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Lecture05 CMOS Transistor Theory Up
Lecture05 CMOS Transistor Theory Up
ntsonvldt@gmail.com
1 Structure of MOSFET
2 Formation of Channel
3 MOSFET Characteristics
Operation Regions
IV relationship
Parasitic Capacitance
Source - Drain Resistance
Source/Drain: n+ (n - Diffusion)
The gate is formed by polysilicon, and the insulator
by Silicon dioxide.
Source/Drain: p+ (p - Diffusion)
MOSFET Symbol
D: Drain
G: Gate
S: Source
B: Bulk/Body
MOSFET Characteristics
NMOS Cutoff:
VGS < VT H
ID ≈ 0
MOSFET Characteristics
NMOS Saturation:
VGS > VT H and VDS ≥ VGS − VT H
1 W
ID = µn COX (VGS − VT H )2
2 L
MOSFET Characteristics
L
RDS = R□ + RC
W
R□ : sheet resistance per square of the drain-source
diffusion
RC : contact resistance
1 W
Saturation VGS > VT , IDS = µ C
2 n OX L
(VGS − VT )2
VDS > VGS − VT
1 W
Saturation VSG > |VT |, IDS = µ C
2 p OX L
(VSG − |VT |)2
VSD > VSG − |VT |
Second-Order Effects
1 W
IDS = µn COX (VGS − VT )2 (1 + λVDS )
2 L
λ = VDS ∆L/L
1 W
IDS = µn COX (VGS − VT )2 (1 + λVDS )
2 L
λ = VDS ∆L/L
Questions?
Thank you !