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Revista Fotocatálisis YOOO-9-10
Revista Fotocatálisis YOOO-9-10
Revista Fotocatálisis YOOO-9-10
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aligned as shown in Figure 2.8. The electrical contact processes on wide band-gap oxide semiconductor
has formed a space charge layer. The surface of the surfaces, and is the focus of the rest of this review.
metal acquires an excess negative charge while the Figure 2.91, part D shows a common excitation
semiconductor exhibits an excess positive charge as scheme observed for adsorbates on metals. When the
a result of electron migration away from the barrier metal is irradiated, a hot electron is generated at a
region. The bands of the semiconductor bend upward level above the Fermi edge and this electron then
toward the surface, and the layer is said to be tunnels into an empty level in the adsorbate mol-
depleted. The barrier formed at the metal—semicon- ecule. Processes occurring by this type of electron
ductor interface is called the Schottky barrier. The transfer process have been reviewed recently.50
height of the barrier, <p\>, is given by The interfacial electron transfer process has been
extensively investigated14’15 and the dynamics of such
<t>b
=
<t>m-Ex (8) processes continue to attract intensive research
effort.51-54 The rate constant for an interfacial
where Ex is the electron affinity, measured from the electron transfer is found to be greater than 5 x 1010
conduction band edge to the vacuum level of the s-i55,56 The driving force for the heterogeneous
semiconductor. The diagram in Figure 2.8 illustrates electron transfer is the energy difference between the
an ideal metal—semiconductor contact, i.e. no surface conduction band of the semiconductor and the reduc-
states exist on the semiconductor, etc. The Schottky tion potential of the acceptor redox couple, A/A-, (AE
barrier produced at the metal—semiconductor inter- Ech Ea/a-)- An excellent review of this subject
-
—
face can serve as an efficient electron trap preventing has been written by Lewis,57 and applications of these
electron-hole recombination in photocatalysis as ideas are given in section 3.6 dealing with photooxi-
discussed in section 4.2. dation processes at the liquid-solid interface of TiC>2.
I. PHOTOREACTION -
CB CB
D+
A A"
vb^M VB
B. Semiconductor
II. PHOTOREACTION -
CB
A"
D+
VB
Figure 2.9. (I) Catalyzed photoreaction, initial excitation of adsorbate, and (II) Sensitized photoreaction, initial excitation
of solid.
The electronic structure of the nearly perfect Ti02 The filled valence band at ~
6 eV is composed of O
surfaces is essentially identical to that of the bulk 2p orbitals (as shown in the UPS spectrum) and the
rutile TiC>2. Figure 3.3 shows the photoemission empty conduction band is composed of Ti 3d, 4s, and
spectra from vacuum-fractured (110), (100), and (001) 4p orbitals. The Ti 3d orbitals dominate the lower
faces of rutile TiC>2.63 All three faces give spectra portion of the conduction band. The weak emission
similar to that of the bulk. The intense peak at 6 ~
at ~0.8 eV below the Fermi level is associated with
eV is due to electron emission from the O 2p obitals. the defect induced-Ti 3d-derived levels. This state
The small emission peak near the Fermi level is due can be eliminated by surface oxidation.
to point defect oxygen vacancies. This feature is Few studies have been conducted on the structure
more clearly shown in Figure 3.4. Figure 3.4 shows of the anatase single crystal surfaces.60'61’65 A recent
the electronic band structure constructed from pho- photoemission study by Sanjines et al.65 has shown
toemission (UPS) and inverse photoemission (IPS) that anatase TiO2(101) and polycrystalline anatase
spectra for a slightly defective TiO2(110) surface.64 thin films exhibit similar electronic photoemission