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Highlighting a study on oxidation-resistant titanium

carbide MXene films by a group of researchers led As featured in:


by Dr Chi Won Ahn and Dr Yonghee Lee from National
Nanofab Center, and Prof. Yury Gogotsi from Drexel
University.

Oxidation-resistant titanium carbide MXene films.

Oxidation-resistant titanium carbide MXene films are


demonstrated. After hydrogen annealing, the stability
against oxidation of the MXene film under harsh
conditions (either underwater or under 100% RH at 70°C)
is dramatically improved. Besides, large recovery in the
electrical conductivity of oxidized Ti3C2 MXene films is
observed after hydrogen annealing. We also demonstrate
an electric heater made of oxidation-resistant MXene film, See Yonghee Lee,
Chi Won Ahn et al.,
which was capable of stable operation in air under highly
J. Mater. Chem. A, 2020, 8, 573.
oxidizing conditions (70°C, 100% RH).

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Oxidation-resistant titanium carbide MXene films†


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Cite this: J. Mater. Chem. A, 2020, 8, Yonghee Lee, ‡*a Seon Joon Kim,‡§bc Yong-Jae Kim,d Younghwan Lim,e
573 Yoonjeong Chae,a Byeong-Joo Lee,a Young-Tae Kim,f Hee Han,a Yury Gogotsi b

and Chi Won Ahn *a

Two-dimensional transition metal carbides (MXenes) have attracted much attention due to their excellent
electrical conductivity and outstanding performances in energy storage, telecommunication, and sensing
applications. It is known that MXene flakes are readily oxidized in either humid air or aqueous
environments. While the chemical instability of MXenes may limit their use in applications involving
ambient environments and long-term operation, oxidation behaviour of MXene films has not been
addressed. In this work, we demonstrate a hydrogen annealing method to increase the oxidation stability
of Ti3C2 MXene in two different aspects: (1) dramatic improvement in the oxidation stability of pristine
MXene films against harsh conditions (100% relative humidity, 70  C), and (2) large recovery in the
electrical conductivity of previously oxidized Ti3C2 MXene films. We also demonstrate an electric-field-
induced heater capable of stable operation under highly oxidizing conditions, based on the oxidation-
Received 1st July 2019
Accepted 14th November 2019
resistant MXene film. A total loss of heat generation ability was observed for the as-prepared MXene film,
while the hydrogen-annealed one maintained its bright infrared radiation, under the highly oxidizing
DOI: 10.1039/c9ta07036b
conditions. This work offers a solution to industrial applications of unprotected MXene films, securing
rsc.li/materials-a their stable and long-term operation in humid conditions.

