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Materials Letters 201 (2017) 216–220

Contents lists available at ScienceDirect

Materials Letters
journal homepage: www.elsevier.com/locate/mlblue

Continuous and large-area transition metal disulfides films deposited by


pulsed laser/chemical vapor-combined process as a counter electrode for
dye-sensitized solar cells
Yuqiao Wang a,⇑, Yichao Bai a, Junting Xi b, Meiting Liu a, Mengtian Li a, Kunquan Hong c,⇑, Yueming Sun a
a
School of Chemistry and Chemical Engineering, Southeast University, Nanjing 211189, China
b
School of Science, China Pharmaceutical University, Nanjing 211198, China
c
School of Physics, Southeast University, Nanjing 211189, China

a r t i c l e i n f o a b s t r a c t

Article history: The continuous and large-area films of transition metal disulfides (MS2, M = Mo, W, Fe, Co, Ni) were pre-
Received 31 March 2017 pared on the conducting glass using pulsed laser deposition followed by chemical vapour deposition. The
Received in revised form 2 May 2017 metal oxide precursor was deposited onto the substrate by pulsed laser deposition, and then the oxides
Accepted 4 May 2017
were rapidly sulfurized by chemical vapour deposition. As a result, the functional films exhibit excellent
Available online 4 May 2017
electrocatalytic activity as a counter electrode for dye-sensitized solar cells due to their uniformity, crack-
free and adhesive.
Keywords:
Ó 2017 Elsevier B.V. All rights reserved.
Chemical vapour deposition
Pulsed laser deposition
Transition metal disulfide
Electrocatalytic activity
Solar energy materials
Thin films

1. Introduction Generally, the preparation methods of TMDs were mostly based


on the solution approaches, including the hydrothermal/cast-
Transition metal disulfides (TMDs) have attracted extensive coating [11] and precursor impregnation/pyrolysis [12] processes.
research interest due to the opportunity for acting as a high effi- Furthermore, the sputtering/sulfurization-combined synthesis of
cient catalyst in the emerging clean and renewable energy tech- WS2 can be considered as a large-scale fabrication of CEs [13]. In
nologies, such as hydrogen evolution reaction [1–3], lithium ion this work, we report a scalable method to produce a series of high
batteries [4,5] and solar cells [6,7]. In particular, the catalyst activ- quality TMDs (MS2, M = Mo, W, Fe, Co, Ni) decorated-FTO CEs for
ity of TMDs for the photoelectrochemical devices depends on not DSSC, developing an effective strategy to combine the pulsed laser
only the chemical compositions and structures but also the reliable deposition (PLD) of transition metal oxides with the rapid sulfur-
assembly and integration technology. For instance, the transfer- ization by chemical vapour deposition (CVD). The continuous and
free growth of MoS2 or WS2 has been achieved by spin-coating a large-area throughput synthesis can be expected to improve the
liquid chalcogen precursor onto the transition metal oxide layer, uniformity and crack-free of TMDs films, control the thickness,
followed by a laser irradiation annealing process [8], indicating and enhance the adhesive strength between films and substrates.
that the air-stable and low-power photodetectors was easily inte-
grated by the spin coating/laser irradiation annealing combination.
2. Experimental details
Some reports suggested that MoS2 [9], NiS2 [7] and CoSe2 [10]
coated fluorine doped tin oxide (FTO) can be employed as a counter
2.1. Preparation and assembly
electrode (CE) in dye-sensitized solar cell (DSSC), which is a cheap
and promising alternative to Pt during the electrocatalytic reduc-
The vacuum chamber with the base level of 2  10 4 Pa was
tion from triiodide (I3 ) to iodide (I ) ions.
adjusted to 5 Pa by adding oxygen. The PLD operation was per-
formed by pulsing laser ablation from transition metal oxide on
FTO substrates, using a pulsed Nd:YAG laser (harmonic component
⇑ Corresponding authors. k = 532 nm, repetition rate m = 10 Hz, energy of 450 mJ and pulse
E-mail addresses: yqwang@seu.edu.cn (Y. Wang), hongkq@seu.edu.cn (K. Hong). numbers of 2000). Then the sulfurization process was employed

http://dx.doi.org/10.1016/j.matlet.2017.05.027
0167-577X/Ó 2017 Elsevier B.V. All rights reserved.
Y. Wang et al. / Materials Letters 201 (2017) 216–220 217

