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23 A Unified Mobility Model For Device Simulation-I Model Equations and Concentration Dependence
23 A Unified Mobility Model For Device Simulation-I Model Equations and Concentration Dependence
23 A Unified Mobility Model For Device Simulation-I Model Equations and Concentration Dependence
00
Printed in Great Britain. All rights reserved Copyright © 1992 Pergamon Press Ltd
Abstract--The first physics-based analytical model is presented that unifies the descriptions of majority
and minority carrier mobility and that includesscreeningof the impurities by charge carriers, electron-hole
scattering, clustering of impurities and the full temperature dependence of both majority and minority
carrier mobility. Using this model, excellentagreement is obtained with published experimentaldata on Si.
The model is especiallysuited for device simulation purposes, because the carrier mobility is given as an
analytical function of the donor, acceptor, electron and hole concentrations and of the temperature.
953
954 D. B. M. KLAASSEN
ity: lattice, donor, acceptor and electron hole scatter- Parameter A~As P B
ing. Electron~lectron and hole-hole scattering is not llma~(cm2V 'S ') 1417.0 1414.0 470.5
#min(cm2V I S I) 52.2 68.5 44.9
accounted for, as it represents only a second-order #~(cm2V ~s ~) 43.4 56.1 29.0
effect on the mobility[13]. In this section the four Nrcl,] (cm 3) 9.68 x 10 ~ 9.20 x I0 I~' 2.23 × 10 ~7
Nr.f2(cm 3) 3.43 x 10> 3.41 × 102° 6.10 x 1020
contributions to the mobility mentioned above will be
:q 0.68 0.711 0.719
discussed. ~2 2.0 1.98 2.0
From eqn (5) it can be seen that due to screening at Table 2. Numericalvalues for the constants si in eqn (9) and r~ in
eqn (12)
high impurity concentrations the impurity scattering
i si r,
mobility increases with the carrier concentration.
I 0.89233 0.7643
2 0.41372 2.2999
2.3. Minority impurity scattering 3 0.19778 6.5502
4 0.28227 2.3670
Already in a paper published in 1957 Blatt[7] 5 0.005978 -0.01552
showed that at low temperatures the Born approxi- 6 1.80618 0.6478
mation breaks down and that from the superior 7 0.72169
as a function of S5
+/(ma00~'p~"' (9)
P = 4k2r~, (7)
(\m 0 T ] J
where k is the wave vector and r 0 is the Debye where T is the temperature in kelvin. The numerical
screening length[13]. In the theoretical calculation of values of the constants in this formula are given in
the mobility from the energy-dependent collision Table 2. It should be noted that the accuracy of the
cross-section, this parameter P is evaluated at an JWKB approximation for the phase shifts was
energy of 3k BT, where ka is Boltzmann's constant checked against the results obtained by Blatt (Fig. 6
and T is the temperature (see p. 267 of Ref. [26]). of Ref. [7]). For all values of P with G ( P ) ~ < l
Consequently, we also evaluated the parameter P good agreement was obtained. Only at very small
given by eqn (7) at this temperature, yielding (with values of P did differences occur due to the JWKB
the permittivity of Si): approximation.
The contribution to the electron mobility due to
acceptor scattering ~e.A and the contribution to the
hole mobility due to donor scattering /~h.O are now
where m is the effective carrier mass, mo is the free obtained from:
carrier mass, T is the temperature in kelvin and c is
/-te,D(ND = NA, C)
#0,A(N~, c)
G(P¢)
\ ", '
l 1°o
and
a <
Uh,A(NA = ND, C)
]Ah,D(N o , c) G(Ph) , (10)
13- ', v~v ~ - ~ o T=300K [ calculated
(5 10-1 ", ~ , ~ ~ ~ T=2ooK( m/~o=l where/re, D and #h,A are given by eqn (5). The subscript
y~ ~ T=IOOK'J
i / . . . . . . lyrical fit e and h of P indicates that the effective electron
and hole mass, respectively, has to be used in
eqn (8).