to days, leading to diminished electrical properties through the


Introduction formation of titanium dioxide (TiO2)12,13 and limiting their use
Two-dimensional (2D) metal carbides and nitrides, known as in applications involving exposure to an oxygen-containing
MXenes, continue to be investigated in energy storage,1–3 aqueous environment and long-term operation.
sensing,4,5 plasmonic,6,7 and catalytic applications8,9 because of In recent years, researchers have investigated the oxidation
their unique properties, which include excellent electro- stability of MXenes, including the factors governing oxidation
chemical activity, extensive surface functionality, high conduc- of MXenes in solution, and have proposed methods to lower the
tivity, and good processability in aqueous dispersions.10,11 oxidation rate.12–15 Zhang et al., demonstrated an improved
Single-layer MXene akes are readily oxidized in either humid chemical stability of MXene by developing a method for storing
air or aqueous environments on a time scale from several hours Ti3C2 MXene colloidal solutions in Ar-lled bottles at low
temperatures, and they also found that the degradation of
a
MXene begins at the edges and that small akes are less stable
Global Nanotechnology Development Team, National Nano Fab Center (NNFC),
Daejeon 34141, South Korea. E-mail: cwahn@nnfc.re.kr; yhlee@nnfc.re.kr
than larger ones.13 In addition, if one strictly controls the
b
Department of Materials Science and Engineering, A.J. Drexel Nanomaterials storage conditions of MXene such as the amount of water
Institute, Drexel University, Philadelphia, PA 19104, USA molecules and the temperature, the oxidation rate of the
c
Wearable Platform Materials Technology Center, Korea Advanced Institute of Science Ti3C2Tx akes can be slowed down.15 However, these previous
and Technology (KAIST), Daejeon 34141, South Korea studies are limited to controlling the storage conditions. Very
d
Department of Chemical and Biomolecular Engineering (BK-21 PLUS), Korea recently, some papers were published presenting approaches to
Advanced Institute of Science and Technology (KAIST), 291, Daehak-ro, Yuseong-gu,
suppress the oxidation of colloidal MXene nanosheets by
Daejeon 34141, Republic of Korea
e
Department of Materials Science and Engineering, Korea Advanced Institute of Science
introducing additives.16–18 Along with the stability of MXene
and Technology (KAIST), 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of sheets in water, the stability of thin MXene lms that are typi-
Korea cally used in applications such as transparent conducting
f
Graduate School of Green Energy Technology, Chungnam National University, 99 lms,19,20 antennas,21,22 heaters,23 electromagnetic shielding,24,25
Daehak-ro, Yuseong-gu, Daejeon 305-764, Republic of Korea and sensors,4,26 needs to be studied. A. Lipatov et al., demon-
† Electronic supplementary information (ESI) available. See DOI:
strated that Ti3C2Tx MXene lm-based eld-effect transistor
10.1039/c9ta07036b
suffered from environmental degradation in humid air during
‡ These authors contributed equally to this work.
§ Present address: Materials Architecturing Research Center, Korea Institute of
operation.27 Thus, the development of MXene lms with high
Science and Technology (KIST), Seoul 02792, Republic of Korea.

