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SCOPUSQ2 Paper 5 Transistiontowards B5 GBJIT
SCOPUSQ2 Paper 5 Transistiontowards B5 GBJIT
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ORIGINAL RESEARCH
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References
must fulfil in order to support and strengthen the 5G/B5G
system design [15, 30, 31]. These specifications are summed
[12]
[36]
[37]
[38]
[39]
[40]
up below:
Pull-in voltage–12.2 V, 7.5 V insertion loss < 0.1 dB, isola- Multiband communication over X and K bands
tion–34.7 dB @ 10.4 GHz, 34.3 dB @ 11 GHz, 40.7 dB High pull-in voltage, B5G criteria not satisfied
• Isolation: better than − 20/30 dB for a wide range of
5G applications
5G applications
literature for designing switches specific to 5G and beyond
applications. However, satisfying completely the above-
mentioned switch criteria is a quite tedious task. This can be
visualized from the tabulated literature presented in Table 1.
Literature gives insights that the switch manufacturing pro-
cess should be compatible with the technologies used in
Pull-in Voltage–10.5 V, insertion loss–0.03 dB, isola-
tion–15 dB @ 40 GHz
tion–54 dB @ 22 GHz
tion–49 dB @43 GHz
B5G are rarely met till now as per the best knowledge of
authors. Therefore, based on studied literature (Table 1), to
@ 21.4 GHz
achieve the above-mentioned performance parameters, the
Performance
electrode
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1
Resonant Frequency(f0) = √ (2)
2π Lb Cb
⎧ 1 for f ≪ f0 ⎫
⎪ jωCb ⎪
Zb = ⎨ Rtb for f = f0 ⎬ (3)
⎪ ωL for f ≫ f0 ⎪
⎩ b ⎭
Fig. 3 3D structure of simulated MEMS shunt capacitive switch This whole analysis is given in detail in [34], therefore
the characterization of R-L-C in terms of scattering param-
eters is directly given below in up-state and down state of
Table 2 Specifications for RF-MEMS shunt capacitive switch the switch. The capacitance ( Cup) is given as in Eq. (4) [39]:
Name Length (μm) Width (μm) Thick- Materials
ness 𝜀oA 𝜀oA
Cup = =
(μm) g1 +
td g1 (4)
𝜀r
CPW Ground 590 600 3 Gold
CPW Signal 100 600 3 Gold
The low Cup ensures minimum loss in on state, as can be
Space 60 600 3 –
determined from Eq. (5) representing return loss.
Dielectric Layer 100 60 0.2 SiO2 | −jωCup Z0 |
Bridge Layer 520 60 2 Gold |S11 |f ≪ f0 = −20 Log|| |
| (5)
| | | 2 + jωCup Z0 |
Meander 140 10 2 Gold | |
Electrode 150 60 3 Gold
Furthermore, the down-state capacitance (Cd), results into
Gap – – 1.5 Air
good isolation in an off state, which is well understood from
Eqs. (6) and (7) shown below [40]:
𝜀 0 εr A
Cd = (6)
td
Central
CPW Ground CPW Ground
Conductor
| 2 |
Lb Cb Lb |S | f ≪ f = −20 Log| | (7)
| 21 | 0 | 2 + jωC Z |
(a) | d 0|
Rtb = Rb + Rcpw
Thus, from above discussion it is clear that geometrical
arrangement leads to decide the RF characteristics of the
switch [41].
