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Lecture 16

Prof. Eros Pasero


HC00 data sheet

 ESD Protection? Human Body Model? Machine


Model? Charge Device Model?
 Latch Up?

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Electro Static Discharge (ESD)
 Static Energy
 Triboelectric effect
 ESD definition
 ESD Failures
 ESD Studies
 Standard Models:
 Human Body Model
 Machine Model
 Charged Device Model

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Static energy
 It’s an electric charge coming from
an electrons imbalance on the
surface of an object
 When 2 objects have different
electrical potentials you have a fast
charge transfer when the 2 objects
are in contact
 Static electricity creation =>
triboelectric effect

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Parameters influencing electrical
discharge
 Environment conditions: humidity…
 Scrub speed
 Contact area
 Material:
 Positive charge: nylon, hairs, fur….
 Negative charge: teflon, silicon, gold….

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Humidity

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ESD in Ics: definition
 ESD is a transient discharge of static charge
that arises from either human handling or a
machine contact.
 Although ESD is the result of a static
potential in a charged object, the energy
dissipated and damages made are mainly
due to the current flowing through ICs
during discharge.
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ESD
Becomes a problem when current densities closely
approach or exceed 500,000 A/cm2
For sub-micron width leads, this translates to
currents of only a few milliamps
Slow wearout of metallization caused by excessive
current densities
=>Electromigration

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Difficult to recognize
 IC sometime don’t work: transient stress? No, ESD
 Random problems, infant mortality, production
defects? NO, ESD
 Different problems not immediately after the
discharge
 You don’t have the right instrumentation to check the
problem
 It’s economically profitable to replace the part!

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Failures

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ESD damages
 pn-junction may melt.
 Gate oxide may have void formation.
 Metal interconnects & Vias may melt or
vaporization, leading to shorts or opens.
 Gate-oxide breakdown is another form of
ESD damage.

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ESD failures in Ics
Gate oxide damage Junction breakdown

Metal/via damage

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ESD studies

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Why is ESD Critical ?
gate oxide thickness junction depth

The level of ESD stress, however, does not scale down


with the technology!

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Device: protection circuits

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Input:

Ci ≤ 5 pF and Ri = 1012 Ω High Zi

Electro static charges

Clamp diodes: Vi > Vcc + Vth CLAMP

Vi < GND + Vth CLAMP

Rs ≈250 Ω Current limit when high Vi is applied to inputs

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Xoxyde < 500 Å (1 Å = 10-10 m => Xox = 50 nm)
Dielectric strenght = 107 V/cm => 1 V/nm
=> Break down when Vgs>50V

22 nm technology
 Gate length: 22 nm
 Oxide Thickness: 0.8 nm (SiO2)=> higher leakage I:
 High K dielectrics larger thickness with small Cox
 Junction depth: 20 nm

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Principle Sources of ESD in ICs
Human Handling
 A person walking on a synthetic floor can accumulate
up to 20 kV. (Icharge = 1-10 A @ ∆t =10-100 ns).This
voltage is discharged when the person touches an
object that is sufficiently at ground.
Test and Handling Systems
 Equipment can accumulate static charge due to
improper grounding. The charge is transmitted
through ICs when it is picked up for placement in test
sockets.
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Principle Sources of ESD in ICs
IC Itself is Charged During Transport / Contact
With Charged Objects:
 ICs remain charged until they come into contact
with a grounded surface (large metal plates /test
sockets). Charge is discharged through the pins of
ICs. Large currents in the internal interconnects
can result in high voltage inside the devices which
can cause damage to thin dielectrics and
insulators.

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Modelling: 3 Standard models
 HBM: Human Body Model
 MM: machine Model
 CDM: Charged Device Model

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MIL-STD-883 Method 3015 - ESD STM5.1: Electrostatic Discharge
Sensitivity Testing -- Human Body Model

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Resistance in a Wrist Strap System

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Anti-Static Products

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Real Model

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Destruction mechanisms
1. Short transition time: tr < 1 ns. The protection
circuit is not still active and the discharge
power can’t be dissipated.
2. High peak currents Ipeak > 1.5 A
3. High discharge energy

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How much energy is at stake?
 You must dissipate:

E ≈ ½ V2 C
V = 2000V e C = 100 pF
=> E= 20 mJ

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ESD STM5.2: Electrostatic Discharge Sensitivity Testing -- Machine
Model
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Integrated circuit packaging