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chemical stability in humid air as well as at high temperature is Raman spectra of MXene lms annealed at high temperatures,
strongly desired. showing that the evolution of titanium oxides is negligible
In this study, we demonstrate a hydrogen annealing method (Fig. S2†).
to increase the oxidation stability of MXenes lms. Oxidation To investigate the evolution of surface morphology of MXene
resistance of pristine MXene lms increased, and the recovery lm aer hydrogen annealing, we performed SEM (scanning
of the electrical characteristics of the oxidized MXene lms was electron microscopy) analysis, as shown in Fig. 1c. In the as-
achieved. Sheet resistance, representing a typical electrical prepared sample, the MXene akes are well dispersed in the
characteristic of a lm, can be recovered for the oxidized Ti3C2 lm, with distinct ake boundaries. On the other hand, the
MXene lms through the hydrogen annealing. Further, the boundaries of the MXene akes are more indistinct aer
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stability against oxidation of the MXene lm under harsh hydrogen annealing, implying that the MXene akes formed
conditions (100% relative humidity (RH), 70  C) was dramati- a tightly packed network via the partial sintering of akes at
cally improved by hydrogen annealing. We applied the annealed high temperatures. It was turned out by HRTEM (high resolu-
MXene lms to heaters to show their stable and long-term tion transmission electron microscopy) that the partial sinter-
operation in humid and high-temperature conditions. Very ing occurred in MXene akes in the hydrogen-annealed sample,
recently, people started to study Ti3C2 MXene-based heater due while a periodic atomic arrangement was shown in the as-
to the excellent electrical characteristics as well as good thermal prepared sample (Fig. 1d, e and S3†). Contact angle measure-
stability of Ti3C2 MXenes.28,29 Heaters can be used in car seats ments further support the tight packing of akes aer hydrogen
and smart textiles, as well as for de-icing of windshields. annealing. The as-prepared MXene lms showed a contact
angle of 44 immediately aer placement of the water droplet;
Results and discussion however, the contact angle decreased to 10 aer 10 s, implying
that the water droplet permeated through the loosely stacked
Ti3C2 MXene was obtained by etching Ti3AlC2 MAX powders Ti3C2 MXene layers (Fig. 1f and S4†). However, for the hydrogen-
with LiF/HCl as the etchant, as described in previous annealed lm, the contact angle maintained its initial value
reports.15,30 Ti3C2 MXene lms were subsequently prepared on (42 ) for more than 1 min, demonstrating resistance to water
SiO2/Si wafer substrates via spin-coating, where the thickness of permeation.
the lms was approximately 60 nm. Films of the same thickness Hydrogen annealing also changed the surface functional
were used throughout the entire study. Hydrogen annealing was groups of the MXene, as investigated using O 1s X-ray photo-
performed at a temperature ranging from 300  C to 900  C for electron spectroscopy (XPS). As shown in the peak deconvolu-
30 min in a vacuum chamber with hydrogen gas owing tion analyses in Fig. S5,† aer hydrogen annealing, the relative
through the chamber. number of –OH terminations on the surface decreased, whereas
Fig. 1a shows the X-ray diffraction (XRD) patterns of Ti3C2 the number of –O terminations increased, accompanied by
lms annealed under hydrogen at 300  C, 500  C, and 900  C for a decrease in the amount of Ti–H2O species. The trans-
30 min. The main peak which is corresponding to the (002) formation of surface functional groups can be expressed as35
plane of the stacked MXene lm was found to shi to higher
angles as the annealing temperature was increased as presented Ti3C2(OH)wFx / Ti3C2OyFx + aH2O (1)
in Fig. 1b. The interlayer spacing of the as-prepared MXene lm
was measured as 12.4 Å (corresponding to 8.8 ), which was In addition, the ratio between –F and –OH species decreased
reduced to 10.4 Å at 300  C, 10.2 Å at 500  C, and 10.1 Å at from 0.31 to 0.06, as shown in Fig. S5c.† The Ti3C2 MXenes lose
900  C, as all water molecules between the akes were gradually –F terminations with increasing annealing temperature,
volatilized (Fig. 1b),31 and functional groups were partially resulting in the formation of Ti3C2Ox, as expressed in the
removed.32 These results are consistent with previous reports equation
that internal water molecules are sufficiently removed from
Ti3C2OyFx / Ti3C2Oy + bF2 (2)
Ti3C2 MXene lms aer thermal annealing at temperatures
greater than 300  C.33 Surely, it is expected that such a decrease The details of elemental analysis by XPS for as-prepared and
in interlayer spacing leads to improved electrical junctions and H2-annealed in Ti, O, C, and F regions are summarized in Table
a lower contact resistance between MXene akes. In the S2.†36
previous studies, it was found that structural phase transition To study the oxidation stability of hydrogen-annealed MXene
from Ti3C2 to cubic TiC may occur at annealing temperatures lms, we measured the changes in the sheet resistance over
greater than 900  C.34 In our study, however, no such phase time of MXene lms annealed under various conditions and
transition to cubic carbides was observed in our experiments, subjected to harsh oxidizing conditions of 70  C and 100% RH.
even in the case of annealing at 900  C, which might be For the as-prepared Ti3C2 MXene lm, the relative sheet resis-
attributed to that the reaction time was insufficient (30 min) for tance (R/R0) increased by 162.7 times in 8.5 h and by 105 times
crystalline phase transitions to occur. Phase transitions were in 13 h; it was measured as “out of range” aer 1 day of
not observed even aer repeated annealing at 900  C for 30 min oxidation under the harsh conditions (Fig. 2a). The XRD
(Fig. S1†), indicating that the oxidation stability of the MXene patterns in Fig. 2b show that the as-prepared Ti3C2 MXenes were
lms aer the treatment does not originate from other titanium transformed into titanium dioxides (a mixture of rutile and
carbide phases. Also, no obvious difference was observed in the

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Fig. 1 (a) XRD patterns and (b) the interlayer spacing of the (002) planes of the as-prepared sample and the annealed samples (300  C, 500  C,
and 900  C). (c) SEM images of as-prepared and hydrogen-annealed (900  C) samples. (d) HRTEM images of hydrogen-annealed (900  C)
sample (inset: the corresponding diffraction patterns), and (e) the corresponding intensity profile of hydrogen annealed MXene layers (sintered,
and non-sintered part). (f) Results of contact angle measurements for as-prepared and hydrogen-annealed (900  C) samples.

