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Optical Communication System
Optical Communication System
• The capacitance of PIN diode is independent of bias level as the net charge is
said to be very less in the intrinsic layer
• PIN diode possesses very low reverse recovery time
• The Diode obeys the standard diode equation for all the low-frequency
signals.
• This diode appears more like a resistor than any other non-linear device and
is said to produce no distortion or rectification.
Structure and Working of a PIN Diode
• The PIN diode comprises a semiconductor diode having three layers naming the
P-type layer, Intrinsic layer and N-type layer, as shown in the figure below.
• The P and N regions are there, and the region between them consists of the
intrinsic material, and the doping level is said to be very low in this region.
• The thickness of the intrinsic layer is very narrow, which ranges from 10 – 200
microns. The P region and the N-type regions are known to be heavily doped.
• The PIN diode is a one type of photo detector, used to convert optical
signal into an electrical signal.
• The PIN diode comprises of three regions, namely P-region, I-region and
N-region.
• Typically, both the P and N regions are heavily doped due to they are
utilized for Ohmic contacts.
• The intrinsic region in the diode is in contrast to a PN junction diode. This
region makes the PIN diode a lower rectifier, but it makes it appropriate
for fast switches, attenuators, photo detectors and applications of high
voltage power electronics
• The changes in the properties of the diode are known from the intrinsic
material.
• These diodes are made of silicon.
• The intrinsic region of the PIN diode acts like an inferior rectifier which is used
in various devices such as attenuators, photodetectors, fast switches, high
voltage power circuits, etc.
Application of PIN diode :
• These diodes are used in the RF and also for microwave switches and
microwave variable attenuators since they are said to have low capacitance.
• They are used in Photodetectors and photovoltaic cells, and the PIN
photodiodes are used for fibre optic network cards and switches.
• These diodes are effectively used for RF protection circuits, and they can also
be utilized as an RF switch.
• The PIN photodiode is also used to detect X-rays and gamma rays photons
• A simple way to increase the depletion-region width is to insert a layer of
undoped (or lightly doped) semiconductor material between the p–n
junction.
• Since the middle layer consists of nearly intrinsic material, such a structure
is referred to as the p–i–n photodiode .
• When photon enters photo detector, the low band gap absorption layer
absorbs the photon, and an electron-hole pair is generated. This electron
hole pair is called photo carrier.
• These photo carriers, under the influence of a strong electric field generated
by a reverse bias potential difference across the device as shown in figure
produce photocurrent proportional to number of incident photons.
Energy-Band diagram for a pin
photodiode
• An incident photon is able to boost an electron to the conduction
band only if it has an energy that is greater than or equal to the
bandgap energy
• Beyond a certain wavelength, the light will not be absorbed by the
material since the wavelength of a photon is inversely proportional to
its energy
• Thus, a particular semiconductor material can be used only over a
limited wavelength range
PIN energy-band diagram
Optical power absorbed, P(x), in the depletion region can be written in terms of incident optical power, Pin :
Absorption coefficient αs (λ) strongly depends on wavelength. The upper wavelength cut-off for any semiconductor
can be determined by its energy gap as follows:
Taking entrance face reflectivity into consideration, the absorbed power in the width of depletion region, w, becomes:
Ip / q Ip q
mA/mW
P0 / h P0 h