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Tools of Micro & Nano Fabrication
Tools of Micro & Nano Fabrication
Tools of Micro & Nano Fabrication
FABRICATION
OPTICAL LITHOGRAPHY
expose to UV light
etched by acid
• Photoresistive resine
• Patterns: Masks
• Wavelenght
resolution dependant
Resolution Limits
• Contact
Advantages:
●
Good resolution
Drawbacks:
●
Masks thin and flexible
●
Use ->defects
Resolution Limits
• Proximity
Advantages:
●
Masks lifetime high
Drawbacks:
●
Resolution not as good
Gap ●
Diffraction
~ 20-50 μm
●
Fresnel diffraction
Resolution Limits
• Projection
Advantages:
●
Good resolution
●
No deterioration
●
Image smaller than mask
Drawbacks:
●
Fraunhoffer diffraction
●
Compromise between resolution
and depth of focus
RESOLUTION
Where,
• No lenses: mirrors
• Laser plasma
sources
• 10 nm
Nanoimprint
• techniques:
Heat resine
Cool down
UV radiations
Patterning Techniques
EUV soon in fabrication
Nanoimprint
E beam
for 22nm
X Rays
difficult
The electron beam lithography
• Types of EBL
Electron Beam Direct Write
Electron Projection Lithography
Write-field (WF)
Scanning methods
• Raster scan
• Vector scan
• SCALPEL (Bell
Laboratories and
New solutions Lucent technologies)
1995
• PREVAIL (IBM) 1999
Electron Projection
Lithography
• SCALPEL
– High contrast
– Image reduction
• PREVAIL
– Larger effective field
Electron beam resists
1. Important parameters
2. Types of resist
3. Resist limitations
EBL resists
Important parameters
Resolution (nm)
Sensitivity (C/cm^2)
Types of resist
• Positive resist
Polymethyl methacrylate
(PMMA)
• Negative resist
• Research
- Nanopatterning on Nanoparticles
- Nanowires
- Nanopillars
- Gratings
- Micro Ring Resonators
- Nanofluidic Channels
• Industrial / Commercial
- Exposure Masks for Optical Lithography
- Writing features
Nanopatterning on
• Significance nanoparticles
- Photonic Crystals
- Quantum Dots
- Waveguides
(2003), Patterning of porous Silicon by Electron Beam Lithography, S. Borini, A. M. Rossi, L. Boarino, G. Amato
Nanowires
• Applications
- High-Density Electronics (Sensors, Gates in FETs)
- Molecular Electronics & Medical/Biological Applications
Controlled Fabrication of Silicon Nanowires by Electron beam lithography and Electro- chemical size
reduction (2005), Robert Juhasz, Niklas Elfstrom and Jan Linnros
Nanometer Scale Petterinng of Langmuir-Blodgett Films of Gold Nanoparticles by Electron Beam
Lithography (2001), Martinus H.V Werts, Mathieu Lambert, Jean-Philippe Bourgoin and Mathias Brush
Nanopillars
• Significance
- Quantum Confinement Effects
- Photoconductive response in Nanopillar arrays
(2005) A single-step process for making nanofluidic channels using electron beam lithography, J. L. Pearson
and D. R. S. Cumming
Industrial Applications
• Writing Features
Some Applications of E-Beam
Lithography
• Cryo-electric devices
• Optoelectronic devices
• Quantum structures
• Multi-gate Devices
• Transport mechanism for semi and superconductor
interfaces
• Optical devices
• Magnetism
• Biological Applications
– Nano-MEMS
– Nanofluidics
Future opportunities for electron beam
lithography
20 nm electron beam lithography and reactive ion etching for the fabrication of double gate FinFET
devices (2003), J. Kretz , L. Dreeskornfeld, J. Hartwich, W. Rosner
Nanoscale FinFETs for low power applications (2004), W. Rösner, E. Landgraf, J. Kretz, L. Dreeskornfeld, H.
Schäfer, M. Städele,T. Schulz, F. Hofmann, R.J. Luyken, M. Specht, J. Hartwich, W. Pamler, L. Risch
Double gate FinFET devices –
Characteristics & Applications
Nanoscale FinFETs for low power applications (2004), W. Rösner, E. Landgraf, J. Kretz, L. Dreeskornfeld, H.
Schäfer, M. Städele,T. Schulz, F. Hofmann, R.J. Luyken, M. Specht, J. Hartwich, W. Pamler, L. Risch
Single electron transistor - Concept
• Physic principle
Weak external force to bring an additional
electron to a small conductor “island”
=> Repulsing electric field
• SET concept
- Down-scaling
- Low power consumption
• Difficulties
- Need of very small “islands” because
the addition energy must overload the
temperature effects
• Results
A few mode are allowed to propagate, depending of the photonic crystal
parameters
Three-dimensional photonic crystals operating at optical wavelength region (2000), Susumu Noda
XRay and e-beam lithography of three dimensional array structures for photonics (2004), F. Romanato,
E. Di Fabrizio,M. Galli