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PN and Metal-Semiconductor Junctions: 4.1 Building Blocks of The PN Junction Theory
PN and Metal-Semiconductor Junctions: 4.1 Building Blocks of The PN Junction Theory
\
|
= =
d
c
i
a c
bi
N
N
n
N N
q
kT
A B ln ln
2
|
d
c
kT A q
c d
N
N
q
kT
A e N N n ln = = =
N-region
2
ln
i
a d
bi
n
N N
q
kT
= |
2
2
ln
i
a c
kT B q
c
a
i
n
N N
q
kT
B e N
N
n
n = = =
P-region
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-5
4.1.3 Poissons Equation
Gausss Law:
c
s
: permittivity (~12c
o
for Si)
: charge density (C/cm
3
)
Poissons equation
A x
E ( x )
E ( x + A x )
x
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-6
4.2.1 Field and Potential in the Depletion Layer
On the P-side of the
depletion layer, = qN
a
On the N-side, = qN
d
4.2 Depletion-Layer Model
s
a
qN
dx
d
c
=
E
) ( ) (
1
x x
qN
C x
qN
x
P
s
a
s
a
= + =
c c
E
) ( ) (
N
s
d
x x
qN
x
- =
c
E
(a)
N
P
N
d
N
a
Depletion Layer Neutral Regi on
x
n
0
x
p
(b)
x
x
p
x
n
(c)
qN
d
qN
a
x
x
n
x
p
(d)
(f)
E
c
E
f
E
v
|
bi
,
built-in potential
P
N
0
x
n
x
p
x
|
bi
(e)
Neut ral Region
V
N
N
N P
P
P
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-7
4.2.1 Field and Potential in the Depletion Layer
The electric field is continuous at x = 0.
N
a
|x
P
| = N
d
|x
P
|
Which side of the junction is depleted more?
A one-sided junction is called a N
+
P junction or P
+
N junction
(a)
N
P
N
d
N
a
Depletion Layer Neutral Regi on
x
n
0
x
p
(b)
x
x
p
x
n
(c)
qN
d
qN
a
x
x
n
x
p
(d)
(f)
E
c
E
f
E
v
|
bi
,
built-in potential
P
N
0
x
n
x
p
x
|
bi
(e)
Neut ral Region
V
N P
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-8
4.2.1 Field and Potential in the Depletion Layer
On the P-side,
Arbitrarily choose the
voltage at x = x
P
as V = 0.
On the N-side,
2
) (
2
) ( x x
qN
x V
P
s
a
=
c
2
) (
2
) (
N
s
d
x x
qN
D x V =
c
2
) (
2
N
s
d
bi
x x
qN
=
c
|
(a)
N
P
N
d
N
a
Depletion Layer Neutral Regi on
x
n
0
x
p
(b)
x
x
p
x
n
(c)
qN
d
qN
a
x
x
n
x
p
(d)
(f)
E
c
E
f
E
v
|
bi
,
built-in potential
P
N
0
x
n
x
p
x
|
bi
(e)
Neut ral Region
V
N
N
P
P
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-9
4.2.2 Depletion-Layer Width
V is continuous at x =0
If N
a
>> N
d
, as in a P
+
N
junction,
What about a N
+
P junction?
where
density dopant lighter N N N
a d
1 1 1 1
~ + =
|
|
.
|
\
|
+ = =
d a
bi s
dep N P
N N q
W x x
1 1 2 | c
N
d
bi s
dep
x
qN
W ~ =
| c 2
qN W
bi s dep
| c 2 =
(a)
N
P
N
d
N
a
Depletion Layer Neutral Regi on
x
n
0
x
p
(b)
x
x
p
x
n
(c)
qN
d
qN
a
x
x
n
x
p
(d)
(f)
E
c
E
f
E
v
|
bi
,
built-in potential
P
N
0
x
n
x
p
x
|
bi
(e)
Neut ral Region
V
0
~ =
a d N P
N N x x
| | | |
P N
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-10
EXAMPLE: A P
+
N junction has N
a
=10
20
cm
-3
and N
d
=10
17
cm
-3
. What is a) its built in potential, b)W
dep
, c)x
N
,
and d) x
P
?