anatase phases) aer 1 day of harsh oxidation. The formation of internal regions were clearly distorted compared with their
oxides was also clearly observed in the XPS spectra (Fig. S6†). By pristine state (Fig. 2e and f). However, the inner structure of the
contrast, the sheet resistance of lms annealed under hydrogen hydrogen-annealed lms did not change aer harsh oxidation,
at 900  C barely increased aer harsh oxidation; specically the demonstrating their outstanding stability (Fig. 2g and h). XPS
R/R0 was only 1.9 even aer 2 days of oxidation, which is analysis results also show that the inner Ti3C2 layers remained
a surprising result. Also, crystalline phase transformations were intact in the hydrogen-annealed lms, although a very thin layer
not detected in the XRD pattern. Thus, the hydrogen annealing of TiO2 (approximately 5 nm thick) was detected at the outer-
at 900  C imparted dramatic oxidation resistance to the Ti3C2 most Ti3C2 MXene layer (Fig. S8†).36
MXene lm, which is known to be very vulnerable to oxidation The oxidation stability of lms annealed under hydrogen at
in its pristine state.12–14 The annealed Ti3C2 MXene lms lower temperatures was also studied. The results show that
exhibited improved oxidation stability even in water; the sheet lms annealed at 300  C exhibited a 6.3  104-fold increase in
resistance of the lm was almost unchanged aer the lm had R/R0 aer 13 h of oxidation, which is similar to the R/R0 of the
been immersed in water for 1 day (Fig. S7†). as-prepared lms not subjected to the hydrogen treatment.
SEM images of the top surface were taken to observe the Even aer a longer annealing time of 3 h (at 300  C) to suffi-
change in morphology aer harsh oxidation. As shown in ciently remove the internal moisture,31 the oxidation stability
Fig. 2c, the surface of the hydrogen-pretreated lms aer was not improved despite the similarity of the interlayer spacing
oxidation was very smooth and lacked any notable features, to that of the lm annealed at 900  C (Fig. S9†). Because the
preserving the original texture. However, as shown in Fig. 2d, oxidation of Ti3C2 MXene into titanium dioxides typically
the as-prepared lm aer oxidation exhibits a very rough requires water as the oxygen source,13,15 this result indicates that
surface, with porous features evident in the magnied image. water molecules can re-penetrate into the interlayer gaps of the
These results show that the lm network was broken and that lms annealed at 300  C. Thus, the reduction of hydroxyl
the majority of the surface was transformed into titanium surface functional groups, which have a high affinity for water,
dioxides. SEM images of cross-sections prepared using and partial sintering at high temperatures (e.g., 900  C) are
a focused ion beam (FIB) also show a substantial difference required to impart oxidation resistance to the Ti3C2 MXene
between the as-prepared lms and the hydrogen-annealed lms. Changes in the surface functional groups might be also
lms. When the as-prepared lms were oxidized, their responsible for the improved oxidation stability. Fu et al., who

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Fig. 2 (a) Time evolution of the sheet resistances of Ti3C2 MXene thin films subjected to oxidation stability tests in 100% relative humidity and at
70  C, both before and after the films were annealed under hydrogen. (b) XRD patterns of an as-prepared sample and a hydrogen-annealed
sample (900  C) before and after oxidation for 1 day. SEM images of (c) a hydrogen-annealed and (d) an as-prepared sample after the sample was
kept at 70  C and 100% RH for 1 day. Cross-sectional SEM images of the as-prepared sample (e) before and (f) after oxidation and those of
a hydrogen-annealed sample (900  C) (g) before and (h) after oxidation. Gold layers are deposited on top of MXene layers to obtain better cross-
sectional images.

investigated thermodynamic stabilization of Ti3C2 MXenes with To study the inuence of hydrogen post-annealing on the
various functional terminations, reported that oxygen- recovery of the electrical characteristics of the Ti3C2 MXene
terminated Ti3C2 MXene (Ti3C2O2) exhibited greater thermo- lms, the lms were rst oxidized to the desired extent by
dynamic stability than hydroxyl- and uorine-terminated exposure to a humid environment, as described in a previous
MXene because the oxygen groups hindered the deformation study.15 The oxidation reaction caused by water is described as13
of the Ti–C structure, whereas the other terminating species
resulted in bond instability modes.37 Ti3C2O2 + 4H2O / 3TiO2 + 2C + 4H2 (3)

