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Important Short Questions and Answers - VLSI Design - CMOS Technology
Important Short Questions and Answers - VLSI Design - CMOS Technology
The threshold voltage VT for a MOS transistor can be defined as the voltage
between the gate and the source terminals below which the drain to source current
effectively drops to zero.
The threshold voltage VT is not a constant with respect to the voltage difference
between the substrate and the source of the MOS transistor. This effect is called
the body effect or substrate bias effect.
b. Linear region
It is also called weak inversion region where the drain current is dependent on the
gate and the drain voltage w. r. to the substrate.
c. Saturation region
Channel is strongly inverted and the drain current flow is ideally independent of
the drain-source voltage (strong-inversion region).
5. Give the expressions for drain current for different modes of operation of
MOS transistor.
b. Linear region
ID = kn [(VGS – VT) VDS – VDS2/2]
c. Saturation region
d. Subthreshold conduction
e. CMOS latchup
(i) an increase in substrate doping levels with a consequent drop in the value of
Rpsubs.
a. p-well process
b. n-well process
c. Twin-tub process
i. wafer preparation
iii. Oxidation
vi. Isolation
vii. Metallization
Epitaxy means arranging atoms in single crystal fashion upon a single crystal
substrate.
i. making process
Masking is used to identify the place in which Ion Implantion should not be
occurred.
17. what are the materials used for masking?
Wet etching and dry etching are the types of photo etching.
LOCOS means Local Oxidation Of Silicon. This is one type of oxide construction.
SWAMI means Side Wall Masked Isolation. It is used to reduce bird’s beak effect.
Twin-tub process is one of the CMOS technology. There are two wells are
available in this process. The other name of well is tub. So, because of these two
tubs, this process is known as twin-tub process.
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