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Evolution of Copper Vapor From The Cathode of A Diffuse Vacuum Arc
Evolution of Copper Vapor From The Cathode of A Diffuse Vacuum Arc
5, OCTOBER 1987
f (r, t) =(2rT) i
e -m r2) At t
Pt2kT t2 (2)
Fig. 2. Atoms emitted in the time interval di contribute to the total vapor
concentration an amount of dn = f (r, t - r) 7y(T) dI.
where m is the atomic mass and k is Boltzmann's con-
stant.
Next we allow for a point source of finite duration At. z
The evaporation is described by an atomic generation rate
z0
'y(r) = dN
dr (3)
which states how many atoms per second are evaporated.
If we restrict the validity of the model to diffuse arcs, y
can be related to the arc current I(T) by
Y(r) = a -GI(r)
m
(4) 0
where G is the erosion rate and ai gives the fraction of Fig. 3. Cylindrical coordinate system for calculation of the metal-vapor
eroded material which appears as neutral vapor. density at a point po, z0 resulting from vapor emission from a surface.
Metal atoms which are emitted in the time interval be-
tween r and r + dr (Fig. 2) contribute to the vapor con- In (9) 6 has been introduced since the surface ele-
cos
centration at time t and distance r an amount of ment seen from the observation point po, zo is given by
cos a dA. The angle 6 is related to the distance d of dA to
dn(r, t) = f(r, t - r) y(r) dr. (5) the observation point by
The total concentration is obtained on integrating:
cos 6 =-
d (10)
n(r, t) =
tro
f(r, t - r) yy(r) dr. (6) with
The integration has to be carried out from arc ignition To
d2 = 0 + 2 poD cos sp' + p2 + (11) z2+
to the observation time t, if t is less than the arc duration, The primed quantities denote the coordinates of dA on the
or to time At, if t 2 At. So the upper limit is given by cathode surface.
Since the experimental data refer to sinusoidal half-
rl = min (t, At). (7) cycles, we represent the current by
In this model the sources of vapor are the cathode spots
and their molten tracks [5]. The rapid and random motion I(r) = Io sin wr, if 0 c r c -
of the cathode spots takes them to virtually all regions of
the cathode surface during an arcing cycle. So it may be I(T) = 0, otherwise (12)
justified to treat the cathode as a homogeneously emitting where IO is the peak current and X the angular frequency.
vapor source by introducing a vapor generation rate per Combining (2), (8)-(10), and (12) finally yields
unit area:
z(G t) Io m 3/2
S(r(,r
A )
aGI(T)
=
(8)
mA 2.2ir rR6R 1Tr sin cor
A being the cathode area.
Then, in cylindrical coordinates p, (p, z (Fig. 3), the 0 0 o(t - r)
vapor concentration at a point po, zo reads
exp (- d2 - dr p dp'fdo'.
(2kT(t r)(
) d
n(po, zO, t) = A f(d, t -) S(r) cos 6 dr dA. (13)
(9) R, is the cathode radius.
554 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. PS-15, NO. 5, OCTOBER 1987
E(0) = aG
AG
for 0
min-< 0 < 0 max
E(0) = 0, otherwise. (15)
,B is the fraction of eroded material ejected in droplet form.
4) Droplets that reach the wall of the vacuum chamber
rapidly cool down and stop emitting vapor. The anode is
so far away from the cathode that it is not hit by droplets
(Fig. 7). vacuum chamber
Then the concentration N of droplets at time r, at a point wall
marked by the radius vector (Fig. 6) Fig. 7. The droplet emission is assumed to occur only in a small angular
range between 0m and Om0x The contact separation is sufficiently large
R = (x, y, z) = (r sin 0 cos sp, r sin 0 sin (p, r cos 0) that droplets do not hit the anode. The radius of the vacuum chamber is
Rcyl.
(16)
is given by [12]
Again, d is the distance between the observation point
N(R, T) = 3E(0)
7rer2 0
sin vD3
-
I( r)
v (17) and the point of vapor emission:
where t is the mass density of the contact material. The d2 = RO -R-v (t - T)2 I
(21)
current I has to be taken at the time r - (r/v), when The term v * (t - r) in (21) accounts for the radial motion
those droplets that at time T have reached the distance r of the droplets.
from the cathode spot were emitted. The vapor concentration at a distance zo above the cen-
The droplet distribution obtained this way is considered ter of the cathode (RO = (0, 0, zO)) is found to be
as a vapor source distributed in space. We define a vapor
generation rate per unit volume by
flD(ZO, /)
3 X/ BGIo
Q(R, r) = I(T) * 7rD2 * N(R, r) 2 (2r) 3/2 ~vDA0k
(18)
0Omax nR*(O) TI p(T) sin (T - (r/v))
where
Omin 0 To T (t -
r(T) = p(T) (mkT) (19)
2) d2
m
* expe d
d-r dr da (22)
is the flux of atoms leaving a surface at temperature T;
p ( T) denotes the vapor pressure.
The vapor concentration nD at an observation point Ro The upper limit R*(0) of the radial integral is a function
resulting from droplet evaporation can now be calculated of a 0 due to the cylindrical shape of the vacuum chamber,
analogously to (8), if S ( r), the vapor generation rate per which has the radius RCY1 (Fig. 7):
unit area, is replaced by Q(R, Tr), and the integration is
carried out over the volume containing droplets: R*(0) = Rcyl/sin 0. (23)
TR In the numerical evaluation of (22), cooling of the drop-
nD(RO, t) =
V f (d, t - r) Q (R, T) dT dV. (20) lets by evaporation and radiation was taken into account,
according to the work of Tuma et al. [11].
556 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. PS-15, NO. 5, OCTOBER 1987