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The sheet resistance of the oxidized lms Rox increased to MXene lms aer they were post-annealed in a hydrogen
three to ve times the initial sheet resistance R0 (i.e., 3 # Rox/R0 atmosphere at various temperatures. The results show that the
# 5), presumably because of the degradation of the Ti3C2 sheet resistance recovered upon hydrogen post-annealing,
MXene and the formation of titanium dioxides. The oxidized where the degree of sheet-resistance recovery increased with
lms were subsequently placed in a high-vacuum chamber and increasing annealing temperature. The value of (Rox  Rre)/(Rox
annealed at temperatures ranging from 100  C to 900  C under  R0) (Rre is the recovered sheet resistance aer reduction),
owing hydrogen gas. Fig. 3a shows the sheet resistance of the which represents the degree of recovery (Rre/R0) versus the
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Fig. 3 (a) Changes in the sheet resistances of Ti3C2 MXene thin films upon hydrogen post-annealing at various temperatures. (b) The degree of
recovery (Rox  Rre) versus the degree of oxidation (Rox  R0) of the sheet resistances with respect to the annealing temperature. (c) Changes in
sheet resistance upon hydrogen post-annealing, for several MXene films with various degrees of oxidation. (d) The degree of reduction (Rre) as
a function of the degree of oxidation (Rox/R0) for two H2 post-annealing temperatures (500  C and 900  C). SEM images of (e) the oxidized in the
ambient condition for 5 day and (f) the hydrogen post-annealed thin films (insets: magnified views of the corresponding images). Component
peak-fitting for the Ti 2p XPS spectra of the (g) oxidized and (h) hydrogen post-annealed Ti3C2 MXene.