Fig. 1. HRTEM images of (a) MoS2, (b) WS2, (c) FeS2, (d) CoS2 and NiS2. (f) Raman spectra of various TMDs. Inset: selective area electron diffraction.

by CVD process under N2 flow at 550 °C for 20 min to convert tran- measured in a three electrode system: TMDs/FTO CE as a working
sition metal oxide to MS2 (M = Mo, W, Fe, Co, Ni). The device electrode, Pt wire as a counter electrode and saturated calomel
assembly was described in our previous work [14]. Pt-coated FTO electrode (SCE) as a reference electrode. The electrolyte was
counter electrode was prepared by the conventional pyrolysis [15]. composed of LiClO4 (0.1 M), LiI (10 mM) and I2 (1 mM) in an
acetonitrile solution. The symmetric TMDs/FTO cell with an
2.2. Characterization and photovoltaic performance active area of 0.25 cm2 was used to perform electrochemical
impedance spectroscopy (EIS) and Tafel polarization curves,
The crystal structure was investigated by X-ray diffraction using the electrolyte of 1-methyl 3-propyl imidazolium iodide
(XRD, Bruker D8 advance) and high-resolution transmission elec- (1 M), I2 (0.15 M), guanidinium thiocyanate (0.1 M) and 4-tert-
tron microscopy (HRTEM, Tecnai G2T20). The morphology was butylpyridine (0.5 M) in 3-methoxypropionitrile.Tafel was
observed by scanning electron microscopy (SEM, FEI-F50). Raman performed at a scan rate of 10 mV s 1. EIS was carried out in the
spectroscopy was also performed at 514 nm wavelength (Horiba frequency range from 0.01 Hz to 105Hz with an amplitude of
JY HR800) to perceive the crystal quality of TMDs. All electrochem- 10 mV. The current density-voltage (JV) curves were tested by
ical characterizations were conducted on an electrochemical Newport Oriel 91192 and recorded by Keithley 2400 at
workstation (CHI760D). The cyclic voltammogram (CV) was 100 mW cm 2 (AM1.5).
218 Y. Wang et al. / Materials Letters 201 (2017) 216–220

Fig. 2. SEM images of (a) MoS2, (b) WS2, (c) FeS2, (d) CoS2 and (e) NiS2 on FTO substrates. (f) XRD patterns. Inset: EDX elemental spectra.

3. Results and discussion and sulfur atoms) and out-of-plane (A1g, sulfur atoms) vibration
modes [16]. (2) As for FeS2, the two strong peaks at 333 and
HRTEM images show the representative structures of MS2 369 cm 1 and a weak peak at 420 cm 1 corresponded to the S2
(M = Mo, W, Fe, Co, Ni) in Fig. 1(a–e). The crinkly and ripped vibration (Eg), S–S in-phase stretch (Ag), and coupled vibration
MoS2 and WS2 demonstrated a few-layered characterization with and stretch (Tg) modes, matching well with pyrite FeS2 [17]. (3)
a typical interlayer distance of 0.62 and 0.65 nm, respectively. The peaks at 275 and 378 cm 1 were consistent with the character-
The fringe spaces of FeS2 were referred to 0.29 and 0.58 nm, corre- istic E2g and A1g modes of CoS2, respectively [5]. (4) The weak peak
sponding to the inter-planar spacing of (2 0 0) and (0 1 1) planes of at 265 cm 1 was assigned to Eg mode followed by a strong peak at
cubic FeS2, respectively. The clear inter-planar spaces were 0.32 468 cm 1 (Ag), corresponding to pyrite NiS2 [18]. As a result, the
and 0.39 nm, corresponding to the (1 1 0) and (1 1 1) planes of cubic HRTEM and Raman analysis demonstrate that TMDs obtained by
CoS2, respectively. The inter-planar spaces of 0.28 and 0.40 nm PLD/CVD-combined process have a good crystallinity and purity.
agreed with the (0 2 0) and (1 0 1) lattice spacing of cubic pyrite The surface morphology of TMDs coated FTO was examined
NiS2, respectively. Fig. 1f shows the Raman spectra of TMDs: (1) with SEM in Fig. 2(a–e). The uniform and crack-free films were
Two characteristic peaks of MoS2 (377 and 403 cm 1) and WS2 tightly bound with FTO substrates. Under the ordinary sticky tape,
(348 and 414 cm 1) were indicators of the in-plane (E2g, metal the union between films and substrates were still very strong. The
Y. Wang et al. / Materials Letters 201 (2017) 216–220 219

Fig. 3. (a) CV plots of TMDs/FTO CEs. (b) Tafel polarization. (c) EIS plots. (d) JV curves of DSSC.

