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Vacuum Subsystem Electron Gun Subsystem Electron Lens Subsystem Sample Stage More Electron Lenses Viewing Screen W/scintillator Camera Chamber
Vacuum Subsystem Electron Gun Subsystem Electron Lens Subsystem Sample Stage More Electron Lenses Viewing Screen W/scintillator Camera Chamber
Vacuum Subsystem
Sample Stage
Camera Chamber
c
= ilament saturation
= ilament centering
= Spot size (Condenser
Lens Current)
= Condenser aperture
°
c
= Control objective lens current
= djust astigmatism correction coils too
= se large screen at low mags
= se small screen at high mags
= eware of lingering on an area too long
= terate focus and stigmators
= Can take through-focus-series
ocusing on a hole in a thin carbon film
( resnel ringes)
( rom gar,p.137).
h
± Electron scattering
= Random
± morphous materials change electron
trajectories
= Regular
± Crystalline materials change trajectories
uniformly
= Most of the beam is N S
± Goes right through the sample unperturbed
± better resolution
×,000 10.0
×0,000 1.0
50,000 0.4
100,000 0.×
= Low intensity situations lead to longer
exposure times
Diffraction Mode
4 °
= f the main portion of the near-forward
scattered beam is used to form the image
± transmitted beam
± 000 beam
± zero-order beam
°
= f the transmitted beam is
excluded from the image
formation process
± off-axis imaging
± tilted beam imaging
c
= Think of TEM as a
diffraction camera
Rd=¬L
R is measured Transmitted eam
d is the unknown L
¬ is the electron wavelength Diffracted eam
L is the camera length
¬L is the camera constant)
Rd=¬L
R=0.0×750mm/×.35
c
Electron Diffraction
TEM maging Modes: Diffraction vs
Metal particles Polymer mix Electron Diffraction
TEM mages