Solution:
a)
b)
c)
d)
V 1
cm 10
cm 10 10
ln V 026 . 0 ln
6 20
6 17 20
2
~
= =
i
a d
bi
n
N N
q
kT
|
m 12 . 0
10 10 6 . 1
1 10 85 . 8 12 2 2
2 / 1
17 19
14
=
|
|
.
|
\
|
= ~
d
bi s
dep
qN
W
| c
m 12 . 0 = ~
dep N
W x
0 2 . 1 m 10 2 . 1
4
~ = = =
a d N P
N N x x
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-11
4.3 Reverse-Biased PN J unction
density dopant lighter N N N
a d
1 1 1 1
~ + =
Does the depletion layer
widen or shrink with
increasing reverse bias?
+
V
N P
qN
barrier potential
qN
V
W
s r bi s
dep
=
+
=
c | c 2 |) | ( 2
(b) reverse-biased
qV
E
c
E
c
E
fn
E
v
q|
bi
+ qV
E
fp
E
v
(a) V = 0
E
c
E
f
E
v
E
f
E
v
q|
bi
E
c
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-12
4.4 Capacitance-Voltage Characteristics
Is C
dep
a good thing?
How to minimize junction capacitance?
dep
s
dep
W
A C
c
=
N P
N
d
N
a
Conductor Insulator Conductor
W
dep
Reverse biased PN junction is
a capacitor.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-13
4.4 Capacitance-Voltage Characteristics
From this C-V data can N
a
and N
d
be determined?
2 2
2
2
2
) ( 2 1
A qN
V
A
W
C
S
bi
s
dep
dep
c
|
c
+
= =
V
r
1/C
dep
2
Increasing reverse bias
Slope = 2/qNc
s
A
2
|
bi
Capacitance data
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-14
EXAMPLE: If the slope of the line in the previous slide is
2x10
23
F
-2
V
-1
, the intercept is 0.84V, and A is 1 m
2
, find the
lighter and heavier doping concentrations N
l
and N
h
.
Solution:
= ln
2
i
l h
bi
n
N N
q
kT
|
3 18
026 . 0
84 . 0
15
20
2
cm 10 8 . 1
10 6
10
=
= = e e
N
n
N
kT
q
l
i
h
bi
|
Is this an accurate way to determine N
l
? N
h
?
3 15
2 8 14 19 23
2
cm 10 6
) cm 10 10 85 . 8 12 10 6 . 1 10 2 /( 2
) /( 2
=
=
= A q slope N
s l
c
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-15
4.5 J unction Breakdown
A Zener diode is designed to operate in the breakdown mode.
V
I
V
B
, breakdown
P N
A
R
Forward Current
Small leakage
Current
voltage
3.7 V
R
IC
A
B
C
D
Zener diode
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-16
4.5.1 Peak Electric Field
2 / 1
|) | (
2
) 0 (
(
(
+ = =
r bi
s
p
V
qN
|
c
E E
bi
crit s
B
qN
V
|
c
=
2
2
E
N
+
P N
a
Neutral Region
0
x
p
(a)
increasing
reverse bias
x
E
x
p
(b)
increasing reverse bias
E
p
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-17
4.5.2 Tunneling Breakdown
Dominant if both sides of
a junction are very heavily
doped.
V/cm 10
6
~ =
crit p
E E
V
I
Breakdown
Empty States Filled States
-
E
v
E
c
p
e G J
/ H
=
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-18
4.5.3 Avalanche Breakdown
impact ionization: an energetic
electron generating electron and
hole, which can also cause
impact ionization.
