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Generation of Plasma by Vacuum Arc With Copper-Chromium Cathode
Generation of Plasma by Vacuum Arc With Copper-Chromium Cathode
Abstract—Vacuum arcs are used in various electrophysical analyze the mass-charge state of vacuum arc plasmas produced
devices. In vacuum circuit breakers, arcs are undesirable but with copper–chromium cathodes under the conditions typical
occur frequently as contacts get open, producing an electrode- of vacuum circuit breakers.
eroding plasma. The parameters of an arc plasma formed in the
electrode gap of a vacuum circuit breaker are largely responsible
for its stability and long-term operation, and to lengthen the life II. EXPERIMENTAL SETUP
time of such devices, their electrodes are made of copper– The vacuum arc plasma produced in vacuum circuit
chromium composites. Here we study the mass-charge state of breakers with copper–chromium electrodes was studied using
arc plasmas produced with copper–chromium electrodes under the discharge system of an ion source [7]. During the operation
the conditions typical of vacuum circuit breakers. of a vacuum arc, the plasma generated in cathode spots filled
the anode cavity, and the ions extracted from its emission
Keywords—vacuum arc, plasma, vacuum circuit breakers, surface formed a wide-aperture ion beam. The mass-charge
copper–chromium electrode state of the ion beam was measured with a time-of-flight
spectrometer [8], and the measurement data were used to assess
I. INTRODUCTION the composition of the vacuum arc plasma. Despite the seeming
Vacuum arcs with cathode spots or cathodic arcs have been complexity of such a method, it has been applied to advantage
studied for more than 100 years [1]. This type of discharge is of
much research interest due to its wide use in electrophysical
and ion plasma devices like cathodic arc deposition systems
[3], and ion sources [4], and also because cathodic arcs are an
undesirable but frequent event limiting the life time of vacuum
circuit breakers [2]. Despite the so long research, one cannot
say with confidence what main physical mechanisms drive the
operation of vacuum arc cathode spots. By now, several
hypotheses explain the phenomenon, and most recognized
among them is the ecton mechanism [5]. Studying cathodic
arcs is of both fundamental and applied importance, and in
particular, it is the way to unambiguously understand the
generation of vacuum arc plasmas and to further improve the
devices in which such discharges occur.
As a rule, the electrodes of vacuum circuit breakers are
made of composite materials and mostly based on copper and
chromium. Despite the rather long history of designing,
investigating, and using high-current vacuum circuit breakers
[6], there is still no consensus on the physical processes that
determine the relationship between the characteristics of Fig. 1. Discharge system for research in arc plasma produced in vacuum
composite cathodes and plasma and on how these circuit breakers.
characteristics influence the efficiency of the devices. Here we
The work was supported by the Russian Science Foundation (grant #18-
19-00069).
III. RESULTS
215
(a) (a)
(b) (b)
Fig. 4. Plasma composition vs discharge current density at 150 µs after arc Fig. 5. Plasma composition vs magnetic field at 200 µs after arc ignition for
ignition for CuCr-50/50 (a) and CuCr-70/30 (b). Residual pressure 1 µTorr. CuCr-50/50 (a) and CuCr-70/30 (b). Residual pressure 1 µTorr.
amount of copper and chromium ions of charge 1+ and 2+ and cathodes, is a typical effect in pulsed arc discharges. Early in
increases the amount of ions of charge 3+. Beginning with the operation of an arc, the discharge voltage is high and so is
about 0.2 T, the plasma reveals Cu4+ and Cr4+ ions and even a the plasma temperature and the ionization rate. After 150 µs of
small fraction of Cr5+ ions. As the magnetic field is increased to its operation, the voltage across the gap drops to about 25 V,
more than 0.8 T, all dependences reach saturation and the and the electron temperature in the plasma decreases to typical
plasma composition becomes almost unchanged. quasi-steady values such that all dependences reach saturation
and the plasma composition becomes almost unchanged.
For both electrode materials, the time dependences of the
plasma composition with a magnetic field are the same as those For both electrode materials, the mean charge states of
with no magnetic field (Fig. 3), except that the fraction of copper and chromium ions and their charge state distributions
highly charged ions is higher. After about 150 µs, all are close: the mean charge states of copper and chromium ions
dependences reach saturation and the plasma composition for CuCr-50/50 are 1.7+ and 1.82+, respectively, and those for
becomes almost unchanged. CuCr-70/30 are 1.69+ and 1.8+, respectively. Thus, changing
the fractions of copper and chromium in the cathode material
IV. DISCUSSION by 20 % changes the mean charge state of their ions by about
1 %. This suggests that the ion charge state distribution in the
The decrease in the fraction of multiply charged ions and in composite cathodes is determined mainly by the distribution of
the mean ion charge state with time (Fig. 3), which was multiple ionization potentials of each metal component rather
observed in the vacuum arc plasma with copper–chromium
216
cathode is negligible compared to the current density in a
cathode spot, and increasing the current density at the cathode
increases the number of cathode spots but does not affect the
ionization in each of them.
When the discharge gap is placed in a magnetic field
(Fig. 5), the fraction of highly charged ions grows and so does
the mean ion charge state in the arc plasma, as it happens with
single-element cathodes. This is likely because the magnetic
field compresses the plasma jet and increases the discharge
voltage and the electron temperature, resulting in additional
ionization. It should be noted that the magnetic field effect, in
this case, is dual [13]: the magnetic field not only increases the
electron temperature but it also expands the region of freezing
– a dense plasma region near a vacuum arc cathode spot in
which ionization occurs.
