Leakage Reduction Techniques

You might also like

Download as pptx, pdf, or txt
Download as pptx, pdf, or txt
You are on page 1of 33

LEAKAGE REDUCTION TECHNIQUES

EC400150
S= +ve
Sub= -Ve
LEAKAGE REDUCTION TECHNIQUES

For a CMOS circuit, the total power dissipation includes dynamic and
static components during the active mode of operation. In the standby
mode, the power dissipation is due to the standby leakage current.
Dynamic power dissipation consists of two components.

The static power of a CMOS circuit is determined by the


leakage current through each transistor. The dynamic
(switching) power and leakage power are expressed as

Power and delay dependence on


threshold voltage (V )
Channel Engineering for Leakage Reduction
A key parameter is the maximum gate depletion width,

To minimize SCEs, a sufficiently large aspect ratio (AR)


of the device is required

Graphical representation of different aspects of well


engineering
MOSFET constant-electric-field scaling
The principle of constant field scaling lies in scaling the
device voltages and the device dimensions (both horizontal
and vertical) by the same factor, , such that the electric
field remains unchanged.
Well Engineering
to improve short-channel characteristics
is well engineering.

Graphical representation of different aspects of well


engineering
Band digrams (shown on top) at the threshold
By changing the doping profile in the channel region, condition for a uniformly doped and an extreme
the distribution of the electric field and potential retrograde-doped channel (doping profiles shown
contours can be changed. at bottom)

Retrograde Doping:
More highly doped p-type substrate
Halo Doping: near the edges of the channel reduces the charge-
sharing effects from the source and drain fields, thus
Halo doping or nonuniform channel reducing the width of the depletion region in the drain-
profile in a lateral direction was introduced below substrate and source-substrate regions.
0.25-um technology node to provide another way to
control the dependence of threshold voltage on
channel length

Short-channel threshold-voltage rolloff


Reduction of charge-sharing effects
Halo or nonuniform channel doping reduces the threshold voltage degradation due to channel
length reduction. Thus, threshold voltage dependence on
channel length becomes more flat. Hence, the off-
current becomes less sensitive to channel length
variation
tox–Wdm design space. Some tradeoff among the
various factors can be made within the parameter
space bounded by SCE, body-effect, and oxide-field
considerations
Circuit Techniques for Leakage Reduction

For leakage reduction in digital circuits (logic and memory), four major circuit design techniques—
• Transistor stacking,
• Multiple Vth
• Dynamic Vth
• Supply voltage scaling (multiple and dynamic)
Standby Leakage Control Using Transistor Stacks ((Self-Reverse Bias))
• Subthershold leakage current flowing through a stack of series-connected transistors reduces when more than
one transistor in the stack is turned off. This effect is known as the stacking effect.

1. Due to the positive source potential , gate-to-source voltage of


M1 becomes negative; hence, the subthreshold current reduces
substantially.

2. Due to , body-to-source potential of M1 becomes negative,


resulting in an increase in the threshold voltage (larger body
effect) of , and thus reducing the subthreshold leakage.

Due to , the drain to source potential of M1 decreases, resulting in


an increase in the threshold voltage (less DIBL) of , and thus
Stacking effect in two-input NAND gate reducing the subthreshold leakage
Multiple Vth Designs:

V at different oxide thicknesses


Vth at different channel-doping densities

Vth roll-off for NMOS


Channel length at different oxide thicknesses for same
Multi-threshold voltage CMOS (MTCMOS)

In the active mode, SL is set low and sleep


control high transistors (MP and MN) are
turned on

Since their on-resistances are small, the virtual


supply voltages (VDDV and VSSV) almost
function as real power lines.

In the standby mode, SL is set high, MN and


MP are turned off, and the leakage current
is low

Schematic of MTCMOS circuit


Dual threshold CMOS (DTCMOS): Variable threshold CMOS (VTCMOS)

In the active mode, a nearly zero body


bias is applied.
While in the standby mode, a deeper
reverse body bias is applied to increase
the threshold voltage and cut off the
leakage current

Dual threshold technique is good


for leakage power reduction during both standby and active
modes without delay and area overhead

Path distribution of dual Vth and single Vth CMOS.


Dynamic threshold CMOS

For dynamic threshold


CMOS (DTMOS), the threshold voltage is altered dynamically
to suit the operating state of the circuit

DTMOS can be developed in bulk technologies


by using triple wells. “Doping engineering” is needed to
reduce the parasitic components

A high threshold voltage in the standby mode gives low leakage current,

while a low threshold voltage allows for higher current drives in the active mode
of operation
Dynamic Vth Designs: Dynamic threshold voltage scaling is a technique for active leakage power reduction.
• Two varieties of dynamic Vth scaling (DVTS) have been proposed
a) Vth-hopping scheme:
b) Dynamic vth scaling scheme:
Vth-hopping scheme:

When the controller asserts Vth-low Enable, Vth in the


target processor reduces to Vth-low, the frequency
controller generates fCLK ,

On the other hand, when the controller asserts Vth-high


Enable, the target processor Vth becomes Vth-high, the
frequency controller generates fCLK /2.

CONT is controlled by software through a software


feedback loop scheme .
Schematic diagram of Vth -hopping
Dynamic Vth-scaling scheme:
The DVTS controller adjusts the PMOS
and NMOS body bias so that the oscillator frequency of
the voltage-controlled oscillator tracks the given reference
clock frequency.

The continuous feedback loop also compensates


for variation in temperature and supply voltage.

Schematic of DVTS hardware


4) Supply Voltage Scaling:
• Supply voltage scaling was originally developed for switching power reduction. It is an effective method for
switching power reduction because of the quadratic dependence of the switching power on the VDD

Two ways of lowering supply voltage can be employed:


• Static supply scaling and
• Dynamic supply scaling

a) Static supply scaling

Challenge: The secondary voltages may be


generated off-chip or regulated on-die from
the core supply
Two-level multiple supply voltage scheme
Dynamic supply scaling

Dynamic supply scaling overrides


the cost of using two supply voltages by adapting the single
supply voltage to performance demand.

The highest supply voltage delivers the highest performance


at the fastest designed frequency of operation.
When performance demand is low, supply voltage and clock
frequency is lowered, delivering reduced performance but
with substantial power reduction

DVS architecture

You might also like