Professional Documents
Culture Documents
PSE Poster Ta-C
PSE Poster Ta-C
Deposition
Jan Klusoň1, Martin Učík1, Mojmír Jílek1, Andreas Lümkemann2, Hamid Bolvardi2, Tibor Cselle2
1 Platit a.s., Šumperk, Czech Republic, 2 Platit AG, Selzach, Switzerland, email: j.kluson@platit.com
t = 2.44±0.09 (4%)
Here we present three different Platit technologies for DLC and ta-C coatings implemented on three
different coating units:
3,0
2,0
1,5
1,0
0,5
Pi211, especially dedicated unit for DLC3 coatings, performs
Thickness [nm]
0,0
0,5
2,0
a-C:H:Si by PECVD and a-C/ta-C by sputtering / PL711 sputter unit DLC2 by PECVD /PL711 DLC3 by SCIL / Pi411 DLC3 by FCA / Pi211
Summary
DLC2 by PL711 DLC3 by Pi411 Acknowledgement and contact
• PECVD coating process • Platit sputtering SCIL technology
Author: Dr. J. Kluson, M. Ucik, M. Jilek, Dr. A. Lümkemann, Dr. T. Cselle
• coating of components with high productivity • coating of tools as the main application
Phone: +41 32 544 62 00
• nanohardness ~ 35GPa • nanohardness up to 50GPa Website: www.platit.com
LinkedIn: https://www.linkedin.com/company/platit-ag