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degree of oxidation (Rox/R0), approaches 1 for lms annealed at elimination of such TiO2 nanoparticles can be especially
900  C, indicating that the sheet resistance was fully recovered important for MXene lms, as TiO2 nanoparticles tend to form
(Fig. 3a and b). By contrast, increasing the annealing time from along the ake edge sites during oxidation.13 In conductive
30 min to 60 min reduced the degree of recovery of the sheet lms composed of 2D akes, inter-ake electrical conductivity
resistance (Fig. S10†). (edge to edge electron transfer) plays an important role in
To determine whether hydrogen post-annealing could lead determining the total electrical conductivity of the lm.
to recovery of the electrical properties of severely oxidized Therefore, eliminating the non-conductive TiO2 particles at the
MXene lms, we varied the degree of oxidation by controlling edge of the lm is critical in restoring the electrical conductivity
the air exposure time at 70  C prior to hydrogen post-annealing. of the entire lm. Furthermore, hydrogen gas produces surface
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As shown in Fig. 3c, the sheet resistances of oxidized lms (Rox/ oxygen vacancies, and the oxygen vacancies create two hydroxyl
R0 ¼ 3.19, 4.68, 6.74, 29.04, 109.96) were reduced (to Rre/R0 ¼ groups by reacting with neighboring water molecules, resulting
0.93, 1.24, 1.66, 3.00, 4.37, respectively) aer hydrogen post- in a decrease in the water content of the lm.40
annealing. The changes in the sheet resistances of the lms To demonstrate the outstanding electrical properties of the
are detailed in Table S1.† The Rre value approached 1 for the hydrogen-annealed MXene lms, we fabricated Ti3C2 MXene-
samples with a low degree of oxidation. We speculate that, in based heaters, which generate heat through joule heating,
the early stage of annealing, the electrical characteristics were expressed as41
partially recovered as water and gas molecules that had initially
adhered to the surface of the MXene lm from the ambient P ¼ VI ¼ I2R (6)
atmosphere were volatilized from the surface.38 The value of Rre
decreased for the samples with a high degree of oxidation, Potentials from 10 to 25 V were applied to the MXene lms,
implying that a substantial amount of Ti3C2 MXene akes were and the temperature was measured and recorded as a function
transformed into titanium dioxides (Fig. 3c and S11†). of time. Fig. 4a shows the heating properties of as-prepared
Fig. 3e and f shows SEM images of an oxidized Ti3C2 MXene Ti3C2 MXene lms, where higher applied voltages are clearly
lm (Rox/R0 z 5.0) before and aer hydrogen post-annealing at observed to result in higher temperatures; the temperature
900  C, respectively. The oxidized lm exhibits a large number reached a maximum of 183.3  C when 25 V was applied. For
of TiO2 particles on its surface, whereas the surface of the comparison, the heating properties of oxidized MXene lms
reduced lm is surprisingly smooth, indicating that nearly all of were also measured; the results are shown in Fig. 4b. The
the TiO2 particles were removed aer hydrogen post-annealing. maximum temperature attained at 25 V substantially decreased
We used XPS to further characterize the chemical state of the to 108.8  C because of the increased sheet resistance of the
Ti3C2 MXene surface. The Ti 2p regions in the spectra of the oxidized lm (279.2 U sq1) compared with that of the as-
oxidized Ti3C2 MXene akes and their hydrogen-annealed prepared lm (71.4 U sq1). Aer the oxidized lm was post-
counterparts were t by components representing moieties annealed under hydrogen at 900  C, the maximum tempera-
such as TiC, Ti–X, TixOy, and TiO2 (Fig. 3g and h). The results ture of the heater was also restored to 158.9  C at 25 V because
clearly show that the fraction of peak from the oxidized Ti3C2 the sheet resistance was reduced to 105.9 U sq1 (Fig. 4c). The
MXene, as identied by the TiO2 components at 458.6 eV and summarized results (Fig. 4d) clearly show that, although
464.2 eV, was reduced from 24.4% to 13.0% aer hydrogen oxidation of the MXene lms greatly degrades their heating
annealing. To investigate the inuence of hydrogen gas on the properties, the hydrogen post-annealing treatment restores the
recovery of the sheet resistance during thermal annealing, we original properties to a large extent.
carried out a control experiment in which Ti3C2 MXene was The recovery of the heating properties of MXene lms that
annealed at a high temperature in the absence of hydrogen (Ar had been oxidized to different degrees was also investigated
100%). As shown in Fig. S12,† the sheet resistance recovered to (Fig. 4e and f). For more severely oxidized MXene lms, the
a great extent for lms annealed under owing hydrogen (Rox highest temperature was reduced to 53  C aer oxidation but
3.19 to Rre 0.93) compared to owing Ar (Rox 3.04 to Rre 1.53). increased to 162.7  C aer the hydrogen post-annealing treat-
The authors of previous studies have reported that TiO2 nano- ment. At the same time, the sheet resistance recovered from
particles can be reduced at high temperatures under a hydrogen 990.1 U sq1 to 62.5 U sq1 aer hydrogen post-annealing.
atmosphere, as expressed by the following formula.39 Through hydrogen annealing, the sheet resistance of Ti3C2
MXene lm was reduced due to the improved junction charac-
O2 + 2Ti4+ + H2 / VO + 2Ti3+ + H2O (4) teristics, and this change was reected in the heater characteris-
tics. The temperature proles of the heaters based on the as-
VO + H2O + O2 / 2OH (5) prepared Ti3C2 MXene lm and the hydrogen-annealed lms are
shown in Fig. 4g and Table S3.† Because of the improved electrical
(VO: O vacancy) characteristics aer the hydrogen annealing of the lms, higher
Also, it was reported that the reduction of TiO2 can be temperatures were observed in lms, despite a sheet resistance
accelerated in the presence of a carbon layer.40 Therefore, the similar to that of the as-prepared sample. The Ti3C2 MXene-based
greater recovery of the sheet resistance is attributable to the heaters shown in our work are comparable in the driving voltage
effective hydrogen-induced elimination of poorly conductive and the steady state temperature to other nanomaterials-based
TiO2 nanoparticles on the surface. The reduction and heaters such as graphene, and AgNW (Table S4†).

