PROJECT REPORT ON

Thin Film Deposition by SPUTTERING

Technique
BIRLA INSTITUTE OF TECHNOLOGY, JAIPUR (2022-
23)

SUBMITTED BY:
MANU GUPTA SUBMITTED TO:
ROLL NO. 25071/20 FACULTY GUIDE
B. TECH VII SEM. MR PUNIT SHARMA
Introduction to Thin Film Deposition
Thermal Evaporation Technique
Sputtering Technique
Advantages of Sputtering
Thin Films in Modern Electronics
Thin Film Applications
Principles of PVD Processes
High Vacuum Sputtering System
Sputtering
System
Operation
Deposition Process and Control
Conclusion
 References

[1] Chopra, K. L. (1969) Thin Film Phenomena. New York: McGraw-Hill.

[2] Freund, L. B., and Suresh, S. (2003), Thin Film Materials. Cambridge University Press.
[3] Silicon Far East (2004) Physical Vapor Deposition (PVD) by Sputtering (online) available from (26 July 2012).
[4] Physical vapour Deposition (PVD)– An Introduction [online] available from [29 July 2012].
[5] ETAFILM Technology Inc (n.d) Optical Thin Film Deposition Technology History–Thermal evaporation [online]
available from [25 July 2012].
[6] Bhat, D. G. (2006) ‘Chemical Vapour Deposition’. In Coatings Technology Handbook. ed. by Tracton, A. A. 3rd
edn. USA (City not mentioned): Taylor & Francis Group, LLC.’
[7] Choy, K. L. (2003) Chemical vapour deposition of coatings. London: Elsevier Science Ltd.
[8] Cvimells Griot (n.d) Thin–film production [online] available from [28 July 2012].
[9] MEMS net (n. d) Thin Film Deposition Processes [online] available from [01 August 2012].
[10] Vossen, J. L. (1991) Material Science of Thin Films. 2nd edn. New Jersey: Milton Ohring.