2"10-2
10-2 10-1 100 101 102
103 104
2.4. Electron-hole scattering
P=4k 2 r02 c~ 1
As far as the attractive interaction potential for
Fig. 2. The ratio G(P) calculated as a function of P [see
eqns (6) and (8)] for four different temperatures and an e l e c t r o n - h o l e scattering is c o n c e r n e d , holes c a n be
effective carrier mass equal to the free carrier mass. The regarded as moving d o n o r s a n d e l e c t r o n s can be
dashed line represents the analytical fit given by eqn (9). regarded as moving aeeeptors. The relaxation time
SSE 35/7--F
956 D. B. M. KLAASSEN
300
for the linear m o m e n t u m of the primary scatterer r
in a system of two moving scattering partners is[29]: 250
~ 200
--I = 2riM2 1 - - v: C O S 0
T dr~ =0 O o = o \ vi 150
All results could be described by an analytical fit At ultra-high concentrations the Caughey Thomas
formula: formula no longer suffices to describe the carrier
mt mobility and the full formula of Masetti et al.[10] has
r t P'~ + r2 + r 3 --
m2 to be used [see eqn (1) and Fig. 4]. These effects of
F(P) = (12)
mt ultra-high concentrations on the mobility represented
P'~ + r4 + r~ - -
m2 by the third term on the right-hand side of eqn (1),
can be accounted for by assuming that above an
The numerical values of the constants in this formula
impurity concentration of 102o cm 3 the carriers are
are given in Table 2.
no longer scattered by impurities possessing one
The contribution to the electron mobility due to
electronic charge and a concentration Nt, but by
hole scattering ~to.h and the contribution to the hole
impurities with Z electronic charges and a "cluster"
mobility due to electron scattering l~h.~ are now
concentration N ~ = N / Z . The concentration of
obtained using:
charge carriers c is not affected. In the Appendix it is
~t~.h(p, c) = F(P~)#e.~(ND = p , c) shown that these ultra-high concentration effects on
the carrier mobility can be modelled effectively by
and replacing N~ by Z x N I in eqn (5). This modified
majority impurity scattering mobility is added to the
#h.~(n, C) = F(Ph)I~h.A(NA = n, c), (13) lattice scattering mobility using Matthiesen's rule.
The resulting mobility is now equated to the full eqn
10 ~ (1). Solving for Z at each impurity concentration N t
A yields the "clustering" function Zz(Nt), which can be
1.33
", u ml /m2 = 1.0 described in reasonable detail by the following ana-
~. ,q. v m l / m 2 =0.67 lytical fit function (see Fig. 5):
:::L m. •-- analytical fit
'..£
Cu 1
v "v "b'~
u_
ZI(NI) = 1+ /Nrefj\2. (14)
lOO . . . . . . . . . . . . . . . . . . . .
700 2000
~'~, • Dziewior and Silber A
A 600 ~, v Tang o o o o "
.~.,.,, • Swirhun et ai.
1500
I 500 °~,, majority mobility
"x~, .-- fit Swirhun
~'~ 400 ". • -- model calculation
v 1000
>,>. • Krausse ~"~'~ ~
g .~ 300 1mm3; 100 ps; ~".,
.JE~.D
o o 2V : 200A; ~*~
~ 2oo E E 500 ...... 300K
c -- A T=IOOK
.~_ 1 O0
- - ,%T=200K
0 ~+ 0
E 1017 1018 1019 1020 1014 1015 1016 1017 1018
v
m
> 300 ~
~
"',
"',,
"'.. --
,m
majority mobility
fit del Alamo
6. C O N C L U S I O N S
¢~ >"
-6 ~ 200
~ . .
...........
. - -
•
~ "-~
~,,.
model calculation The first physics-based analytical model is pre-
>- - - - -or -m- . . . . . . . . .
sented that unifies the descriptions of majority and
o I00 .... =," minority carrier mobility and that includes screening
of the impurities by charge carriers, electron-hole
o scattering and clustering of impurities. The model is
1017 1018 1019 1020
especially suited for device simulation purposes, be-
donor concentration ( c m -3) cause the electron and hole mobility are given as
Fig. 7. Minority hole mobility as a function of the donor (P) analytical functions of local variables: ionized donor,
concentration. Symbols represent experimental data: 0[32]; ionized acceptor, electron and hole concentrations.
~[34]; A[35]; [5][2,3]; Q[5]; and 116]. The dashed curve The excellent agreement between our model and
represents the fit of del Alamo et al.[2,3]; the solid curve published experimental data on the carrier mobility in
represents the minority hole mobility using our new
model; and the dotted curve represents the majority electron Si ensures that our model is a sound basis for a
mobility. revised determination of the bandgap narrowing[36]
Unified mobility model for device simulation--I 959