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Full download Nanomaterials for Sensing and Optoelectronic Applications (Micro and Nano Technologies) 1st Edition M. K. Jayaraj (Editor) file pdf all chapter on 2024
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N A N O M AT E R I A L S F O R
SENSING AND
OPTOELECTRONIC
A P P L I C AT I O N S
N A N O M AT E R I A L S F O R
SENSING AND
OPTOELECTRONIC
A P P L I C AT I O N S
Edited by
M. K. JAYARAJ
Cochin University of Science and Technology, Kochi, India;
University of Calicut, Malappuram, India
SUBHA P. P.
Cochin University of Science and Technology, Kochi,
Kerala, India
SHIBI THOMAS
Department of Physics, Bharata Mata College,
Thrikkakara, Kochi, India
Elsevier
Radarweg 29, PO Box 211, 1000 AE Amsterdam, Netherlands
The Boulevard, Langford Lane, Kidlington, Oxford OX5 1GB, United Kingdom
50 Hampshire Street, 5th Floor, Cambridge, MA 02139, United States
This book and the individual contributions contained in it are protected under
copyright by the Publisher (other than as may be noted herein).
Notices
Knowledge and best practice in this field are constantly changing. As new research and
experience broaden our understanding, changes in research methods, professional
practices, or medical treatment may become necessary.
Practitioners and researchers must always rely on their own experience and knowledge
in evaluating and using any information, methods, compounds, or experiments
described herein. In using such information or methods they should be mindful of their
own safety and the safety of others, including parties for whom they have a professional
responsibility.
To the fullest extent of the law, neither the Publisher nor the authors, contributors, or
editors, assume any liability for any injury and/or damage to persons or property as a
matter of products liability, negligence or otherwise, or from any use or operation of
any methods, products, instructions, or ideas contained in the material herein.
ISBN: 978-0-12-824008-3
Contents
Contributors. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .xi
Preface . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . xv
Index . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 331
Contributors xi
Contributors
M. Alonso Cotta
Instituto de FÃsica Gleb Wataghin, Universidade Estadual de Campinas,
13083-859 Campinas, São Paulo, Brazil.
R. Anjana
Cochin University of Science and Technology, Kochi, India; Department of
Physics, St. Albert’s College (Autonomous), Ernakulam, India
K.S. Anju
Cochin University of Science and Technology, Kochi, India
A.S. Asha
Cochin University of Science and Technology, Kochi, India; Centre of
Excellence in Advanced Materials, Cochin University of Science and
Technology, Kochi, India
P.A. Aswathy
Cochin University of Science and Technology, Kochi, India; Department of
Physics, St. Stephen’s College, Kollam, India
Maneesh Chandran
Department of Physics, National Institute of Technology Calicut, Calicut,
India
A. Irzhak
Institute of Microelectronics Technology, Russian Academy of Sciences,
Chernogolovka, 142432, Russia
M.K. Jayaraj
Cochin University of Science and Technology, Kochi, India; University of
Calicut, Malappuram, India
V. Koledov
Kotelnikov Institute of Radio Engineering and Electronics of the Russian
Academy of Sciences, Moscow, Russia
T.K. Krishnapriya
Cochin University of Science and Technology, Kochi, India
P. Lega
Magnetic Phenomena Laboratory, Kotelnikov Institute of Radio
Engineering and Electronics, Russian Academy of Sciences, Mokhovaya
11-7, 125009, Moscow, Russia
P.S. Midhun
Cochin University of Science and Technology, Kochi, India
xii Contributors
A.M.V. Mohan
Electrodics & Electrocatalysis Division, CSIR-Central Electrochemical
Research Institute (CECRI), Karaikudi, India
P. Mymoona
Electroplating and Metal Finishing Division (EMFD), Council of Scientific
and Industrial Research (CSIR)-Central Electrochemical Research Institute
(CECRI), Karaikudi, India; Academy of Scientific and Innovative Research
(AcSIR)-CSIR, Ghaziabad, India
Subha P.P.
Department of Physics, Cochin University of Science and Technology,
Kochi, Kerala, India
M.J. Priya
Centre of Excellence in Advanced Materials, Cochin University of Science
and Technology, Kochi, Kerala, India
Biji Pullithadathil
Nanosensor Laboratory, PSG Institute of Advanced Studies, Coimbatore,
India
K.K. Rajeev
Department of Instrumentation, Cochin University of Science and
Technology, Kochi, India; Centre of Excellence in Advanced Materials,
Cochin University of Science and Technology, Kochi, India
J.V. Rival
Smart Materials Lab, Department of Nanoscience and Technology,
University of Calicut, Kerala, India
K.J. Saji
International School of Photonics, Cochin University of Science and
Technology, Kochi, India; Centre of Excellence in Advanced Materials,
Cochin University of Science and Technology, Kochi, India
V. Sampath
Indian Institute of Technology Madras, Chennai-600 036, India
Manu Shaji
Cochin University of Science and Technology, Kochi, India
E.S. Shibu
Smart Materials Lab, Department of Nanoscience and Technology,
University of Calicut, Kerala, India
Z. Song
International Research Centre for Nano Handling & Manufacturing of
China, Changchun University of Science and Technology, Changchun
130022, China
A.M. Starvin
Department of Chemistry, Christian College, Kattakada,
Thiruvananthapuram, India
Contributors xiii
P.S. Subin
Centre of Excellence in Advanced Materials, Cochin University of Science
and Technology, Kochi, Kerala, India
Navami Sunil
Nanosensor Laboratory, PSG Institute of Advanced Studies, Coimbatore,
India
Shibi Thomas
Department of Physics, Bharata Mata College, Thrikkakara, Kochi, India
S. von Gratowski
Laboratory of Spectroscopy and Millimeter and Submillimeter Wave
Measurements, Kotelnikov Institute of Radio Engineering and Electronics,
Russian Academy of Sciences, Fryazino Branch, FIRE RAS, Vvedenski
Sq.1, Fryazino, Moscow Region, 141190, Russia
Preface xv
Preface
1.1 Introduction
Recently, nanostructured metal oxides have attracted much atten-
tion in many industrial and domestic applications for the detection
of toxic, flammable, and explosive gases due to their high sensitivity,
flexibility in production, small size, low cost, and ability to detect both
reducing and oxidizing gases (Miller et al., 2014; Wang et al., 2010). The
sensing properties of these nanomaterials strongly depend on their
size, structure, shape, surface-to-volume ratio, and physical and chem-
ical properties. With the increasing demand for selective and sensitive
gas sensors, researchers are following different strategies to improve
the gas sensing properties of the metal oxide semiconductor (MOS)–
based gas sensors, such as changing the morphology of nanostructures
(Gurlo, 2011; Shouli et al., 2010; Sun et al., 2012), noble metal dop-
ing (Luo et al., 2017; Sarkar et al., 2015), the formation of hierarchical
nanostructures (Miller et al., 2014; Walker et al., 2019), core–shell (CS)
structures (Yan et al., 2018), hollow heteronanostructures (Guo et al.,
2019), and exposing high energy crystal facets (Jia et al., 2014; Liang
et al. 2019a; Liu, et al., 2012). Among these strategies, scientists are
more interested in the development of nanostructures with selectively
exposed high-energy facets.
The numbers of dangling bonds (unsaturated bonds), number of
active site for gas adsorption, and the arrangement of surface atoms
are important factors that play a crucial role in gas sensing proper-
ties since gas sensing processes occur on the surface. Different crystal
facets with distinctive surface atomic arrangements possess different
gas sensing properties. High-energy facets possess a large number of
Language: English
JANUARY-JUNE 1914.
By N. BOHR,
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