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Discharge Energy
E = ½ V2 C = ½ 5002 200 10-12 = 25 µJ
L = 500 nH depends on the length of
wire and series inductance of the wires
utilized

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V = .5 – 2 kV

ESD STM5.3.1: Electrostatic Discharge


Sensitivity Testing - Charged Device Model Metal Plate

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Pick place machine
Surface mount component feeder

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CDM test

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Test wave forms

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E= ½ V2 C =0.5 10002 1000 10-12 = 0.5 mWs (or mJ)

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Temperature growth

CS = 1.631 Ws/Kcm3 silicon thermal capacity


Si fusion temperature = 1600 °C; Al fusion temperature << 1600 °C
>> Al melts and spreads into Si => the protection circuit becomes a
short circuit
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JEDEC STANDARD
 JESD22-A115C (Revision of JESD22-A115B, March 2010)
 Electrostatic Discharge (ESD) Sensitivity Testing,
Machine Model (MM)
About JEDEC
JEDEC brings manufacturers and suppliers together to
participate in more than 50 committees and
subcommittees, with the mission to create standards to
meet the diverse technical and developmental needs of
the industry.

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Reference regulations

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ECE – R10 Rev. 5
6.10.4
• Electrostatic discharge
– For vehicles fitted with tyres, the vehicle body/chassis
can be considered to be an electrically isolated structure.
Significant electrostatic forces in relation to the vehicle's
external environment only occur at the moment of
occupant entry into or exit from the vehicle. As the
vehicle is stationary at these moments, no type approval
test for electrostatic discharge is deemed necessary.

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IEC 61000-4-2 (EN 61000-4-2)
 The EUT is subjected to three types of discharge.
Direct contact discharge is preferred either directly to
the EUT or indirectly through vertical or horizontal
coupling planes. Air discharge is used where direct
contact cannot be applied.

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Environmental conditions

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Generator

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Discharge
AD CD

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Discharge Networks

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Evaluation
 No change, according to manufacturer specifications
 Temporary loss of function, ending after the test
 Temporary loss of function requiring operator
 loss of function not recoverable

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How to protect your inputs?
 DVIULC6-4SC6Y: Automotive ultralow capacitance
ESD protection
 4-line ESD protection (IEC 61000-4-2)
DVI ports up to 1.65 Gb/s
HDMI ports up to 1.65 Gb/s
IDB 1394
USB 2.0 ports up to 480 Mb/s (high speed),
backwards compatible with USB1.1 low and full
speed
Ethernet port: 10/100/1000 Mb/s
SIM card protection
Video line protection

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Silicon Controlled Rectifier
pnpn

A
A

K IG → Ic2 → Ic1 → Ib2 → Self


Distruction
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Thyristor
 100 A 1200 V SCR
 four-layered, three terminal semiconducting device,
with each layer consisting of alternately N-type or P-
type material, for example P-N-P-N.
 arc welding machines

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TRIAC
 Triode for Alternating Current
 bidirectional triode thyristor
 The bidirectionality makes TRIACs very
convenient switches for alternating
current circuits,
 Light dimmers

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Latchup in Bulk CMOS
Electrostatic Discharge stress can cause
latch-up by injecting minority carriers from the
clamping device in the protection circuit into
either the substrate or the well.

β1β2 >1 =latchup

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Shunted Rs and Rw

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Buried contacts
 The buried contact is a
method to make direct
ohmic contact between
the polysilicon gate
material and the
junctions, in silicon-gate
integrated circuits.

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 The gate and source of a
depletion device can be
connected by a method
Butting contact known as butting contact.
 Here metal makes contact
to both the diffusion
forming the source of the
depletion transistor and to
the poly silicon forming
this device’s gate.
 Its advantage is that no
buried contact mask is
required and it avoids
associated processing.

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Preventing latchup: System approach
 Make sure power supplies are off before plugging a board:
signal pins can see surge voltages greater than 0.7 V
higher than Vdd
 Carefully protect electrostatic protection devices
associated with I/O pads with guard rings: Electrostatic
discharge can trigger latchup by means of the clamping
diodes which can inject minority carriers in the substrate
or well, potentially triggering latchup
 Radiations can generate electron-hole pairs which can
contribute to well or substrate currents
 Sudden transients on the power or ground bus (i.e. when
large numbers of transistors switch simultaneously)

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