qN
V
crit s
B
2
2
E
c
=
Impact ionization + positive
feedbackavalanche breakdown
d a
B
N
1
N
1
N
1
V + =
E
c
E
fn
E
c
E
v
E
fp
original
electron
electron-hole
pair generation
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-19
4.6 Forward Bias Carrier I njection
Minority carrier injection
+
V
N P
E
c
E
f
E
v
E
c
E
fp
E
v
V = 0
E
f n
Forward biased
q|
bi
qV
-
+
q|
bi
qV
V=0
I =0
Forward biased
Drift and diffusion cancel out
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-20
4.6 Forward Bias
Quasi-equilibrium Boundary Condition
kT E E kT E E
c
kT E E
c
fp fn fp c fn c
e e N e N x n
/ ) ( / ) ( / ) (
P
) (
= =
kT qV
P
kT E E
P
e n e n
fp fn
/
0
/ ) (
0
= =
The minority carrier
densities are raised
by e
qV/kT
Which side gets more
carrier injection?
E
c
E
fp
E
v
E
fn
0
N
0
P
x
E
c
E
fn
E
fp
E
v
x
E
fn
x
N
x
P
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-21
4.6 Carrier I njection Under Forward Bias
Quasi-equilibrium Boundary Condition
) 1 ( ) ( ) (
0 0
=
'
kT qV
P P P P
e n n x n x n
) 1 ( ) ( ) (
0 0
=
'
kT qV
N N N N
e p p x p x p
kT V q
a
i
kT V q
P
e
N
n
e n n
2
0
) x
P
(
= =
kT V q
d
i
kT V q
N
e
N
n
e p p
2
0
) (
= =
x
P
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-22
EXAMPLE: Carrier I njection
A PN junction has N
a
=10
19
cm
-3
and N
d
=10
16
cm
-3
. The applied
voltage is 0.6 V.
Question: What are the minority carrier concentrations at the
depletion-region edges?
Solution:
Question: What are the excess minority carrier concentrations?
Solution:
-3 11 026 . 0 6 . 0
0
cm 10 10 ) ( = = = e e n x n
kT V q
P P
-3 14 026 . 0 6 . 0 4
0
cm 10 10 ) ( = = = e e p x p
kT V q
N N
-3 11 11
0
cm 10 10 10 ) ( ) ( = = =
'
P P P
n x n x n
-3 14 4 14
0
cm 10 10 10 ) ( ) ( = = =
'
N N N
p x p x p
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-23
4.7 Current Continuity Equation
t
p
q
x
x J x x J
p p
'
=
A
A +
) ( ) (
t
p
x A
q
x x J
A
q
x J
A
p p
'
A +
A +
=
) ( ) (
t
p
q
dx
dJ
p
'
=
Ax
p
J
p
(x + Ax)
x
a
r
e
a
A
J
p
(x)
Volume = AAx
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-24
4.7 Current Continuity Equation
Minority drift current is negligible;
J
p
= qD
p
dp/dx
L
p
and L
n
are the diffusion lengths
t
p
q
dx
dJ
p
'
=
p
p
p
q
dx
p d
qD
t
'
=
2
2
2 2
2
p
p p
L
p
D
p
dx
p d
'
=
'
=
'
t
p p p
D L t
2 2
2
n
L
n
dx
n d
'
=
'
n n n
D L t
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-25
4.8 Forward Biased J unction-- Excess Carriers
2 2
2
p
L
p
dx
p d
'
=
'
0 ) ( =
'
p
) 1 ( ) (
/
0
=
'
kT qV
N N
e p x p
p p
L x L x
Be Ae x p
/ /
) (
+ =
'
( )
N
L x x
kT qV
N
x x e e p x p
p N
> =
'
, ) 1 ( ) (
/
/
0
P N +
x
P
-x
N
0
x
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-26
( )
P
L x x kT qV
P
x x e e n x n
n P
< =
'
, ) 1 ( ) (
/ /
0
4.8 Excess Carrier Distributions
0.5
1.0
3L
n
2L
n
L
n
0 L
p
2L
p
3L
p
4L
p
N-side
N
d
= 210
17
cm
-3
p
N
' e
x/L
P-side
n
P
' e
x/L
N
a
= 10
17
cm
-3
n
p
( )
N
L x x
kT qV
N
x x e e p x p
p N
> =
'
, ) 1 ( ) (
/
/
0
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-27
EXAMPLE: Carrier Distribution in Forward-biased PN Diode
Sketch n'(x) on the P-side.
