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Article history: TiAlSiN coatings has been proposed and studied because of their desirable properties in hardness and coating-
Received 28 January 2016 substrate adhesion. Further improvement of their performance can be achieved by better understanding the ef-
Received in revised form 31 May 2016 fect of the concentration of each element on the microstructure and mechanical properties of the coatings. In this
Accepted 5 June 2016
paper, the TiAlSiN coatings with different Ti content were deposited by reactive DC magnetron sputtering
Available online 7 June 2016
method. The microstructure and mechanical properties of the coatings were analyzed by energy dispersive spec-
Keywords:
troscopy, X-ray diffraction, transmission electron microscope, scanning electron microscope, nano-indentor and
TiAlSiN Rockwell indentation tester. The results reveal that TiAlSiN coatings consisted of amorphous phase and crystal-
Nanocomposite coating line phase. With a Ti content of 63 at.%, as well as a Si content of 7 at.%, a super-hard TiAlSiN coating with a nano-
Ti content indentation hardness of 66 GPa was achieved. What is more, in contrast to the well-described super-hard
Hardness nanocomposite TiAlSiN coatings, another “nanocomposite” microstructure coating with a Ti content of 29 at.%
Adhesion strength in which the amorphous phase is wrapped in a crystalline phase was identified, with a comparatively low hard-
ness value of 20 GPa. The highest adhesion strengths with a Rockwell indentation classes HF2 was achieved for a
coating with a Ti content of 63 or 65 at.%.
© 2016 Elsevier Ltd. All rights reserved.
http://dx.doi.org/10.1016/j.ijrmhm.2016.06.005
0263-4368/© 2016 Elsevier Ltd. All rights reserved.
Q. Ma et al. / Int. Journal of Refractory Metals and Hard Materials 59 (2016) 114–120 115
The mechanism of how the Ti content affects the coatings' microstruc- Sample4 and Sample5 are designated corresponding to their prepara-
ture and mechanical properties was discussed. tion using the targets Ti0.4Al0.5Si0.1, Ti0.46Al0.45Si0.09, Ti0.58Al0.35Si0.07,
Ti0.64Al0.3Si0.06 and Ti0.7Al0.25Si0.05, respectively.
2. Experimental details To improve the adhesion strength between coating and substrate,
gradient interlayers Cr + CrN + TiAlN were used. When the deposition
2.1. Coating deposition process began, the substrate was faced with the Cr target firstly, for the
interlayers of Cr and CrN deposition. Then, rotated the substrate to the
TiAlSiN coatings with different Ti contents were deposited onto front of TiAl target for the TiAlN interlayer deposition. Finally, rotated
cemented carbide (WC-10 wt.% Co) substrates (shown as Fig. 1) by re- to the TiAlSi target for TiAlSiN coating deposition. In each process
active DC magnetron sputtering. Prior to deposition, all substrates above, the substrate was fixed, not rotated. The thicknesses of Cr/CrN/
were firstly mechanically polished, then ultrasonically cleaned and TiAlN and TiAlSiN in five samples are listed in Table 1. The sputtering pa-
sputter-etched to remove surface contaminants and the surface oxida- rameters for TiAlSiN coatings are listed in Table 2.
tion layer. After loading the samples, the vacuum chamber was evacu-
ated to a base pressure of 5 × 10–3 Pa and the deposition was carried 2.2. Coating characterization
out in a mixture of high purity argon (99.999%) and nitrogen
(99.999%) gases within a hybrid ion implantation and deposition appa- The chemical compositions of coatings were analyzed by energy dis-
ratus equipped with six targets including Cr, TiAl and TiAlSi sputtering persive spectroscopy (EDS) using a scanning electron microscope (SEM:
targets which are rectangular plates mounted vertically, shown as JSM 6010LA). The phases and texture were characterized by X-ray dif-
Fig. 1. The TiAlSi mosaic targets were made by mosaicking rectangular fraction (XRD: D/Max 2500) with CuKα radiation. In order to reduce
Ti (99.999%) chips of various numbers into a Ti0.4Al0.5Si0.1 plate. the influence of substrate on the coating, grazing incidence mode (Graz-
Fig. 2a–d shows schematic diagrams of TiAlSi mosaic targets with four ing incidence angle: 2°) in XRD was used. Morphology and thickness of
different Ti contents of TiAlSi, in which the dark strips are the Ti inserts coatings were measured by examining fractured cross-sections using
within the Ti0.4Al0.5Si0.1 target. An image of a TiAlSi mosaic target with 3 SEM (JSM 6010LA). To maintain the original fracture morphology of
Ti chips is shown in Fig. 2e. The area of Ti in the four mosaic targets the cross-section, the samples were snapped after preprocessing includ-
amount to 46, 58, 64 and 70 at.%, respectively. These four targets are re- ing wire-electrode cutting and liquid nitrogen soaking. Further micro-
ferred to hereafter as Ti0.46Al0.45Si0.09, Ti0.58Al0.35Si0.07, Ti0.64Al0.3Si0.06 structure characterization was performed by transmission electron
and Ti0.7Al0.25Si0.05. In the following, Sample1, Sample2, Sample3, microscope (TEM JEM-2100). The hardness of the coatings was
Fig. 3. Chemical compositions of Ti, Al, Si and N in the coatings as a function of the Ti content in Tix(Al5/6Si1/6)1 − x target.
