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ESElect 162023 ESD
ESElect 162023 ESD
Metal/via damage
22 nm technology
Gate length: 22 nm
Oxide Thickness: 0.8 nm (SiO2)=> higher leakage I:
High K dielectrics larger thickness with small Cox
Junction depth: 20 nm
E ≈ ½ V2 C
V = 2000V e C = 100 pF
=> E= 20 mJ
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