3 13 026 . 0 6 . 0
17
20
/
2
0
cm 10
10
10
) 1 ( ) 1 ( ) (
= = = =
'
e e
N
n
e n x n
kT qV
a
i
kT qV
P P
N-type
N
d
= 510
17
cm
-3
D
p
=12 cm
2
/s
t
p
= 1 s
P-type
N
a
= 10
17
cm
-3
D
n
=36.4cm
2
/ s
t
n
= 2 s
x
N-side P-side
10
13
cm
-3
2 10
12
n ( = p )
p ( = n )
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-28
How does L
n
compare with a typical device size?
m 85 10 2 36
6
= = =
n n n
D L t
What is p'(x) on the P- side?
EXAMPLE: Carrier Distribution in Forward-biased PN Diode
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-29
4.9 PN Diode I -V Characteristics
( )
p N
L x x
kT V q
N
p
p
p pN
e e p
L
D
q
dx
x p d
qD J
=
'
= ) 1 (
) (
0
( )
n P
L x x kT V q
P
n
n
n nP
e e n
L
D
q
dx
x n d
qD J
=
'
= ) 1 (
) (
0
x J
e n
L
D
q p
L
D
q x J x J
kT V q
P
n
n
N
p
p
P nP N pN
all at
) 1 ( ) ( ) ( current Total
0 0
=
|
|
.
|
\
|
+ = + =
0
P-side N-side
J
total
J
pN
J
nP
x
0
P-side N-side
J
total
J
pN
J
nP
J
n
=J
total
J
p
J
p
=J
total
J
n
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-30
The PN J unction as a Temperature Sensor
What causes the I V curves to shift to lower V at higher T ?
) 1 (
0
=
kT V q
e I I
|
|
.
|
\
|
+ =
a n
n
d p
p
i
N L
D
N L
D
Aqn I
2
0
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-31
4.9.1 Contributions from the Depletion Region
dep
dep i
leakage
W qn
A I I + =
0
Space-Charge Region (SCR) current
kT qV
i
e n p n
2 /
~ ~
) 1 (
: rate n) (generatio ion recombinat Net
2 /
kT qV
dep
i
e
n
t
) 1 ( ) 1 (
2 / /
0
+ =
kT qV
dep
dep i
kT qV
e
W qn
A e I I
Under forward bias, SCR current is an extra
current with a slope 120mV/decade
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-32
4.10 Charge Storage
What is the relationship between t
s
(charge-storage time)
and t (carrier lifetime)?
x
N-side P-side
10
13
cm
-3
210
12
n'
p
I Q
s
Q I t =
s
I Q t =
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-33
4.11 Small-signal Model of the Diode
kT qV kT qV
e I
dV
d
e I
dV
d
dV
dI
R
G
/
0
/
0
) 1 (
1
~ = =
What is G at 300K and I
DC
= 1 mA?
Diffusion Capacitance:
q
kT
/ I G
dV
dI
dV
dQ
C
DC s s s
t t t = = = =
Which is larger, diffusion or depletion capacitance?
C R V
I
q
kT
I e I
kT
q
DC
kT qV
/ ) (
/
0
= =
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-34
4.12 Solar Cells
Solar Cells is also known
as photovoltaic cells.
Converts sunlight to
electricity with 10-30%
conversion efficiency.
1 m
2
solar cell generate
about 150 W peak or 25 W
continuous power.
Low cost and high
efficiency are needed for
wide deployment.
Part I I : Application to Optoelectronic Devices
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-35
4.12.1 Solar Cell Basics
sc
kT V q
I e I I = ) 1 (
0
V
0.7 V
I
sc Maximum
power-output
Solar Cell
IV
I
Dark IV
0
Eq.(4.9.4)
Eq.(4.12.1)
N
P
-
Short Circuit
light
I
sc
+
(a)
E
c
E
v
Direct-Gap and Indirect-Gap Semiconductors
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-36
Electrons have both particle and wave properties.
