Professional Documents
Culture Documents
FRIDAYPPT
FRIDAYPPT
EXTREME-ULTRAVOILET-
LITHOGRAPHY
Submitted by:
ALEKHYA .K
(16KF1AO416)
CONTENTS
INTRODUCTION- What is this all about?
Is there a problem with current technology?
Moore’s law and Problem with Moore’s law
Lithography
Introduction to EUVL
Basic concepts
Why do we need EUVL?
EUVL Process
Basic technology for EUV
EUV masks
All Reflective Optics
Advantages
Disadvantages
Conclusion
WHAT IS LITHOGRAPHY
All-reflective optics
(all lens materials are
opaque)
EUV MASKS
All-Reflective Optics
All solids, liquids, and gases absorb 13.5nm
photons
- So fused silica lenses are OUT …
- Indeed, all refracting lenses are OUT
www.google.com
www.wikipedia.com
www.studymafia.org
THANKS