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Fig. 4 Temperature profiles of Ti3C2 MXene-based heaters under different applied voltages, where the heaters were fabricated using (a) as-
prepared, (b) oxidized, and (c) hydrogen-annealed (900  C) Ti3C2 MXene. (d) Temperatures obtained from Ti3C2 MXene heaters represented in
(a–c), as measured at 150 s. (e) Temperatures measured at 150 s under an applied potential of 20 V and the sheet resistances of the samples
represented in (a–c). (f) The temperature measured at 150 s under an applied potential of 20 V and the sheet resistances of the samples with
higher oxidation degrees. (g) The temperature profiles of the as-prepared and the hydrogen-annealed MXene thin films with various sheet
resistances (measured at 150 s). (h) The temperature measured at 25 V and 150 s and (i) infrared images of the MXene-based thin-film heaters
(fabricated using as-prepared and hydrogen-annealed samples) before and after the oxidation stability test (100% RH, 70  C) for 1 day.

The oxidation stability of the hydrogen-annealed MXene high temperatures. Furthermore, aer hydrogen annealing of
lms also played a role in preserving the heating effect. The Ti3C2 MXene lms, the oxidation reaction under humid
sheet resistance of as-prepared MXene lm increased to 2.61  conditions (100% RH, 70  C) was effectively retarded. We also
107 U sq1 when the sample was stored under highly oxidizing demonstrated an electric heater made of oxidation-resistant
conditions (70  C, 100% RH) for 1 day (Fig. 4h). As with the MXene lm, which was capable of stable operation in air
severe change in sheet resistance, a total loss of heat generation under highly oxidizing conditions (70  C, 100% RH). This work
ability (26.1  C) was also observed for the fully oxidized heating provides insight into the oxidation mechanism of Ti3C2 MXene
devices (Fig. 4h and i). However, the oxidation-resistant Ti3C2 lms, offers a protection method and broadens the range of
lm subjected to hydrogen annealing maintained a sheet potential applications of MXenes lms in open air, at high
resistance less than twice its initial value under the same humidity and elevated temperature.
oxidizing conditions, resulting in a maximum temperature of
203.5  C for the heating device, with the device still emitting
bright infrared radiation (Fig. 4h and i). Experimental sections
Preparation and characterization of Ti3C2 MXene lms

Conclusions Ti3C2 MXenes were prepared according to the synthetic method


described in the previous study.15 The aqueous dispersions of
We demonstrated that the sheet resistance of an oxidized Ti3C2 MXenes were spin cast onto plasma-treated Si/SiO2 substrates to
MXene lm can be recovered through hydrogen annealing at form uniform lms. For the oxidation of the MXene lms, the

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degree of oxidation was varied by controlling the air exposure 3 O. Mashtalir, M. R. Lukatskaya, M.-Q. Zhao, M. W. Barsoum
time at 70  C, as described in the previous study.15 For hydrogen and Y. Gogotsi, Adv. Mater., 2015, 27, 3501–3506.
annealing, the lms were annealed at a desired temperature 4 S. J. Kim, H.-J. Koh, C. E. Ren, O. Kwon, K. Maleski, S.-Y. Cho,
(100 to 900  C) in a vacuum chamber through which a 10% B. Anasori, C.-K. Kim, Y.-K. Choi, J. Kim, Y. Gogotsi and
hydrogen gas mixture (Ar 90%) was owing. The temperature H.-T. Jung, ACS Nano, 2018, 12, 986–993.
was increased from RT to 900  C during 10 min. Therefore, the 5 S. Xu, Y. Dall'Agnese, G. Wei, C. Zhang, Y. Gogotsi and
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measurement was performed to determine the sheet resistances 6 K. Chaudhuri, M. Alhabeb, Z. Wang, V. M. Shalaev,
of the lms (AIT, CMT-100 MP). XPS (Thermo Fisher Scientic, Y. Gogotsi and A. Boltasseva, ACS Photonics, 2018, 5, 1115–
Published on 18 November 2019. Downloaded by University of Georgia on 1/2/2020 8:47:05 PM.