An electron has energy E and wave vector k.
indirect-gap semiconductor direct-gap semiconductor
4.12.2 Light Absorption
) (
24 . 1
(eV) Energy Photon
m
hc
=
=
x -
e (x) intensity Light
o
(1/cm): absorption
coefficient
1/ : light penetration
depth
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-37
A thinner layer of direct-gap semiconductor can absorb most
of solar radiation than indirect-gap semiconductor. But Si
4.12.3 Short-Circuit Current and Open-Circuit Voltage
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-38
Ax
p
J
p
(x + Ax)
x
a
r
e
a
A
J
p
(x)
Volume = AAx
If light shines on the N-type
semiconductor and generates
holes (and electrons) at the
rate of G s
-1
cm
-3
,
p p
D
G
L
p
dx
p d
'
=
'
2 2
2
If the sample is uniform (no PN junction),
d
2
p/dx
2
=0 p =GL
p
2
/D
p
=Gt
p
Solar Cell Short-Circuit Current, I
sc
p
L x
p
p
p
p p
Ge
L
D
q
dx
x p d
qD J
/
) (
=
'
= t
G
D
G
L p
p
p
p
t = =
'
2
) (
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-39
) 1 ( ) (
/
p
L x
p
e G x p
=
'
t
0 ) 0 ( =
'
p
Assume very thin P+ layer and carrier generation in N region only.
G AqL AJ I
p p sc
= = ) 0 (
x
N P
+
I
sc
0
x
P'
L
p
G
p
t
0
G is really not uniform. L
p
needs be larger than the light
penetration depth to collect most of the generated carriers.
Open-Circuit Voltage
G AqL e
L
D
N
n
Aq I
p
kT qV
p
p
d
i
= ) 1 (
/
2
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-40
1) e (assuming
/ qV
oc
>>
kT
Total current is I
SC
plus the PV diode (dark) current:
Solve for the open-circuit voltage (V
oc
) by setting I=0
G L e
L
D
N
n
p
kT qV
p
p
d
i
oc
=
/
2
0
) / ln(
2
i d p oc
n GN
q
kT
V t =
How to raise V
oc
?
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-41
4.12.4 Output Power
FF V I
oc sc
= er Output Pow
Theoretically, the highest efficiency (~24%) can be obtained with
1.9eV >Eg>1.2eV. Larger Eg lead to too low Isc (low light
absorption); smaller Eg leads to too low Voc.
Tandem solar cells gets 35% efficiency using large and small Eg
materials tailored to the short and long wavelength solar light.
A particular operating point on the
solar cell I-V curve maximizes the
output power (I V).
m
(V)
|
Bn
+ |
Bp
~ E
g
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-57
A high density of
energy states in the
bandgap at the metal-
semiconductor interface
pins E
f
to a narrow
range and |
Bn
is
typically 0.4 to 0.9 V
Question: What is the
typical range of |
Bp
?
Fermi Level Pinning
q |
Bn E
c
E
v
E
f
E
0
q
M
_
Si
= 4.05 eV
Vacuum level,
+
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-58
Schottky Contacts of Metal Silicide on Si
Silicide-Si interfaces are more stable than metal-silicon
interfaces. After metal is deposited on Si, an annealing step is
applied to form a silicide-Si contact. The term metal-silicon
contact includes and almost always means silicide-Si contacts.
Silicide: A silicon and metal compound. It is conductive
similar to a metal.
Silicide ErSi
1.7
HfSi MoSi
2
ZrSi
2
TiSi
2
CoSi
2
WSi
2
NiSi
2
Pd
2
Si PtSi
| Bn
(V) 0.28 0.45 0.55 0.55 0.61 0.65 0.67 0.67 0.75 0.87
| Bp
(V) 0.55 0.49 0.45 0.45 0.43 0.43 0.35 0.23
|
Bn
|
Bp
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-59
Using C-V Data to Determine |
B
A
W
C
qN
V
W
N
N
kT q
E E q q
dep
s
d
bi s
dep
d
c
Bn
f c Bn bi
c
| c
|
| |
=
+
=
=
=
) ( 2
ln
) (
Question:
How should we plot the CV
data to extract |
bi
?
