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  • Cmos Process Flow 1

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    barnwaldivyanshu7
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    The document describes the key steps in fabricating CMOS integrated circuits using different process flows. It discusses wafer preparation, oxidation, lithography, etching, and metallization. Specifically, it covers growing silicon crystals with controlled doping, oxidizing silicon to form insulating silicon dioxide layers, using photolithography to pattern circuits, and constructing CMOS inverters using N-well, P-well, and twin-tub processes. The fabrication process involves carefully controlling multiple steps to build up functional transistors and logic gates on a silicon wafer.

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    The document describes the key steps in fabricating CMOS integrated circuits using different process flows. It discusses wafer preparation, oxidation, lithography, etching, and metallization. Specifically, it covers growing silicon crystals with controlled doping, oxidizing silicon to form insulating silicon dioxide layers, using photolithography to pattern circuits, and constructing CMOS inverters using N-well, P-well, and twin-tub processes. The fabrication process involves carefully controlling multiple steps to build up functional transistors and logic gates on a silicon wafer.

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    © All Rights Reserved
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    Download as pdf or txt
    6 views41 pages

    Cmos Process Flow 1

    Uploaded by

    barnwaldivyanshu7
    The document describes the key steps in fabricating CMOS integrated circuits using different process flows. It discusses wafer preparation, oxidation, lithography, etching, and metallization. Specifically, it covers growing silicon crystals with controlled doping, oxidizing silicon to form insulating silicon dioxide layers, using photolithography to pattern circuits, and constructing CMOS inverters using N-well, P-well, and twin-tub processes. The fabrication process involves carefully controlling multiple steps to build up functional transistors and logic gates on a silicon wafer.

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    of 41

    Fabrication Processes

    Wafer Processing & Preparation


    Oxidation
    Epitaxy
    Diffusion
    Ion Implantation
    Lithography
    Etching
    Metallization
    Darshana Sankhe, DJSCE
    CMOS Process Flow for N-well, P-well & Twin Tub
    Fabrication Steps :
     Refining of Si
     Crystal growth and wafer preparation
     Epitaxy
     Oxidation
     Diffusion
     Ion Implantation
     Lithography
     Etching
     Metallization

    Darshana Sankhe, DJSCE


    Darshana Sankhe, DJSCE
    Crystal growth :
     Growing of single crystal Si from fine granules of Si (EGS) under
    controlled doping of impurities at a temperature ≥1000°c

     Impurities added to Si are


     P type Si – Boron (B2H6 i.e. diborane )
     N type Si – phosphorous (PH3 i.e. phosphene)
     Doping concentration – 1015 to16 /cm3

     CZ Process – Subsystems
     Furnace
     Crystal pulling system
     µp based Control system
     Temperature, speed of rotation, pull rate, flow rate, crystal
    Darshana Sankhe, DJSCE
    diamensions, gas source and exhaust system….
    Crystal growth : CZ Process (Czochralski)

    Darshana Sankhe, DJSCE


    Oxidation : LOCOS – Reaction of Si with O2 to form SiO2
     Surface protection
     Dielectric for MOS structure (thin SiO2)
     Mask against diffusion / ion implant
     Device isolation (thick SiO2)
     Isolation for multilevel metallization

    Darshana Sankhe, DJSCE


    Oxidation :

     Grow SiO2 on top of Si wafer at 900 – 1200 C with H2O or O2


    in oxidation furnace
    SiO2

    p substrate

    Darshana Sankhe, DJSCE


    Oxidation:

    Darshana Sankhe, DJSCE


    Photolithography :Process of transferring
    the pattern from mask to substrate

    Darshana Sankhe, DJSCE


    Darshana Sankhe, DJSCE
    Diffusion Profile:

    Darshana Sankhe, DJSCE


    Diffusion Profile:

    Darshana Sankhe, DJSCE


    Ion Implantation :

    Darshana Sankhe, DJSCE


    Darshana Sankhe, DJSCE
    CMOS Inverter Fabrication :
     N-well process
     P-well process
     Twin tub process

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using P-well Process:

    N+ implant/diffusion

    N+ mask

    P+ N+ P

    N-type substrate

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using N-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using P-well Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using P-well Process:

    Darshana Sankhe, DJSCE


    CMOS P-well INVERTER:

    Darshana Sankhe, DJSCE


    CMOS Fabrication Mask :
    1. Define window in oxide region/ well mask

    2. Pattern poly mask

    3. Diffusion mask(n-diffusion & p-diffusion)

    4. Contact cut mask

    5. Metal layer pattern

    6. Over glass layer mask for bonding pads


    Darshana Sankhe, DJSCE
    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    CMOS Inverter using Twin-Tub Process:

    Darshana Sankhe, DJSCE


    Thank You

    Darshana Sankhe, DJSCE

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