The magnetic field at which the ion charge states reach
saturation approximates those at which such saturation is
Fig. 6. Fractions of Cu and Cr ions in plasma (symbols) vs discharge current observed for copper and chromium. The mean charge state of
density at 200 µs after arc ignition for CuCr-50/50 and CuCr-70/30 cathodes copper and chromium ions determined from the dependences in
with Cu and Cr fractions in them indicated by lines.
Fig. 5 increases 1.6 times, which correlates with its increase by
a factor of 1.5 and 1.7 for a copper and a chromium cathode,
than by the ratio of two metals in a cathode. As for the question
respectively.
of why Cr4+ ions are observed early in the arc current pulse and
Cu4+ ions are not, the answer is simple: because the ionization From the dependences obtained, we can determine the ion
potential of Cr4+ ions is 54.4 eV and that of Cu4+ ions is fraction of each element in the arc plasma. Figure 6 shows the
75.5 eV, and the electron temperature in the plasma early in the fractions of copper and chromium ions in the vacuum arc
discharge pulse is sufficient for the former and insufficient for plasma (symbols) and their fractions in the CuCr-50/50 and
the latter ions to appear in the plasma. By estimates, the plasma CuCr-70/30 cathodes (lines). The dependences in Fig. 6
temperature at the initial discharge stage is 5 eV, and after suggest that the fractions of copper and chromium ions in the
about 150 µs, it decreases to a quasi-steady value of 3.5 eV. arc plasma correspond to the atomic fractions of these elements
The established plasma temperature is determined by the in the cathodes. Thus, if both electrodes of a circuit breaker are
balance of particles in the plasma and by the balance of power made of the same composite materials, their surface
deposited in the discharge. composition will be unaffected by the cathode material transfer
during the operation of cathode spots, and if their materials are
When a magnetic field is imposed, it compresses the plasma
different, the anode will be eventually covered with a film
jet from cathode spots and increases the vacuum arc voltage but
identical in composition to the cathode material.
it does not change the overall time dependence of the plasma
mass-charge state. With and with no magnetic field, the
discharge voltage decreases to its quasi-steady value in about V. CONCLUSION
the same time, and the mean charge states of Cu ions for two Thus, our research in the mass-charge state of arc plasmas
cathode materials are almost equal. Early in the arc pulse in produced in vacuum circuit breakers with copper-chromium
both cases, the plasma contains Cr5+ ions and does not contain cathodes suggests the following. Both with and with no
Cu5+ ions whose ionization potentials are 73.9 eV and external magnetic field in the discharge gap, the plasma
102.7 eV, respectively composition becomes quasi-steady within about 150 µs after
Increasing the discharge current density five times changes arc ignition. Increasing the magnetic field increases the charge
the plasma composition by a few percent (Fig. 4) through state of copper and chromium ions in the composite cathodes
decreasing the amount of Cu2+ and Cr2+ ions and increasing the like in single-element cathodes, and as the magnetic field is
amount of ions of charge 3+. Such a change is typical for increased to more than 0.8 T, the increase in the charge state
vacuum arcs when switching to higher current modes and is slows down. The charge state of the vacuum arc plasma
associated with a relatively small increase in plasma produced with such composite cathodes is determined by the
temperature with increasing discharge voltage, which has an discharge parameters and by the distribution of multiple
ascending current–voltage characteristic. At the same time, this ionization potentials of copper and chromium contained in the
experimental fact evidences once again that the ionization in cathodes. Increasing the discharge current and hence the
vacuum arc plasmas, including plasmas with composite current density at the electrodes little affects the plasma mass-
cathodes, occur in cathode spots as unit cells and are sustained charge state, and the ion fraction of each component in the
by ectons as elementary explosive emission events. Increasing plasma is equal to its atomic fraction in the cathode material.
the vacuum arc current increases its density at the cathode up to These features indicate that both cathode components are
3 kA/cm2, but this value is at least ten thousand times smaller ionized in the same dense plasma region of a vacuum arc
than the current density in a cathode spot, which is of order of cathode spot.
100 MA/cm2. Therefore, the average current density at the
217
ACKNOWLEDGMENT [7] A.G. Nikolaev, E.M. Oks, K.P. Savkin, G.Yu. Yushkov, and I.G. Brown,
“Upgraded vacuum arc ion source for metal ion implantation,” Rev. Sci.
The work was supported by the Russian Science Instrum., vol. 83, pp. 02A501 (1-3), February 2012.
Foundation (grant No. 18-19-00069). The authors are thankful [8] A.S. Bugaev, V.I. Gushenets, A.G. Nikolaev, E.M. Oks, and G.Yu.
to Dr. Irina Poluyanova from Tavrida Electric Company for Yushkov, “Time-of-flight mass spectrometry studies of an ion beam
providing the electrode materials used in commercial vacuum generated by the titan source,” Russian Physics Journal, vol. 43, pp. 96-
103, February 2000.
circuit breakers and for expressing interest in the research.
[9] A.G. Nikolaev, G.Yu. Yushkov, K.P. Savkin, and E.M. Oks, “Angular
distribution of ions in a vacuum arc plasma with single-element and
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