Professional Documents
Culture Documents
I Introduction and Motivation Ii Porous Alumina Masks Iii Results Iv Conclusions V Nanolab Experiments
I Introduction and Motivation Ii Porous Alumina Masks Iii Results Iv Conclusions V Nanolab Experiments
Outline
http://www.intel.com/research/silicon/mooreslaw.htm
OU NanoLab/NSF NUE/Bumm & Johnson
Semiconductor Roadmap
Year 1999 2002 2005 2008 2011 2014
Technology 180 130 100 70 50 35
Generation (nm)
DRAM Half Pitch 180 130 100 70 50 35
(nm)
MPU Gate Length 140 85-90 65 45 30-32 20-22
(nm)
Gate Oxide 1.9-2.5 1.5-1.9 1-1.5 0.8-1.2 0.6-0.8 0.5-0.6
Thickness (nm)
MPU transistor 6.6 M 18 M 44 M 109 M 269 M 664 M
-2
density (cm )
MPU Speed 1250 2100 3500 6000 10000 16903
(MHz)
Cost/transistor 1735 580 255 110 49 22
(microcents)
Important characteristics of “The 1999 National Technology Roadmap
for Semiconductors” published by the SIA.
Purpose:
To understand the mechanisms involved in the growth and ordering of
anodic porous alumina.
Motivation:
Interest in using anodic porous alumina as a nano- template to
fabricate nanometer-sized structures (e.g. nanofabrication of quantum
dots).
Why do we want to fabricate nanostructures?
1. Fundamental physical interest in the nanometer size regime. Properties of
nano-sized structures are different from their bulk and molecular counterparts.
2. Technological applications as electronic and optical devices.
OU NanoLab/NSF NUE/Bumm & Johnson
Motivation: Applications
Commercially available
1. Physics: Anopore filter.
http://www.2spi.com/catalog/s
Explore optical, electrical, and pec_prep/filter2.html
optical circuits.
Template for carbon
nanotube growth for
electronic, mechanical
applications.
Ordered arrays of Ordered arrays of carbon
quantum dots for lasers, nanotubes fabricated using a
photodetectors. porous alumina template.
J. Li, et al., Appl. Phys. Lett.
ULSI memory devices 75(3), 367 (1999).
and ICs.
OU NanoLab/NSF NUE/Bumm & Johnson
Overview of Anodic Oxide Films
Fabrication
Anodize aluminum in electrolyte
(e.g. Oxalic Acid)
Resulting Structure
{ 2 H 2 O 2O 2 4 H
( aq ) }
Ordered Oxalic
Near-Ordered Sulfuric
5. Remove Al Substrate in a
saturated HgCl2 solution. 5.
6. Remove the barrier layer in
5 wt.% Phosphoric Acid. 6.
7. Remove collodion and place
alumina on desired 7.
substrate.
OU NanoLab/NSF NUE/Bumm & Johnson H. Masuda et al. , Jpn. J. Appl. Phys. 35, L126 (1996).
Pattern Transfer Techniques: Results
1. Etching Processes
Fluorine Beam Ion Beam
Transfer mask pattern via etching into Transfer mask pattern via ion etching
substrate for ordered arrays of into substrate for ordered arrays of
trenches. trenches or pillars.
2. Growth Processes
Sputtering and Thermal
Deposition
Transfer mask pattern via deposition
onto substrate for ordered arrays of
dots.
50 nm
200 nm
Walls are ~30 nm thick (near top).
OU NanoLab/NSF NUE/Bumm & Johnson
Ion Etched Array of GaAs Nano-Holes
SAMPLE: ~500nm thick Free-Standing
AAO/GaAs(100)
ION BEAM: 500 eV Ar+, 0.05 mA/cm2
Time = 2hrs. 12min.
PORES: Width 50 nm, Depth 50-60 nm
Height (nm)
12
10 ~60 nm
8
6
4
3-D 2
Rendered Height: 12 nm 11%0
Diameter: 60 nm 9% 0 100 200 300 400 500
Note: No Fe
remaining.
Collaboration with
Dr. Shen Zhu of
Marshall Space
Flight Center.
Future
Make pores smaller (to 5 nm) using sulfuric acid electrolytes and low temp.
anodization.
Seed for carbon nanotube growth.
Explore optical, electrical, and magnetic properties of nanostructures.
Explore ways to transfer single or arbitrary dot/trench patterns.
Fabricate such nanostructures in situ in multichamber MBE system.
OU NanoLab/NSF NUE/Bumm & Johnson
NanoLab Class: AAO Templated Structures
• Characterize Samples
– AFM -both samples
– SEM of Au dots on Silicon.
– UV-Vis of Au dots on Quartz.
OU NanoLab/NSF NUE/Bumm & Johnson