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Cadmium Telluride Thin Films: Growth From Solution and Characteristics
Cadmium Telluride Thin Films: Growth From Solution and Characteristics
Received 1 March 2000; received in revised form 13 December 2000; accepted 25 July 2001
Abstract
An extremely simple and cheap method for the deposition of cadmium telluride thin films is presented. Good quality deposits
were obtained on ground glass at 758C, pH 10"0.3 with a deposition time of 90 min. Light grey-coloured and uniform CdTe
layers, approximately 0.3 mm thick, were obtained with this process under the above deposition conditions. Compositional analysis
showed CdTe films to be Cd-rich. The as-deposited layers are crystalline with a mixture of hexagonal and cubic phase structures.
Microscopic observations showed some overgrowth on the spherical-type crystallites grown. Baking increases the coarseness of
the material compared to the as-deposited film. Optical studies revealed a high absorption coefficient (104 cmy1 ) with a direct
type of transition. The bandgap is estimated as 1.45 eV. The films show n-type conduction. 䊚 2001 Elsevier Science B.V. All
rights reserved.
Keywords: Cadmium telluride; Chemical growth process; n-type conduction; Hexagonal and Cubic phase structures
0040-6090/01/$ - see front matter 䊚 2001 Elsevier Science B.V. All rights reserved.
PII: S 0 0 4 0 - 6 0 9 0 Ž 0 1 . 0 1 4 8 0 - 8
36 V.B. Patil et al. / Thin Solid Films 401 (2001) 35–38
Fig. 1. X-Ray diffractogram of a typical CdTe thin film: (a) as-deposited; and (b) baked at 1008C.
was obtained by reflux action of 4 g of metallic tellurium Cd2q and Na-tellurosulfate as basic source materials.
powder and anhydrous sodium sulfate (90 g) in distilled The as-prepared CdTe films were smooth, adhered tight-
water at 1008C for 24 h. The resulting concentration of ly to the substrates, and were non-reflecting and light
tellurium was 0.33 M w6x. The deposition temperature grey in colour. Compositional analysis of a good-quality
and time were selected as 75"28C and 95 min, respec- CdTe sample baked at 1008C was carried out by both
tively. A good-quality sample was analysed for its chemical analysis (spectrophotometry) and atomic
chemical constituents using the analytical spectropho- absorption spectroscopy. Both analyses showed the CdTe
tometry and atomic absorption spectrometry. The crystal samples to be rich in Cd. Typically, the Cd and Te
structure was determined by X-ray diffraction analysis content in CdTe was 46.05 and 44.2%, respectively. The
within a 2u range from 10 to 808. The surface mor- crystal structure of the same sample was revealed by X-
phology was examined with a Leica Cambridge scanning ray diffraction with CuKa radiation (1.5406 A). ˚ The
electron microscope. The films were also scanned for range of 2u angles was from 10 to 808. Fig. 1 is a
optical absorption measurements in the 500–950-nm typical X-ray diffractogram of such a sample. The
wavelength range. The DC electrical conductivity was analysis showed that CdTe is a mixture of hexagonal-
measured in the 300–500-K temperature range. (dominant) and cubic-phase structures. Additionally,
peaks corresponding to elemental Te were also detected
3. Results and discussion for a non-baked sample, whereas a signal corresponding
to TeO2 was also observed for a baked sample. The
Cadmium telluride thin films were grown under opti- presence of TeO2 can be ascribed to the oxidation of
mum conditions in an alkaline medium consisting of elemental Te during baking w6,7x. The lattice parameters
V.B. Patil et al. / Thin Solid Films 401 (2001) 35–38 37
Table 1
XRD data for a CdTe film
Peak ˚
d (A) Planes IyImax
number
Observed ASTM CdTe TeO2 Observed ASTM
calculated match well with the JCPD values (Table 1). The electrical conductivity of an as-deposited CdTe
The surface morphology (Fig. 2) showed the presence film was measured in the 300–500-K temperature range.
of spherical and well-connected grains with a large The room-temperature electrical resistivity of this sam-
intergranular space. Some sort of overgrowth is also ple is of the order of 106 V cm. Thermopower meas-
observed for as-deposited films. For a baked thin film, urements showed n-type conduction for CdTe.
this picture is clearer; however, some cracks seem to We conclude that n-CdTe films, reproducible both in
have developed, with a reduced intergranular spacing electrical and optical properties, can easily be grown
after baking w6x. In order to check the suitability of the with almost negligible consumption of electrical energy
CdTe material for solar cell applications, the optical and with basic starting materials. The novelty of this
constants, namely the absorption coefficient (a), energy process is the avoidance of clumsy, tedious and time-
gap (Eg) and the type of optical transitions, were consuming processes. The deposition temperature, time
determined by examining the optical absorption spec- and speed of substrate rotation play a vital role in
trum in the range from 500 to 950 nm at room determining the quality of the samples. The deposits are
temperature. Fig. 3 shows the determination of the light grey in colour with a room-temperature electrical
optical gap from the (ahn)2 vs. (hn) variation. A resistivity of 106 V cm. X-Ray diffractogram studies
bandgap of 1.45 eV has been estimated from these showed that both hexagonal- and cubic-phase structures
measurements for the as-deposited CdTe sample. These of CdTe were present, whereas chemical analyses dem-
results are in good agreement with those already reported onstrated CdTe rich in Cd. Scanning electron microscopy
w8,9x. observations revealed the crystalline nature of the mate-
rial. The material exhibits a high optical absorption with
a band-to-band type of transition. The estimated energy
gap is 1.45 eV.
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