• Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) can be
made very small • In MOSFET, the current is controlled by an electric field (field effect) applied perpendicular to both the semiconductor surface and to the direction of current. • The basic transistor principle is that the voltage between two terminals controls the current through the third terminal 2-terminal MOS structure • Metal-Oxide-Semiconductor capacitor • MOS capacitor p-type substrate is connected with positive terminal • Metal gate is connected with negative terminal • Electric field is induced in the given direction • Holes will experience a force toward oxide layer and will be accumulated at the interface 2-terminal MOS structure • MOS capacitor with reversed polarities • Induced E-field is shown • The holes in p-type will be pushed away and a negative space charge region is created • Negative charge is induced in the depletion region • Electron inversion layer • Hole inversion layer in n- type substrate N-channel MOSFET (Structure) • Gate terminal • Oxide • P-type substrate • N-type Source terminal • N-type Drain terminal • The current in a MOSFET is the result of the flow of charge in the inversion layer, the channel region N-channel MOSFET (Operation) • With zero biased at gate source and drain are separated by p-type substrate region • Two back-to-back diodes, current is zero • Gate voltage is applied, electron inversion layer is induced which connects n-type source and n-type drain • A current can be generated in the channel • Carriers in the channel are electrons, so n- channel MOSFET (NMOS) N-channel MOSFET (Operation) • The source terminal supplies carriers that flow through the channel, and the drain terminal allows the carriers to drain from the channel. • For the n-channel MOSFET, electrons flow from the source to the drain with an applied drain-to-source voltage, which means the conventional current enters the drain and leaves the source. • The magnitude of the current is a function of the amount of charge in the inversion layer, which in turn is a function of the applied gate voltage. • Since the gate terminal is separated from the channel by an oxide or insulator, there is no gate current. • Similarly, since the channel and substrate are separated by a space-charge region, there is essentially no current through the substrate