K-Alpha), Raman spectroscopy (NOST, FEX), and XRD (Smar- 1122.


tLab, Rigaku) were used to characterize the lm structures. A 7 A. Sarycheva, T. Makaryan, K. Maleski, E. Satheeshkumar,
scanning electron microscope (FEI, Sirion) and transmission A. Melikyan, H. Minassian, M. Yoshimura and Y. Gogotsi,
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the morphological changes in the lms. A contact angle 8 A. D. Handoko, K. D. Fredrickson, B. Anasori, K. W. Convey,
analyzer (Phoenix 300 Plus) was used to measure the contact L. R. Johnson, Y. Gogotsi, A. Vojvodic and Z. W. Seh, ACS
angle of the lms. Appl. Energy Mater., 2018, 1, 173–180.
9 Z. W. Seh, K. D. Fredrickson, B. Anasori, J. Kibsgaard,
Fabrication of MXene-based heating devices A. L. Strickler, M. R. Lukatskaya, Y. Gogotsi, T. F. Jaramillo
and A. Vojvodic, ACS Energy Lett., 2016, 1, 589–594.
To fabricate Ti3C2 MXene-based heating devices, the aqueous
10 M. Naguib, V. N. Mochalin, M. W. Barsoum and Y. Gogotsi,
dispersions of MXene were spin cast onto plasma-treated quartz
Adv. Mater., 2014, 26, 992–1005.
substrates. A tip of Cu tape was used to connect the lms to
11 V. M. Hong Ng, H. Huang, K. Zhou, P. S. Lee, W. Que, J. Z. Xu
a DC power supply. The desired DC voltage (3 V to 25 V) was
and L. B. Kong, J. Mater. Chem. C, 2017, 5, 3039–3068.
applied to the lms with various sheet resistances. An infrared
12 S. Huang and V. N. Mochalin, Inorg. Chem., 2019, 58, 1958–
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1966.
temperature proles of the MXene-based heaters.
13 C. J. Zhang, S. Pinilla, N. McEvoy, C. P. Cullen, B. Anasori,
E. Long, S.-H. Park, A. Seral-Ascaso, A. Shmeliov,
Author contributions D. Krishnan, C. Morant, X. Liu, G. S. Duesberg, Y. Gogotsi
and V. Nicolosi, Chem. Mater., 2017, 29, 4848–4856.
The manuscript was written through contributions of all 14 R. Lot, M. Naguib, D. E. Yilmaz, J. Nanda and A. C. T. van
authors. All authors have given approval to the nal version of Duin, J. Mater. Chem. A, 2018, 6, 12733–12743.
the manuscript. 15 Y. Chae, S. J. Kim, S.-Y. Cho, J. Choi, K. Maleski, B.-J. Lee,
H.-T. Jung, Y. Gogotsi, Y. Lee and C. W. Ahn, Nanoscale,
Conflicts of interest 2019, 11, 8387–8393.
16 V. Natu, J. L. Hart, M. Sokol, H. Chiang, M. L. Taheri and
There are no conicts to declare. M. W. Barsoum, Angew. Chem., Int. Ed., 2019, 58, 12655–
12660.
Acknowledgements 17 C.-W. Wu, B. Unnikrishnan, I. W. P. Chen, S. G. Harroun,
H.-T. Chang and C.-C. Huang, Energy Storage Materials,
The authors acknowledge helpful discussions with Asia Sar- 2019, DOI: 10.1016/j.ensm.2019.09.026.
ycheva and Dr Mykola Seredych (Drexel University). This 18 X. Zhao, A. Vashisth, E. Prehn, W. Sun, S. A. Shah, T. Habib,
research was supported by the National Research Foundation of Y. Chen, Z. Tan, J. L. Lutkenhaus, M. Radovic and
Korea (NRF) funded by the Ministry of Education, Science and M. J. Green, Matter, 2019, 1, 513–526.
Technology (MEST) (NRF-2015K1A4A3047100, NRF- 19 C. Zhang, B. Anasori, A. Seral-Ascaso, S.-H. Park, N. McEvoy,
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