Professional Documents
Culture Documents
Improvement of Spontaneous Emission Factor of Quantum Dot Based Laser Using Inn
Improvement of Spontaneous Emission Factor of Quantum Dot Based Laser Using Inn
Presented by:
Md. Abdur Rahim (173800022)
K.M Shadat Islam Shebli (173800026)
Roni Talukder (173800033)
Supervised by:
Dr. Md. Abdullah Al Humayun
Associate Professor, Department of EEE
Eastern University, Bangladesh
2 OUTLINE
INTRODUCTION
PROBLEM STATEMENT
OBJECTIVE
METHODOLOGY
RESULT AND DISCUSSION
CONCLUSION
FUTURE SCOPE
3 INTRODUCTION
Spontaneous Emission Factor (C) is the ratio of spontaneous emission to stimulated emission.
Firstly , in this research work we highlights the effect of a) Wavelength b) Energy band gap and c)
Effective density of states on spontaneous emission factor and Its rate of change using InN, GaN and
AlN semiconductor based QD, QWR and QW as the active layer material of LASER structure and its
performances.
Secondly, we also highlight that there is no effect of temperature on spontaneous emission factor on
QD based laser.
Finally, from the outcome of the comparative analysis through numerical approach it is ascertained that
Indium Nitride (InN) based Quantum Dot is the most promising material for the active layer material
of laser structure.
4 LASER FUNDAMENTALS
The word "laser" is an acronym for “Light Amplification by Stimulated Emission of Radiation”.
A laser is a device that emits light through a process of optical amplification based on the
In the life science, medical science, communication system and even in nuclear fusion and many
OBJECTIVE
To achieve high spontaneous emission factor of QDL
To achieve reasonable rate of change of spontaneous emission factor of QDL
To achieve better stability of spontaneous emission factor at with respect to wavelength,
temperature and Energy bandgap.
Start
6
FLOWCHART
Literature Review
Problem Statement
Numerical
Modelling
Report
End
7 TYPE OF SEMICONDUCTOR MATERIALS
Figure 2: Schematic diagram of the DOS in the CB, VB for a (a) Bulk, (b) QW, (c) QWR, and (d) QD laser
8 DECIVE STRUCTURE
Contact layer
Guiding layer
Guiding layer
Contact layer
substrate
1.8 µm3
c 3×10^8 m/s
Confinement factor, Γr =
h 6.63×10-34 (JS)
11 Table 3: Numerical values of different types of materials parameter.
0.1 0.05
0.1
0 0
0 0 0.5 1 1.5 2
0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2
Wavelength (m) Wavelength (m) Wavelength (m)
Figure 4.1 Wavelength dependence of Figure 4.2 Wavelength dependence of Figure 4.3 Wavelength dependence of
spontaneous emission factor using InN spontaneous emission factor using AlN based spontaneous emission factor using GaN
based QD, QWR and QW as the active QD, QWR and QW as the active layer based QD, QWR and QW as the active layer
layer material. material.
material.
13
15 RESULT AND DISCUSSION
Spontaneous Emission Factor vs Wavelength Rate of change of Spontaneous Emission Factor vs Wavelength
4.5
1.5
2.5
2
1
1.5
1
0.5
0.5
0 0
0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 0 0.5 1 1.5 2
Wavelength (m) Wavelength (m)
Figure 5.1 Wavelength dependence of spontaneous Figure 5.2 Wavelength dependence of the rate of change of
emission factor using AlN, InN, and GaN based QD spontaneous emission factor using AlN, InN, and GaN based
as the active layer material. QD as the active layer material.
14 RESULT AND DISCUSSION
16
Spontaneous Emission Factor vs Energy band gap for InN Spontaneous Emission Factor vs Energy band gap for AlN Spontaneous Emission Factor vs Energy band gap for GaN
1.4 3.5 0.5
QW QW QW
QWR QWR 0.45 QWR
1.2 3 QD QD
QD
0.4
1 2.5 0.35
Spontaneous Emission Factor (C)
0.15
0.4 1
0.1
0.2 0.5
0.05
0 0 0
0 1 2 3 4 5 6 7 0 1 2 3 4 5 6 7 0 1 2 3 4 5 6 7
Energy band gap (eV) Energy band gap (eV) Energy band gap (eV)
Figure 6.1 Energy band gap dependence of Figure 6.3 Energy band gap dependence of
Figure 6.2 Energy band gap dependence of
spontaneous emission factor using InN spontaneous emission factor using GaN
spontaneous emission factor using AlN based
based QW, QWR & QD as the active layer based QD, QWR and QW as the active layer
QD, QWR and QW as the active layer material.
material. material.
15 17
RESULT AND DISCUSSION
Spontaneous Emission Factor vs Energy band gap Spontaneous Emission Factor vs Energy band gap
10
GaN 3.5 0.014
S pontaneous E m ission F actor (C )
4 1.5 0.006
3
1 0.004
2
0.5 0.002
1
0 0 0
0 1 2 3 4 5 6 7 0.5 1 1.5 2 2 3 4 5 6 7
Energy band gap (eV) Energy band gap (eV)
Figure 7.1 Energy band gap dependence spontaneous Figure 7.2 subplot of Energy band gap dependence spontaneous
emission factor of QDL using AlN, InN and GaN based emission factor of QDL using AlN, InN and GaN based QD as the
QD as the active layer material. active layer material.
16
18
RESULT AND DISCUSSION
Spontaneous Emission Factor vs Energy band gap
3.5 0.014 Rate of change of Spontaneous Emission Factor vs Energy bandgap
30 0.03
GaN GaN
GaN GaN
3 AlN 0.012 AlN AlN AlN
InN InN 25 0.025
InN InN
2.5 0.01
20 0.02
15 0.015
1.5 0.006
SpontaneousEm
1 0.004 10 0.01
0 0 0 0
0.5 1 1.5 2 2 3 4 5 6 7 0.5 1 1.5 2 2 3 4 5 6 7
Energy band gap (eV) Energy bandgap (eV)
0
Spontaneous Emission Factor (C)
0.5 1 1.5 2
50
GaN
0
0.5 1 1.5 2
4
x 10
4
InN
2
0
0.5 1 1.5 2
-
Effective density of states (cm 3)
Figure 9.1 Effective density of states dependence Figure 9.2 Presents the effect of temperature on the
the spontaneous emission factor of QDL using AlN, spontaneous emission factor using AlN, InN, and GaN
InN and GaN based QD as the active layer material. based QD in the active layer of the laser structure.
18 CONCLUSION
THANK YOU