Table 1
Electrochemical properties fitted by CV, EIS and Tafel curves, and the photovoltaic performance of solar cells.

CE Rs (Xcm2) Rct (Xcm2) Ip,c (mA cm 2


) Epp (mV) J0(mAcm 2
) Voc(V) Jsc (mAcm 2
) FF g(%)
Pt 4.35 6.35 -0.83 326 3.88 0.70 10.77 0.71 5.22
MoS2 5.47 8.88 -0.79 421 1.72 0.68 10.52 0.67 4.86
WS2 7.02 17.62 -0.71 521 0.28 0.69 9.66 0.63 4.30
FeS2 6.26 17.27 -0.66 318 0.37 0.70 10.67 0.60 4.46
CoS2 7.22 12.59 -0.65 301 0.81 0.71 10.63 0.60 4.58
NiS2 5.49 8.95 -0.70 383 1.61 0.73 10.34 0.62 4.75

excellent morphology of TMDs/FTO CE can improve the electrocat- negative position revealed the faster reduction velocity (vred):
alytic performance. Fig. 2f shows all XRD reflections of TMDs/FTO vred(Pt) > vred(MoS2) > vred(WS2) > vred(NiS2) > vred(FeS2) > vred(CoS2).
CEs and bare FTO for reference. The FTO substrate-related peaks The smaller peak-to-peak potential separation (Epp) for the relative
were clearly noticed in SnO2 XRD patterns (JCPDS 41-1445). Com- negative pair reflected the better reversibility of the redox
pared with the intense peaks of SnO2, the characteristic peaks of reaction: Epp(CoS2) < Epp(FeS2) < Epp(Pt) < Epp(NiS2) < Epp(MoS2) <
TMDs were so weak that they can be hardly observed, because Epp(WS2). Furthermore, Tafel and EIS plots were used to quantify
TMDS film was much thinner than SnO2 coating on FTO. The crys- interfacial charge transfer parameters for TMDs/FTO CEs. In Tafel
tallinity and purity of TMDs were analyzed by HRTEM and Raman polarization zone of Fig. 3b, the exchange current density (J0) can
in Fig. 1. The results corroborated well with the standard patterns be estimated by the intersection of the extrapolated linear anodic
of MoS2 (JCPDS 37-1492), WS2 (JCPDS 87-2417), FeS2 (JCPDS 42- and cathodic branches to provide the electron exchange rate at
130), CoS2 (JCPDS 41-1471) and NiS2 (JCPDS 65-3325), agreeing the electrolyte/electrode interface. EIS curves can offer more
with energy dispersive X-ray (EDX) elemental spectra (inset of impedance information about the interfacial electron transfer in
Fig. 2). Fig. 3c. The equivalent circuit based on fitting EIS analysis mainly
The electrocatalysis and reversibility of TMDs/FTO CEs were consists of the following RC elements: a charge-transfer resistance
investigated by CV plots in Fig. 3a. The reduction of I3 to I was (Rct), a series resistance (Rs), a Warburg impedance (Zw) and a con-
considered as a rate determining step among the two pairs of redox stant phase element (CPE). Especially, Rct and Rs are closely related
peaks. The higher cathodic peak current density at the relative to the catalytic activity of reduction of I3 to I and the contact
220 Y. Wang et al. / Materials Letters 201 (2017) 216–220

resistance between electrocatalysts and substrates, respectively. Fundamental Research Funds for the Central Universities
As shown in Fig. 3d, the photocurrent density-voltage (JV) curves (3207047410), and Priority Academic Program Development of
illustrate the device performance assembled by TMDs/FTO CEs, Jiangsu Higher Education Institutions (1107047002).
including an open-circuit voltage (Voc), a short-circuit photocur-
rent density (Jsc), a fill factor (FF), and a photon-to-electron References
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