Fig. 5. Hardness of TiAlSiN coatings as a function of the displacement into surface with increased Ti content: (a) 29 at.% (b) 42 at.% (c) 57 at.% (d) 63 at.% (e) 65 at.%.
content and peaks at 66 GPa with 63 at.% of Ti. Beyond that the hardness
decreases to 56 GPa at 65 at.% of Ti. On the same figure, the average grain
size calculated from the Scherrer formula using FWHM is plotted as a
function of Ti content, which shows the opposite dependence on Ti con-
tent. The differences between Samples 4 and 5 are well within experi-
mental error, thus the two samples can be combined. Therefore, it can
be concluded that, when the grain size drops to the minimum, the hard-
ness reaches the maximum. Thus, in agreement with literature [20], the
increase in hardness may be attributed in part at least to the refinement
of grain size. The enhanced hardness of Samples 4 and 5 might in part
also be attributed to its more pronounced (111) orientation compared
to the other three samples, with the lower Schmid factor of the TiN
(111) plane compared to (200) planes for the face-centered cubic ni-
tride coatings [21] (see Fig. 4). This is also consistent with the geomet-
rical strengthening mechanism described in Qi et al. [22].
Coincidentally, when the hardness reaches a maximum, the Si con-
tent is just 7 at.% in TiAlSiN coating, which coincides with the result re-
ported by Vepřek et al. [23]. In that paper, when Si content was 7 at.% in
a TiSiN coating, the hardness reached a maximum. Vepřek et al. claimed
Fig. 6. Grain size and hardness of TiAlSiN coatings with various Ti contents. this super-hardness to be a consequence of the nanostructure and of the
118 Q. Ma et al. / Int. Journal of Refractory Metals and Hard Materials 59 (2016) 114–120
Fig. 7. TEM images and electron diffraction pattern of Ti0.29Al0.59Si0.12N: (a) TEM image (b) HRTEM image and SAED pattern (The light-colored parts pointed by black arrows are
amorphous phase and the dark-colored parts pointed by arrows are crystalline phase.)
large cohesive energy (stability) of the nano-crystalline MnN/a-Si3N4 amorphous phase increases, the increased grain boundary sliding
(M = metal) interface. In the absence of Al, this agreement of the Si con- caused by the more amorphous phase in this microstructure could
tent appears as a coincidental one, but it is really interesting and de- give rise to the decrease of strength and hardness. This deduction in
serves for further research. hardness of TiAlSiN coatings is consistent with the result reported in
The TEM images and selected area diffraction pattern (SADP) of Kim et al. [25].
Sample1 with the lowest Ti content (29 at.%) and the highest Si content The fracture cross-section SEM images of TiAlSiN coatings are shown
(12 at.%) are shown in Fig. 7. It presents a particular microstructure in in Fig. 8. The start of the TiAlSiN coating was marked by a yellow line in
that the amorphous phase (light-colored part) is wrapped in the crys- each figure. As shown in Fig. 8a, when Ti content was 29 at.%, the coating
talline phase (dark-colored part) which is in contrast to the traditional shows some blocky-shaped particles and no obvious columnar struc-
microstructure with the lower Si content of 7 at.% and 8 at.% for TiSiN ture in the cross-section, which may be caused in part by the overmuch
and TiAlSiN coatings, respectively reported by some researchers [1,24]. Si-containing amorphous phase compared with other samples. In
The reason for the low hardness of Sample1 could be explained in part Fig. 8b, the coating with Ti content of 42 at.%, shows some features of co-
by this microstructure. When the content of the Si-containing lumnar structure. The brittle fracture is evident from the separation of
Fig. 8. Cross-section SEM images (×3000) of TiAlSiN coatings with different Ti contents: (a) 29 at.% (b) 42 at.% (c) 57 at.% (d) 63 at.% (e) 65 at.% (The start of the TiAlSiN coating was marked
by a yellow line in each figure.)
