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Adsorption Mechanism
Adsorption Mechanism
The
rearrangement
of the
electronic
shell during
chemisorption
may lead to physisorption
dissociative
dissociative adsorption
adsorption
Work Function change induced by adsorption
Different material have
different f. Moreover,
chemisorption change the
charge distribution and cause f
change. For semiconductor
even band bending is changed.
Describe the
inter-particle
potential
dN p
Adsorption rate: uS S
dt 2mkT
dN d
Coverage then: udt S dt Or S 2mkT / p
dt dt
In case for activated adsorption, S as function:
S ( ) f ( ) exp( Eact / kT )
Condensation coefficient Occupation factor
Adsorption isotherm
Together with adsorption process, there is desorption process which can
be described by description rate:
v ( ) f ( ) exp( Edes / kT )
Desorption efficient Occupation factor
Adsorption isotherm describe the equilibrium adsorbate coverage at
certain temperature between adsorption and desorption: u = v
f ( ) 1 f ( ) More
p 2mkTe EB / kT complcated
f ( ) A f ( ) when
For non-dissociative adorpstion: f()=1- adsorbate
And f()=. Therefore, atoms allow
adsorption
Ap
( p)
1 AP
Curves tell the strength of
the adsorption
Surface Diffusion
The adsorbate atoms on the surface although lost some kinetic energies
to the substrate after adsorption, it can vibrate in potential well with
frequency n0 and also hop (surface diffusion) from one site to the
neighbor site with frequency n:
1
n n 0 exp( E (diff ) / kT )
z
z is the number of possible neighboring wells.
Ordered monolayers can only form if surface diffusion is high.
Typically, ~ 1013 s-1 and E(diff) 100-300 kJmol-1
Film epitaxy
The expression epitaxy has been introduced on a geometrical basis. It
characterizes the oriented growth of a material A on top of a crystalline
substrate B. If A and B are the same material, the growth is called
homoepitaxy. Otherwise, it is called heteroepitaxy.
For equilibrium
condition
Bauers criteria: Dg=ga+gab-gb
Dg < 0 Layer-by-layer growth (Frank-van der Merwe (FM))
Dg > 0 Island growth (Vollmer-Weber mode)
Dg is function of thickness, initially Dg < 0 then Dg > 0
Transition layer/island growth(Stranski-Krastanov mode)
Growth kinetics
the microscopic kinetic processes taking place at the surface:
Adsorption from the vapor phase
Surface diffusion followed by binding or re-desorption
Nucleation of 2-dimensional or 3-dimensional cluster
Capture by an existing cluster or surface defect sites (steps)
Interdiffusion with the substrate
in most cases the growth are done at relatively low temperature and high
deposition rate. Even thermodynamics favors 3-dimensional islands formation,
monolayer-like growth can be approached by reducing atomic mobility and so that
the equilibrium shape cannot form. The growth modes also depends on defects.
Surfactant-to achieve FM growth
The interlayer mass transport is a
prerequisit for layer-by-layer growth,
however, the potential barrier can
prevent such mass transport.
Surfactant is a contaminant
which, when deposited once,
promotes a smoother growth.
Possible mechanisms:
Surfactant decorate edges and reduce the step-edge barrier
It induce a potential energy gradient to attract deposited atoms toward the steps.
It reacts as nucleation centers by attracting adatoms to increase the island density.
Surfactant atoms are practically immobile on the surface and act repulsively to
deposited diffusing adatoms.
Some examples for surfactant
No crucible is
necessary and
can fast reach
extremely high
temperature.
Magnetron Sputtering (MS)
Sputter sources for film deposition can be categorized in two ways: glow
discharge and ion beam. Magnetron Sputtering belongs to the first category. In
all cases, atoms are removed from the target by momentum transfer from the
incident ions with a large accelerating energy to the surface atoms of target
material, then the sputtered atoms for the film growth.
(c)
The plasma is important for glow discharge sputtering process and is typically
formed by partially ionizing a gas at a pressure well bellow atomspheric
(normally from 0.1 to 1000 mtorr). For the most part, these plasmas are very
weakly ionized, with an ionization ration of 10-5 to 10-1. Plasmas are
generally neutral, in that in the body of the plasma there are roughly
equal numbers of electrons and ions. They are conductive with the
dominant charge carriers: the electrons. There are generally three types
for plasma generation: excited between two powered electrode;
application of electric fields, typically through an insulator; injection of
large currents of electrons to ionize the gas particle.
Dc/rf sputtering
Dc diode sputtering with typical voltages 3-5 kV and a current from 50-250
mA at a pressure of 50-250 mtorr. For deposition purpose, the target material
will be use as cathode and samples are placed on the anode or nearby. It is
slow, and it needs high gas density, high discharge voltage, and
conductive target as the cathode (no insulator for dc sputtering).
Rf sputtering is more easily to be used with low gas density and low
voltage, and works with insulator too. The reason is the quickly change
polarity of the E field with MHz, the electron will quickly react and to
compensate any charging on the sample surface, while the ion with big
mass is still sputtering.
The bias in RF sputtering
Due to the rather bigger mass than electron, the powered electrode will
in the first several cycles collect more electrons than ions, therefore,
there will be a negative dc bias generated, which prevent electrons be
further collected and only ions will be accelerated by the dc bias
toward the electrode (the material needed to be sputtered) and less
influenced by rf field. This bias is just half of the voltage of rf
oscillation.
Magnetron Sputtering (MS)
Charged particles will have drift
motion in the presence of E and B
with drift velocity:
Vdrift = E/B
Electrons circles in a too large
circles compared with chamber
size, but ions will circle and drift
inside the chamber.
Pulsed laser radiation is used vaporize materials and collect the vapor onto a
substrate. The laser-solid interaction leads to evaporation, ablation, plasma
formation, and exfoliation. The plume generated by the laser beam consists of
mixture of energetic species including atoms, molecules, electrons, ions,
clusters and even micron-sized particulates.
Pulse Laser Deposition (PLD)
Schematic diagram for three fluence levels on the target surface. (a) At low
fluence ripple formation. (b) At higher fluence, surface uniformly melted and
larger scale capillary waves develop. (b) At PLD fluence, melt depth is
greater and vaporization occurs, and capillary waves still form This change
of morphology will strongly influenced the stability of the growth rate.
A series of plots of
deposition rate versus
exposure for different YBCO
target density. They all show
a clear decay.
Summary of the three deposition techniques
b. Auger/XPS/absorption, etc,
have certain free path length,
which can be used to study the
thickness.
thin films are deposited on a substrate from vapor phase precursors through chemical
reactions at the surface, CVD involves many coupled processes, including fluid flow,
heat and mass transfer, chemical kinetics, and nucleation and growth of the film on the
substrate
CVD versus physical depostion
Compared to other deposition techniques the CVD method is
perhaps the most complex.
Unlike growth by physical deposition such as evaporation or
MBE, this method requires numerous test runs to reach suitable
growth parameters, especially for single-crystal growth.
The complexity of this method results from the facts that:
(i) it generally includes multicomponent species in the
chemical reactions,
(ii) the chemical reactions generally produce intermediate
products,
(iii) the growth has numerous independent variables, and
(iv) the growth includes more consecutive steps than in
physical methods.
CVD process
CVDthermally activated (or pyrolytic) chemical vapour deposition;
MOCVDmetalorganic CVD;
PCVDphoto CVD;
PECVDplasma-enhanced CVD;
ALEatomic layer epitaxy.