOGRAPHY

NANO IMPRINT LITHOGRAPHY

Using electrical energy we can create a shock or using


explosives.Very high energy is used to join the Shock wave sintering
material.Usage of HIP,CIP lead to chocking
MOLECULAR IMPRINTING

To get desired shapes CONSOLIDATION OF NANO MATERIALS SYNTHESIS

Plasma is nothing but the 4th state matter(Ionization of gas) Spark plasma sintering LASER ABLATION Damage is less in laser cutting-Nano strip particles

In this method we use a plasma,which is an ionised


PLASMA ARCING
gas

PHYSICAL VAPOUR DEPOSITION Involves condensation of vapour phase species

Better step coverage,less radiation,very high


SPUTTERING pressure,removal of atoms,gas inlet->5-10 uniform
deposition

Material source is heated to high temperature,film


EVAPORATION
quality not good as sputtering

BOTTOMUP APPROACH NANOPARTICLES->CLUSTERS->ATOMS

Electrolytic deposition refers to a film growth process


which consists in formation of a metallic coating onto
ELECTROLYTIC DEPOSITION
a base material occurs through the electrochemical
reduction

It consists of hydrolysis,condensation,growth of Particulate


CHEMICAL VAPOUR DEPOSITION Deposition of vapour phase of reaction species SOLGEL METHOD
particles,agglomeration of particles polymeric

Simultaneous occurence of
CO-PRECIPITATION TECHNIQUES
nucleation,growth,coarsening,agglomeration

You might also like