4.1 RF‑FEM simulations
Fig. 4 a Top view of switch with R, L, and C components b equiva- The electromagnetic behaviour of the RF-MEMS shunt
lent R-L-C model
capacitive switch has been analysed using the finite ele-
ment method (FEM) on the HFSS tool by simulating the
switch design using the above-mentioned specifications. The
( )
1 RF characteristics of the switch in on-state and off-state is
Zb = Rtb + j ωLb − (1) represented in terms of scattering parameter S12 (insertion/
ωCb
isolation) as shown in Figs. 5 and 6. Insertion loss has been
The resonance of the switch which can be tuned through observed over a range of air gaps (1 μm–3 μm) between
inductance and capacitance components of switch is given the structural layer and the signal conductor in order to
as [35–38] shown in Eq. (2). achieve the above-mentioned specifications. It can be seen
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Fig. 5 On-state RF response of a simulated switch Fig. 7 Isolation comparison FEM vs equivalent lumped model
Fig. 6 Off-state RF response of a simulated switch Fig. 8 Insertion loss comparison FEM vs equivalent lumped model
from Fig. 5 that for all the switch designs with a gap above a 50 Ω transmission line. The change in capacitance ( Cup,
1 μm, the insertion loss is < -0.3 dB within the frequency d) will give us the up and down-state response of the switch
C
band n258. Furthermore, isolation is observed to be more in terms of S-parameters. The R-L-C values have been
than -25 dB for the specified band. For switches with a gap extracted using S-parameters values obtained from switch
of 1.5–3 μm both insertion loss and isolation response are design simulations on the HFSS tool. R = 0.12 Ω has been
found to be as per desired specifications. extracted using Eq. (7), where R is considered instead of Cd
and S21 is taken as 46.3 dB at 24.5 GHz. Cd = 1.51 pF has
4.2 Equivalent R‑L‑C model simulations been extracted by putting S21 = 0.24 dB at 1 GHz in Eq. (7)
and Cup = 29.77 fF has been obtained using S11 = 46.6 dB
Electromagnetic and electrical characterization of RF- at 1 GHz in Eq. (5). L = 27.8 pH has been calculated using
MEMS switches is mostly done using commercial tools. extracted value of Cd and a resonant frequency of 24.5 GHz.
However, this process lags in providing exact physical By using extracted value of R-L-C, an equivalent model has
insight of the switching device, thus requiring a clear reali- been simulated. Thus, the R-L-C model has been validated
zation through a lumped (R-L-C) model as shown in Fig. 4. as the results obtained from FEM simulation and the lumped
This electrical equivalent model of a capacitive switch has model converge with each other (Figs. 7, 8).
been realized and modelled using the ADS tool. Results The extracted and calculated values of all the lumped
obtained from both the simulation methods converge with parameters have been tabulated in Table 3, shown below:
each other and validate the equivalent R-L-C model of the
switch. As the switch is realized on the CPW transmission 4.3 Electromechanical simulations
line, the transmitter and receiver ports are physically coupled
and behave as an always-on switch without applying actua- Pull-in voltage is one of the critical criteria that certi-
tion voltage. Electrostatic actuation is used to actuate the fies an electromechanical switch’s compatibility with IC
bridge placed over the CPW line’s central conductor to alter technology and all on-chip semiconductor components and
the status of the switch from on to off. This design of switch devices in terms of voltage and power needs. In order to
is represented through a series of R-L-C elements placed on analyze pull-in voltage, simulation has been performed on
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Cd 1.51 pF 1.06 pF
Cup 29.77 fF 34.27 fF
R 0.12 Ω –
L 27.8 pH –
Fig. 9 Electromechanical response of simulated switch Table 4 Simulation results of the proposed switch
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Table 5 Comparison results of proposed switch design with existing switches [44–49]
RF-MEMS K. Srinivasa Girija et.al Yasser et.al Vivek et.al Chand et.al P. Ashok et.al Proposed Switch
Switch et.al (2019) [44] (2019) [45] (2020) [46] (2021) [47] (2021) [48] (2022) [49]
Structure
Frequency Ka band K band C-K band 24.5–27.5 GHz 25–40 GHz 25–65 GHz n258 band &
Range (27–40 GHz) (18–26 GHz) (4–26 GHz) (19–31 GHz)
Insertion Loss − 0.44 dB < 1 dB − 0.65 dB < 0.20 dB − 0.95 dB − 0.26 dB − 0.2 dB
@38 GHz 18–27 GHz @24 GHz @40.10 GHz @41 GHz @24.5 GHz
Isolation − 31 dB − 38.3 dB − 18 dB 40.7 dB − 36.25 dB − 46.7 dB − 46.3 dB
@38 GHz @27 GHz @24 GHz @27.5 GHz @25 GHz @38 GHz @24.5 GHz
Pull-in Voltage 11.97 V 4.03 V 18 V – 1.9 V 1.8 V 1.9 V
Switching Time 190 μs 175 μs – – 1.82 μs – 107 μs
5 Conclusion References
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49. Kumar PA, Karumuri SR, Koandavitee GS, Guha K (2022) Springer Nature or its licensor (e.g. a society or other partner) holds
Design and performance analysis of a low-pull-in-voltage RF exclusive rights to this article under a publishing agreement with the
MEMS shunt switch for millimeter-wave therapy, IoT, and author(s) or other rightsholder(s); author self-archiving of the accepted
5G applications. J Comput Electron. https://doi.org/10.1007/ manuscript version of this article is solely governed by the terms of
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