Q. Ma et al. / Int. Journal of Refractory Metals and Hard Materials 59 (2016) 114–120 119
Fig. 9. Rockwell indentation images (×100) made with 150 kg load for 15 s in TiAlSiN coatings with increased Ti content: (a) 29 at.% (b) 42 at.% (c) 57 at.% (d) 63 at.% (e) 65 at.%.
some blocky forms from the fracture surface and the stratification be- maximum value of 65 at.%, as shown in Fig. 8e, there are more coarse
tween TiAlSiN coating and the gradient interlayers. For Fig. 8c, the grains particles seen in the cross-section but the coating is still the dense mor-
inside the TiAlSiN coating with 57 at.% Ti appear to grow first along a di- phology which implied that this coating is still nanocrystalline.
rection inclined by about 30–40° relative to the grains of the underlying The Rockwell indentation images observed by optics microscope are
TiAlN layer. This signature of the grain growth direction gradually disap- shown in Fig. 9. There are six classes (HF1-HF6) classified in the inden-
pears and halfway through the TiAlSiN layer changes to a smooth and tations to qualitatively evaluate the adhesion of coatings to substrates,
dense structure. There, the brittle fracture traces are less visible, with according to the adhesion measurement techniques reported by Gerth
only some sharp fracture lines remain. The coating with a Ti content et al. [26]. Some other researchers [21,27] also measured adhesion by
of 63 at.% (Fig. 8d) exhibits a lamellar and dense structure instead of co- this standard. In TiAlSiN coatings with 29, 42 or 57 at.% content of Ti,
lumnar structure in the cross-section. The fracture plane is smooth and there are some cracks and a little detachment around the indentations
no obvious fracture traces can be seen, which is consistent with the pre- in the coatings shown as Fig. 9a–c. The adhesion strength can thus be
vious finding that TiAlSiN coating was a nanocomposite (nc-TiAlN/a- classified as HF3. When Ti content increases to 63 or 65 at.%, there are
Si3N4) structure, which was composed of amorphous Si3N4 and nano- only a few cracks and detachments of the coating, even no detachments
crystalline TiAlN grains [13]. When the Ti content increases to the in Sample4, as shown in Fig. 9d–e, indicating very good adhesion
strength. Thus, that coating can be classified as HF2. The changing of ad-
hesion strength of TiAlSiN coatings with Ti content might be explained
Table 1
The thickness of Cr/CrN/TiAlN and TiAlSiN.
Table 2
Thickness (μm) Details of sputtering parameters.
Coatings
Sample1 Sample2 Sample3 Sample4 Sample5
Target-substrate DC Operating Target
Temperature
TiAlSiN 2.0 2.2 2.1 2.0 2.3 distance bias PN2/PAr pressure current
TiAlN 0.8 0.6 0.5 0.8 0.5
(cm) (V) (°C) (Pa) (A)
CrN 0.8 0.8 0.7 0.7 0.5
Cr 0.3 0.3 0.3 0.2 0.2 8 −100 150 1/3 0.8 2
120 Q. Ma et al. / Int. Journal of Refractory Metals and Hard Materials 59 (2016) 114–120
Table 3
Average concentration and standard deviation of each element.
Ti 15.24 ± 0.15 21.83 ± 0.49 30.67 ± 0.28 33.72 ± 0.40 35.63 ± 0.10
Al 30.73 ± 0.30 24.61 ± 0.46 18.40 ± 0.29 16.24 ± 0.21 15.68 ± 0.08
Si 6.10 ± 0.06 5.24 ± 0.08 4.17 ± 0.07 3.55 ± 0.04 3.34 ± 0.03
N 47.93 ± 0.26 48.32 ± 0.99 46.76 ± 0.07 46.49 ± 0.77 45.35 ± 0.29
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