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CMOS Layout Design: Dr. Zakir Ali, Asstt. Prof - Deptt. OF ECE
CMOS Layout Design: Dr. Zakir Ali, Asstt. Prof - Deptt. OF ECE
CMOS Layout Design: Dr. Zakir Ali, Asstt. Prof - Deptt. OF ECE
03/04/21 Layout-design
Lect-8,
FABRICATION OF MOSFET
Introduction
IC technologies :
• NMOS
• PMOS
• CMOS
• SOI
• BiCMOS
• GaAs
• Wafer Processing.
• Mask making.
• Photolithography.
• Oxidation.
• Diffusion.
• Etching.
• Poly-gate formation.
• Metallization.
Mask making :
• After complete design the drawing is broken
into subsequent IC processing steps.
• These steps are called mask levels.
• Electron beam machine known as pattern
generator is used for mask making.
• The interface is CIF between layout and mask
machine.
• Mask machine transfers design features
directly on photosensitive glass plate using
CIF.
03/04/21 Layout-design Lect-8,
1. Photoresist Coating.
2. Pre baking.
4. Development.
5. Post baking.
Goal :
1. Control of impurity concentration.
2. Uniformity.
3. Reproducibility.
Metallization :