Dist-007 DISTL

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Distl – A Shortcut Distillation

Model in Aspen Plus®


Using Aspen Plus® V8.0

Revised: November 26, 2012

© 2012 Aspen Technology, Inc. All rights reserved


Objectives

 Understand the capabilities (and limitations) of Distl.

 Know the method implemented in Distl and associated


assumptions.

 Learn how to configure a Distl block and review results.

 Learn how to configure a RadFrac block. Learn how to


use Design-Spec/Vary in RadFrac

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Background

 For mixtures where the following assumptions are good


approximations, we can use the Distl block to calculate
compositions of product streams after we obtain the number
of stages and reflux ratio required.
– Constant relative volatilities.
– Constant molar overflows.

 The accuracy of the results from a Distl block is very limited. More
rigorous model should be used for much better accuracy. Of
course, results from DSTWU and Distl can be used as a good
starting point for rigorous models such as RadFrac.

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Key Teaching Points

 Distl implements Edmister’s method to calculate column


compositions for a given number of stages and reflux ratio.

 The Edmister’s method is also based on the assumptions of


constant relative volatilities and constant molar overflows. Thus,
Distl should not be used for mixtures that significantly
deviate from these assumptions.

 Results from shortcut models such as Distil typically contain


very noticeable inaccuracy. A rigorous model (e.g., RadFrac)
should be used to generate more accurate results.

 In RadFrac, reflux ratio is typically varied to achieve a purity


target.

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Recommended Further Exercises

 For the mixture of cis-n-butene/trans-n-butene with a mole


composition of 0.5/0.5, use Distl to calculate the
compositions of the two product streams. The results from
the DSTWU block in the exercise for example “Dist-
006_DSTWU” are used as the inputs.

 Then, use RadFrac to obtain the required reflux ratio to


achieve a purity of 0.99 (on the mole basis) for the
distillate.

© 2012 Aspen Technology, Inc. All rights reserved | 5


Copyright

 Copyright © 2012 by Aspen Technology, Inc. (“AspenTech”). All


rights reserved. This work may not be reproduced or distributed in
any form or by any means without the prior written consent of
AspenTech. ASPENTECH MAKES NO WARRANTY OR
REPRESENTATION, EITHER EXPRESSED OR IMPLIED, WITH
RESPECT TO THIS WORK and assumes no liability for any errors or
omissions. In no event will AspenTech be liable to you for
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 AspenTech®, aspenONE®, and the Aspen leaf logo, are
trademarks of Aspen Technology, Inc.. Brands and product names
mentioned in this documentation are trademarks or service marks
of their respective companies.

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