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Lecture 9 16092022
Lecture 9 16092022
Lecture 9
16-09-2022
Prof. Ramesha C K
EF donor dope
EF acceptor doped
2022-09-16 3
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Electron and Hole Concentrations (n0, p0)
at Thermal Equilibrium
n0 =
EC
f ( E ) N ( E )dE
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Electron and Hole Concentrations (n0,
p0) at Thermal Equilibrium
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Electron and Hole Concentrations
(n0, p0) at Thermal Equilibrium
n0 = N C f ( E C )
1
f ( EC ) = e −( EC − EF ) / kT
1 + e ( EC − EF ) / kT
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Degenerate and non-Degenerate Semiconductor
3/ 2
−( EC − EF ) / kT 2m n* kT
n0 = N C f ( EC ) = N C e where N C = 2 2
h
p0 = N V [1 − f ( EV )]
1
[1 − f ( EV )] = 1 − ( EV − E F ) / kT
1+ e
− ( E F − EV ) / kT
e 2m kT * 3/ 2
− ( E F − EV ) / kT
p0 = NV [1 − f ( EV )] = N V e N V = 2
h 2
p
For Silicon Nc= 2.8× 1019 /cm3 and Nv = 1.04 × 1019 /cm3
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Schematic Band Diagram
Schematic band diagram, density of states, Fermi–Dirac distribution, and the carrier
concentrations for (a) intrinsic, (b) n-type, and (c) p-type semiconductors
at thermal equilibrium.
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• Recall these two equations :
n0 = N C f ( EC ) = N C e −( EC − EF ) / kT
p0 = NV [1 − f ( EV )] = N V e −( EF − EV ) / kT
Intrinsic electron and hole concentrations where almost EF = Ei :
pi = NV e − ( Ei − EV ) / kT ni = N C e −( EC − Ei ) / kT
n0 p0 = ( N C e − ( EC − EF ) / kT )( NV e − ( EF − EV ) / kT ) =
−( EC − EV ) / kT − E g / kT
N C NV e = N C NV e
ni pi = ( N C e −( EC − Ei ) / kT )( N V e −( Ei − EV ) / kT ) =
−( EC − EV ) / kT − E g / kT
N C NV e = N C NV e
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Thus, intrinsic electron and hole concentrations are equal since the carriers are created
in pairs : ni = pi :
Thus, intrinsic concentration : n0 p0 = ni2
Also,
Note: ni of Si at RT = 1.5 x 1010 cm-3 & EC – Ei = Eg/2 if NC = NV
− E g / 2 kT
ni = N C NV e
Two convenient expressions :
− ( E C −E F ) / kT − ( EC −Ei ) / kT ( E F −Ei ) / kT ( E F −Ei ) / kT
n 0 = NCe = NCe e = nie
Thus,
− ( E F −E V ) / kT − ( Ei −E V ) / kT ( Ei −E F ) / kT ( Ei −E F ) / kT
p0 = N V e = NVe e = nie
n0 = ni e ( EF − Ei ) / kT
p0 = ni e ( Ei − EF ) / kT
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Example:
Find the equilibrium electron and hole concentrations and the location of the
Fermi level (with respect to the intrinsic Fermi level Ei) in silicon at 300K if the
silicon contains 8 1016 cm-3 Arsenic (As) and 2 1016 cm-3 boron (B) atoms.
n0 = ni e ( E F − Ei ) / kT
p0 = ni e ( Ei − EF ) / kT
n = 6 1016 cm-3
ni2
p= = 3.5 10 3 cm-3
n
E f − Ei = kT ln( n / ni ) = 0.393eV
Ec − E f = kT ln( N c / n) = 0.0258 ln( 2.8 1019 / 6 1016 )
= 0.159 eV
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Temperature Dependence of Carrier Concentrations
− E g / 2 kT
ni = N C NV e
3/ 2
2m kT *
N C = 2 n
2
h 3/ 2
2kT − E / 2 kT
2m kT * 3/ 2
ni (T ) = 2 2 (m n* m *p ) 3 / 4 e g
= 2 h
p
NV
h 2
n0 = ni e ( E F − Ei ) / kT
p0 = ni e ( Ei − EF ) / kT
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Temperature dependence of carrier concentrations
Figure 3—17
Intrinsic carrier concentration for Ge, Si, and GaAs as a function of
2022-09-16 inverse temperature. The room temperature values are marked for 14
reference.
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Carrier Concentration vs. Inverse Temperature
100K
Figure 3—18
2022-09-16 Carrier concentration vs. inverse temperature for Si doped with 15
1015 donors/cm3.
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A silicon crystal is known to contain 10-4 atomic percent of arsenic (As) as an
impurity. It then receives a uniform doping 3 1016 cm-3 phosphorous (P) atoms
and a subsequent uniform doping of 1018cm-3 boron (B) atoms. A thermal
annealing treatment then completely activates all impurities.
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Conductivity and Hall effect
thermal velocity
conductivity mass