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Ic Fabrication Ansaf Rmah
Ic Fabrication Ansaf Rmah
Oxidation
Photo-
lithography
Etching
Diffusion (Ion
Implantation)
STEPS INVOLVED IN IC FABRICATION
1. Silicon wafer (substrate) preparation
2. Epitaxial growth
3. Oxidation
4. Photolithography
5. Diffusion
6. Ion implantation
7. Isolation technique
8. Metallization
9. Assembly processing & packaging
WAFER MANUFACTUR
1200oC
SiCl+ 2H <-----------> Si + 4 HCl
Oxidation
SiO2 is an extremely hard protective coating & is
unaffected by almost all reagents except by
hydrochloric acid.
field oxide
oxide
silicon substrate
Photolithography
Photolithography
is a technique that
is used to define
the shape of
micro-machined
structures on a
wafer. The same
Mapping
Ion implantation technique