E
v
E
f
E
c
q|
bi
q|
Bn
E
v
E
c
E
f
q|
Bn
q(|
bi
+ V)
qV
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-60
Once |
bi
is known, |
B
can
be determined using
2 2
) ( 2 1
A qN
V
C
s d
bi
c
| +
=
d
c
Bn f c Bn bi
N
N
kT q E E q q ln ) ( = = | | |
Using CV Data to Determine |
B
V
1 /C
2
|
bi
E
v
E
f
E
c
q|
bi
q|
Bn
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-61
4.17 Thermionic Emission Theory
2 / /
0
/ / 2
3
2
/ ) (
2 / 3
2
/ ) (
A/cm 100 where ,
4
2
1
/ 2 / 3
2
2
kT q
o
kT qV
kT qV kT q
n
thx M S
n thx n th
kT V q
n
kT V q
c
B
B
B B
e J e J
e e T
h
k qm
qnv J
m kT v m kT v
e
h
kT m
e N n
|
|
| |
t
t
t
~ =
= =
= =
(
= =
E
fn
-
q( |
B
V)
q |
B
qV
Metal
N-type
Silicon
V
E
fm
E
v
E
c
x
v
thx
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-62
4.18 Schottky Diodes
V
I
Reverse bias Forward bias
V = 0
Forward
biased
Reverse
biased
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-63
) 1 (
) K A/(cm 100
4
/
0 0
/
0
2 2
3
2
/ 2
0
= = + =
~ =
=
kT qV kT qV
S M M S
n
kT q
e I I e I I I I
h
k qm
K
e AKT I
B
t
|
4.18 Schottky Diodes
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-64
4.19 Applications of Schottly Diodes
I
0
of a Schottky diode is 10
3
to 10
8
times larger than a PN
junction diode, depending on |
B
. A larger I
0
means a smaller
forward drop V.
A Schottky diode is the preferred rectifier in low voltage,
high current applications.
I
V
PN junction
Schottky
|
B
I
V
PN junction
Schottky diode
|
B
diode
kT q
kT qV
B
e AKT I
e I I
/ 2
0
/
0
) 1 (
|
=
=
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-65
Switching Power Supply
AC
DC AC AC
DC
utility
power
110V/220V
PN Junction
rectifier
Hi-voltage
MOSFET
inverter
100kHz
Hi-voltage
Transformer
Schottky
rectifier
Lo-voltage
50A
1V
feedback to modulate the pulse width to keep V
out
= 1V
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-66
There is no minority carrier injection at the Schottky
junction. Therefore, Schottky diodes can operate at higher
frequencies than PN junction diodes.
4.19 Applications of Schottky diodes
Question: What sets the lower limit in a Schottky diodes
forward drop?
Synchronous Rectifier: For an even lower forward drop,
replace the diode with a wide-W MOSFET which is not
bound by the tradeoff between diode V and leakage current.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-67
4.20 Quantum Mechanical Tunneling
) ( ) (
8
2 exp
2
2
E V
h
m
T P
H
~
t
Tunneling probability:
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-68
4.21 Ohmic Contacts
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-69
d Bn
N V H
n d thx d M S
n s
d Bn s dep
e m kT qN P v qN J
q m
h
H
qN W T
/ ) (
2 /
2
1
/
4
2 / 2 /
= ~
=
= ~
|
t
c
t
| c
4.21 Ohmic Contacts
d
Bn s
dep
qN
W
| c 2
=
d Bn
N H
e P
|
~
Tunneling
probability:
- -
x
Silicide N
+
Si
E
v
E
c
, E
f
|
Bn
- -
x
V
E
fm
E
v
E
c
, E
f
|
Bn
V
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-70
2
/
/
1
cm
2
=
|
.
|
\
|
d Bn
d Bn
N H
d thx
N H
M S
c
e
N H qv
e
dV
dJ
R
|
|
4.21 Ohmic Contacts
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-71
4.22 Chapter Summary
The potential barrier
increases by 1 V if a 1 V
reverse bias is applied
junction capacitance
depletion width
2
ln
i
a d
bi
n
N N
q
kT
= |
qN
barrier potential
W
s
dep
=
c 2
dep
s
dep
W
A C
c
=
Part I : PN J unction
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-72
4.22 Chapter Summary
Under forward bias, minority carriers are injected
across the jucntion.
The quasi-equilibrium boundary condition of
minority carrier densities is:
Most of the minority carriers are injected into the
more lightly doped side.
kT V q
P p
e n x n
0
) ( =
kT V q
N N
e p x p
0
) ( =
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-73
4.22 Chapter Summary
Steady-state
continuity equation:
Minority carriers
diffuse outward e
|x|/L
p
and e
|x|/L
n
L
p
and L
n
are the
diffusion lengths
2 2
2
p
p p
L
p
D
p
dx
p d
'
=
'
=
'
t
p p p
D L t
) 1 (
0
=
kT V q
e I I
|
|
.
|
\
|
+ =
a n
n
d p
p
i
N L
D
N L
D
Aqn I
2
0
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-74
4.22 Chapter Summary
q
kT
/ I G
DC
=
Charge storage:
Diffusion capacitance:
Diode conductance:
G C
s
t =
s
I Q t =
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-75
4.22 Chapter Summary
Part I I : Optoelectronic Applications
~100um Si or <1um directgap semiconductor can absorb most of solar
photons with energy larger than E
g
.
Carriers generated within diffusion length from the junction can be
collected and contribute to the Short Circuit Current I
sc
.
Theoretically, the highest efficiency (~24%) can be obtained with 1.9eV
>E
g
>1.2eV. Larger E
g
lead to too low I
sc
(low light absorption); smaller E
g
leads to too low Open Circuit VoltageVoc.
FF V I
oc sc
= power cell Solar
Si cells with ~15% efficiency dominate the market. >2x cost reduction
(including package and installation) is required to achieve cost parity with
base-load non-renewable electricity.
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-76
4.22 Chapter Summary
Electron-hole recombination in direct-gap semiconductors such as GaAs
produce light.
Beyond displays, communication, and traffic lights, a new application is
space lighting with luminous efficacy >5x higher than incandescent lamps.
White light can be obtained with UV LED and phosphors. Cost still an issue.
LED and Solid-State Lighting
Tenary semiconductors such as GaAsP provide tunable E
g
and LED color.
Quatenary semiconductors such as AlInGaP provide tunable E
g
and lattice
constants for high quality epitaxial growth on inexpensive substrates.
Organic semiconductor is an important low-cost LED material class.
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-77
4.22 Chapter Summary
Light is amplified under the condition of population inversion states at
higher E have higher probability of occupation than states at lower E.
When the round-trip gain (including loss at reflector) exceeds unity, laser
threshold is reached.
Laser Diodes
Population inversion occurs when diode forward bias qV > E
g
.
Optical feedback is provided with cleaved surfaces or distributed Bragg
reflectors.
Quantum-well structures significantly reduce the threshold currents.
Purity of laser light frequency enables long-distance fiber-optic
communication. Purity of light direction allows focusing to tiny spots and
enables DVD writer/reader and other application.
Modern Semiconductor Devices for Integrated Circuits (C. Hu) Slide 4-78
4.22 Chapter Summary
Part I I I : Metal-Semiconductor J unction
Schottky diodes have large reverse saturation current, determined by the
Schottky barrier height |
B
, and therefore lower forward voltage at a given
current density.
kT q
B
e AKT I
/ 2
0
|
=
2
) /
4
(
cm
d n s B
qN m
h
c
e R
c |
t
Ohmic contacts relies on tunneling. Low resistance contact requires
low |
B
and higher doping concentration.
Modern Semiconductor Devices for Integrated Circuits (C. Hu)
Slide 4-79
|
Bn
I ncreases with I ncreasing Metal Work Function
q |
Bn
E
c
E
v
E
f
E
0
q
M
_
Si
= 4.05 eV
Vacuum level,
Ideally,
|
Bn
=
M
_
Si